国際会議発表 (査読なし・不明)

• 大毛利健治, W. Feng, R. Hettiarachchi, Yeonghun Lee, Soshi Sato, Kuniyuki KAKUSHIMA, M. Sato, K. Fukuda, M. Niwa, K. Yamabe, Kenji Shiraishi, HIROSHI IWAI, Keisaku Yamada. Low-frequency noise reduction in Si Nanowire MOSFETs, ECS 221st Meeting, ECS Transactions, Vol. 45, No. 3, pp. 437-442, 2012.
• 大毛利健治, W. Feng, R. Hettiarachchi, Yeonghun Lee, Soshi Sato, Kuniyuki KAKUSHIMA, M. Sato, K. Fukuda, M. Niwa, K. Yamabe, Kenji Shiraishi, HIROSHI IWAI, Keisaku Yamada. Low-frequency noise reduction in Si Nanowire MOSFETs, ECS 221st Meeting, ECS Transactions, Vol. 45, No. 3, pp. 437-442, 2012.
• 大毛利健治, W. Feng, R. Hettiarachchi, Yeonghun Lee, Soshi Sato, Kuniyuki KAKUSHIMA, M. Sato, K. Fukuda, M. Niwa, K. Yamabe, Kenji Shiraishi, HIROSHI IWAI, Keisaku Yamada. Low-frequency noise reduction in Si Nanowire MOSFETs, ECS 221st Meeting, ECS Transactions, Vol. 45, No. 3, pp. 437-442, 2012.

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