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Publication List - Takao Okishio (7 entries)
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Journal Paper
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Y. Takamura,
T. Akushichi,
A. Sadono,
T. Okishio,
Y. Shuto,
S. Sugahara.
Analysis of Hanle-effect signals observed in Si-channel spin accumulation devices,
J. Appl. Phys.,
AIP Publishing LLC.,
vol. 115,
no. 17,
pp. 17C307/1-3,
Apr. 2014.
International Conference (Reviewed)
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Y. Takamura,
A. Sadono,
T. Akushichi,
T. Okishio,
Y. Shuto,
S. Sugahara.
Analysis of Hanle-effect signals observed in Si-channel spin accumulation devices,
The 58th Annual Magnetism and Magnetic Materials (MMM) Conference,
AX-05,
Nov. 2013.
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T. Okishio,
Y. Takamura,
S. Sugahara.
Low-barrier ferromagnet source/drain MOSFETs using CoFe/Mg/AlOx/Si depinning contacts,
International Symposium on Advanced Hybrid Nano Devices (IS-AHND) : Prospects by World’s Leading Scientists,
paper P-42,
pp. 131-132,
Oct. 2011.
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T. Okishio,
Y. Takamura,
S. Sugahara.
Fabrication of spin-MOSFETs using CoFe/Mg/AlOx/Si tunnel junctions for the source and drain,
International Conf. on Solid State Devices and Materials (SSDM),
J-4-4,
p. 31,
Sept. 2011.
Official location
Domestic Conference (Not reviewed / Unknown)
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Y. Takamura,
A. Sadono,
T. Akushichi,
T. Okishio,
Y. Shuto,
S. Sugahara.
Analysis of Hanle-effect signals observed in a Si-channel spin accumulation device with a high-quality CoFe/MgO/Si spin injector,
The 61st JSAP Spring Meeting, 2014,
Mar. 2014.
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Takao Okishio,
Yota Takamura,
SATOSHI SUGAHARA.
CoFe/Mg/AlOx/Siデピン接合を用いた低バリア強磁性ソース/ドレインMOSFET,
第16回半導体スピン工学の基礎と応用(PASPS-16),
p. 75,
Nov. 2011.
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Takao Okishio,
Yota Takamura,
SATOSHI SUGAHARA.
CoFe/Mg/AlOx/Siトンネル構造をソース/ドレインに用いたスピンMOSFETの作製,
第72回応用物理学会学術講演会,
1p-P10-25,
Aug. 2011.
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