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Publication List - Shun-ichiro OHMI 2019 (4 / 298 entries)
International Conference (Reviewed)
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Joel Molina-Reyes,
Takuya Hoshii,
Shun-Ichiro Ohmi,
Hiroshi Funakubo,
Atsushi Hori,
Ichiro Fujiwara,
Hitoshi Wakabayashi,
Kazuo Tsutsui,
Kuniyuki Kakushima.
Endurance Improvement in Ferroelectric Y-doped HfO2 Thin Films on NiSi2 with Low-Thermal Budget Processing,
Solid State Devices and Materials (SSDM2019),
Sept. 2019.
International Conference (Not reviewed / Unknown)
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Joel Molina-Reyes,
Haruki Iwatsuka,
Takuya Hoshii,
Shun-Ichiro Ohmi,
Hiroshi Funakubo,
Atsushi Hori,
Ichiro Fujiwara,
Hitoshi Wakabayashi,
Kazuo Tsutsui,
Kuniyuki Kakushima.
NiSi2 as a Promotor of Ferroelectricity in Si-doped HfO2 Thin Films after Low-Thermal Budget Processing,
VLSI 2019 (2019 Symposia on VLSI Technology and Circuits),
June 2019.
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J. Molina,
H. Iwatsuka,
T. Hoshii,
S. Ohmi,
H. Funakubo,
A. Hori,
I. Fujiwara,
H. Wakabayashi,
K. Tsutsui,
K. Kakushima.
Ferroelectric Properties of Si doped HfO2 Thin Films with NiSi2 as Bottom Electrode,
235th ECS Meeting,
May 2019.
Patent
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