論文

• Tsuyoshi Horikawa, Nobuhiko Nishiyama. Detail analysis of reflection behavior for O-band and C-band silicon waveguides by OFDR profiles, Japanese Journal of Applied Physics, The Japan Society of Applied Physics, Vol. 65, No. 4, 04SP06, Feb. 2026.

国内会議発表 (査読なし・不明)

• Haoyu Chen, Moataz Eissa, Kaibin Yao, Tsuyoshi Horikawa, Keisuke Kawahara, Nobuhiko Nishiyama. High-Efficiency Vertical Coupler between Si and Low-index (~1.6) SiON Waveguide with Low Polarization Dependance Loss, The 73rd JSAP Spring Meeting 2026, Mar. 2026.

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