論文

• H.C. Pfeiffer, R.S. Dhaliwal, S.D. Golladay, S.K. Doran, M.S. Gordon, T.R. Groves, R.A. Kendall, J.E. Lieberman, P.E. Petric, D.J. Pinckney, R.J. Quickle, C.F. Robinson, J.D. Rockrohr, J.J. Senesi, W. Stickel, E.V. Tressler, A. Tanimoto, T. Yamaguchi, K. Okamoto, Kazuaki Suzuki, T. Okino, S. Kawata, K. Morita, S. Suzuki, H. Shimizu, S. Kojima, G. Varnell, W.T. Novak, D.P. Stumbo, M. Sogard. Projection reduction exposure with variable axis immersion lenses: Next generation lithography, J. Vac. Sci. Technol. B, American Vacuum Society, Vol. 17, pp. 2840-2846, 1999.

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