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Publication List - Shinnosuke Yasuoka (12 / 64 entries)
Domestic Conference (Not reviewed / Unknown)
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Sotaro Kageyama,
Kazuki Okamoto,
Shinnosuke Yasuoka,
上岡義弘,
召田雅実,
HIROSHI FUNAKUBO.
MgSiN2薄膜の作製と特性評価,
第71回応用物理学会春季学術講演会,
Mar. 2024.
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Nana SUN,
Kazuki Okamoto,
Shinnosuke Yasuoka,
Naoko Matsui,
Toshikazu Irisawa,
Koji Tsunekawa,
Soshun Doko,
Hiroshi Funakubo.
High stability of ferroelectricity against hydrogen gas in (Al,Sc)N thin films,
第71回応用物理学会春季学術講演会,
Mar. 2024.
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Reika Ota,
Shinnosuke Yasuoka,
中村美子,
Kazuki Okamoto,
原浩之,
正能大起,
上岡義弘,
召田雅実,
HIROSHI FUNAKUBO.
Ga添加によるAlNへのSc固溶量の増加とその強誘電性および圧電性への影響,
第71回応用物理学会春季学術講演会,
Mar. 2024.
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上原雅人,
平田研二,
中村美子,
Shinnosuke Yasuoka,
スリ アユ アンガライニ,
Kazuki Okamoto,
山田浩志,
HIROSHI FUNAKUBO,
秋山守人.
スパッタリング法で作製した高Sc濃度ScGaN膜の圧電・強誘電特性,
第71回応用物理学会春季学術講演会,
Mar. 2024.
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髙橋良,
Yoshitaka Ehara,
竹尾勇司,
濱嵜容丞,
澤井眞也,
平田靖透,
宮内良広,
Shintaro Yasui,
Shinnosuke Yasuoka,
HIROSHI FUNAKUBO,
ken nishida.
チューナブルデバイス応用へ向けたBa(Zr,Ti)O3膜の作製と評価,
第62回セラミックス基礎科学討論会,
Jan. 2024.
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HIROSHI FUNAKUBO,
Nachi Chaya,
Koji Hirai,
Shinnosuke Yasuoka,
Kazuki Okamoto,
山岡和希子,
井上ゆか梨.
スパッタリング法によるHfO2-CeO2強誘電体薄膜のYSZ基板上への非加熱合成,
第62回セラミックス基礎科学討論会,
Jan. 2024.
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Nana Sun,
Kazuki Okamoto,
Shinnosuke Yasuoka,
Naoko Matsui,
Toshikazu Irisawa,
Koji Tsunekawa,
Hiroshi Funakubo.
Effect of gas annealing on the ferroelectric property of (Al0.8Sc0.2)N thin film,
第62回セラミックス基礎科学討論会,
Jan. 2024.
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Sotaro Kageyama,
Kazuki Okamoto,
Shinnosuke Yasuoka,
HIROSHI FUNAKUBO.
スパッタリング法によるAlN-(Mg, Si)N膜の作製とその特性評価,
第62回セラミックス基礎科学討論会,
Jan. 2024.
Degree
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Study on crystal structure and ferroelectricity in wurtzite (Al,Sc)N thin films deposited by sputtering method,
Thesis,
Doctor (Engineering),
Tokyo Institute of Technology,
2024/03/26,
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Study on crystal structure and ferroelectricity in wurtzite (Al,Sc)N thin films deposited by sputtering method,
Outline,
Doctor (Engineering),
Tokyo Institute of Technology,
2024/03/26,
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Study on crystal structure and ferroelectricity in wurtzite (Al,Sc)N thin films deposited by sputtering method,
Summary,
Doctor (Engineering),
Tokyo Institute of Technology,
2024/03/26,
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Study on Crystal Structure and Ferroelectricity in Wurtzite (Al,Sc)N Thin Films Deposited by Sputtering Method,
Exam Summary,
Doctor (Engineering),
Tokyo Institute of Technology,
2024/03/26,
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