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  論文
  
    
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Kiichi Tachi,
N. Vulliet,
S. Barraud,
Kuniyuki KAKUSHIMA,
HIROSHI IWAI,
S. Cristoloveanu,
T. Ernst.
        
Influence of source/drain formation process on resistance and effective mobility for scaled multi-channel MOSFET”,
      Solid-State Electronics,
      Vol. 65-66,
      pp. 16-21,
      Nov. 2011.
      
        
      
      
      
 
    
   
  
  
  
  
  
  
  
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