Journal Paper

• Takuo Hiratani, Naoki Fujiwara, Naoko Inoue, Takehiko Kikuchi, Takuya okimoto, Takuya mitarai, Munetaka Kurokawa, Hajime Tanaka, Hidenari Fujikata, Tohma watanabe, Toshiyuki Nitta, Nobuhiko Nishiyama, Hideki yagi. InP/Si Heterogeneously Integrated Tunable Laser by Utilizing Chip-on-Wafer Bonding Method, Journal of Lightwave Technology, Vol. 43, Issue 4, pp. 1708-1715, Feb. 2025.

International Conference (Reviewed)

• Norikatsu Takaura, Shoma Miyata, Moataz Eissa, Takaaki Noda, Yuji Urano, Zhao Jiaang, Hiroaki Takahashi, Shuntaro Machida, Tsuyoshi Horikawa, Nobuhiko Nishiyama. Low Propagation Loss in LPCVD Si3N4 Waveguides Without the Need for High-Temperature Annealing: Expanding Applications in Silicon Photonics, 2025 International conference on solid state devices and materials, Sept. 2025.
• Tsuyoshi Horikawa, Nobuhiko Nishiyama. Multiple reflection behavior in OFDR transmission and reflection profiles for silicon waveguides, 2025 International Conference on Solid State Devices and Materials, Extended Abstracts of 2025 International Conference on Solid State Devices and Materials, Sept. 2025.
• Nobuhiko Nishiyama. Photonic Integrated Circuits with Heterogeneous Material Integration and Photonic-Electronic Co-design Technologies toward Multi-Terabit Transceiver, IEEE Summer Topicals 2025, MG3.3, July 2025.

International Conference (Not reviewed / Unknown)

• Moataz Eissa, Yoshitaka Ohiso, Kensuke Ogawa, Yuki Nomoto, Tsuyoshi Horikawa, Shoichiro Yamaguchi, Masahiko Namerikawa, Nobuhiko Nishiyama. Low-loss amorphous-Si Strip-Loaded Thin Film Lithium Niobate on Insulator Waveguides with Compact Bending Radius, 30th OptoElectronics and Communications Conference, July 2025.
• Moataz Eissa, Tsuyoshi Horikawa, Suguru Yoshida, Nobuhiko Nishiyama. Integrated Testing Strategy of Wafer and Chip-level Characterization for Photonic Integrated Circuits, 30th OptoElectronics and Communications Conference, July 2025.
• Kaibin Yao, Shaher Anis Mahmoud Eissa Moataz, Tsuyoshi Horikawa, Nobuhiko Nishiyama. Silicon Oxynitride/Silicon Interlayer Couplers: Flexible Index Control, High Efficiency and Compact on Silicon Platform, 30th OptoElectronics and Communications Conference, July 2025.

Domestic Conference (Not reviewed / Unknown)

• Kaibin Yao, Shaher Anis Mahmoud Eissa Moataz, Tsuyoshi Horikawa, Nobuhiko Nishiyama. Characteristics Comparison of Interlayer Couplers Between Silicon Oxynitride and Silicon Waveguide Layers, 第86回応用物理学会秋季学術講演会, Sept. 2025.
• Tsuyoshi Horikawa, Nobuhiko Nishiyama. OFDR法を用いたウェーハレベル光集積デバイス特性検査(3) ‐O帯及びC帯Si細線導波路の分布反射係数の線幅依存性‐, 電子情報通信学会ソサイエティ大会, 電子情報通信学会ソサイエティ大会講演論文集, Sept. 2025.
• Tsuyoshi Horikawa, Nobuhiko Nishiyama. OFDR法を用いたウェーハレベル光集積デバイス特性検査(2) ‐透過及び反射プロファイルに見られる導波路多重反射の定式化‐, 第８６回応用物理学会秋季学術講演会, 第８６回応用物理学会秋季学術講演会講演予稿集, Sept. 2025.
• Hideaki Okayama, Hiroyuki Takahashi, Hideki Ono, Daisuke Shimura, Kenichi Tanigawa, Takahito Suzuki, Hironori Furuta, Nobuhiko Nishiyama. テーパ構造による高位置ずれ耐性を有する化合物半導体と誘電体・Si 導波路直接接合, 第86回応用物理学会秋季学術講演会, Sept. 2025.
• Wenbo Lin, Shigeru Nakagawa, Nobuhiko Nishiyama. SiC のバナジウム中心に基づく通信波長帯量子光源に向けた ナノビーム光共振器の設計, 第86回応用物理学会秋季学術講演会, Sept. 2025.
• Moataz Eissa, Yoshitaka Ohiso, Kensuke Ogawa, Yuki Nemoto, Shoichiro Yamaguchi, Masahiko Namerikawa, Nobuhiko Nishiyama. Amorphous-Si Strip-Loaded Thin Film Lithium Niobate on Insulator Waveguides with Low Propagation Loss and Reduced Bending Radius, The 86th JSAP Autumn Meeting, 2025, Sept. 2025.
• Takuo Hiratani, Kento Komatsu, Hidenari Fujikata, Naoki Fujiwara, Naoko Inoue, Takehiko Kikuchi, Takuya Mitarai, Shun Kimura, Takuya Okimoto, Nobuhiko Nishiyama, Hideki Yagi. InP/Si異種材料集積を用いたCおよびL帯波長可変レーザ, 2025年電子情報通信学会ソサイエティ大会, Sept. 2025.
• Naotaka Kasuya, Hajime Tanaka, Kento Komatsu, Taichi Misawa, Naoko Inoue, Takehiko Kikuchi, Takuya Mitarai, Shun Kimura, Naoki Fujiwara, Nobuhiko Nishiyama, Hideki Yagi. Si基板上SiO2窓構造への異種材料小片接合プロセスに向けたエッチングプロセスの検討, 2025年電子情報通信学会ソサイエティ大会, Sept. 2025.
• Islam Mohammad Shafiqul, Mohammed Saad Khan, Yoshitaka Oiso, Keiji Isamoto, Hiroshi Toshiyoshi, Nobuhiko Nishiyama. MEMS Tunable 795 nm VCSEL for Chip Scale Atomic Clock, The 86th JSAP Autumn Meeting 2025, 8p-N206-4, July 2025.  Official location  
• Tomohiro Amemiya, Sho Okada, Nobuhiko Nishiyama, 胡 暁. トポロジカルエッジ状態を用いた1×2光スプリッタ, レーザー研究 = The review of laser engineering : レーザー学会誌 / レーザー学会 編, 吹田 : レーザー学会, Vol. 53, No. 5, pp. 225-230, May 2025.
• Moataz Eissa, Yoshitaka Ohiso, Tsuyoshi Horikawa, Nobuhiko Nishiyama. Investigation of III-V/SOI hybrid laser structure with Si double-ring-resonators and SiN front-side coupling, 2025 The 72nd Japan Society of Applied Physics (JSAP) Spring Meeting, Mar. 2025.
• Nobuhiko Nishiyama, Hironori Furuta, Yoshitaka Oiso, Suguru Yoshida, Shaher Anis Mahmoud Eissa Moataz, Kenichi Tanigawa, Takahito Suzuki, Hideaki Okayama, Daisuke Shimura. 光集積回路に向けたCrystal Film Bonding技術によるSiO2/Si基板上へのInPエピタキシャル層接合, 第72回応用物理学会春季学術講演会, Mar. 2025.
• Nobuhiko Nishiyama, Tsuyoshi Horikawa, Takuo Hiratani, Naoki Fujiwara, Hidenari Fujikata, Naoko Inoue, Hideki Yagi. 光I/Oを利用しない異種材料集積光回路内半導体レーザウェハレベル一括通電発光測定法の検討, 2025年電子情報通信学会総合大会, C-3_C-4-49, Mar. 2025.
• Hidenari Fujikata, Takehiko Kikuchi, Naoko Inoue, Naoki Fujiwara, Kento Komatsu, Takuo Hiratani, Takuya Mitarai, Yuji Koyama, Takuya Okimoto, Yuhki Itoh, Ryuya Sasaki, Tsukuru Katsuyama, Nobuhiko Nishiyama, Hideki Yagi. 小片接合技術を用いたⅢ-Ⅴ/Siハイブリッド半導体光増幅器, 2025年電子情報通信学会総合大会, Mar. 2025.
• Kento Komatsu, Takuya Mitarai, Tsuyoshi Horikawa, Takuo Hiratani, Naoko Inoue, Naoki Fujiwara, Nobuhiko Nishiyama, Hideki Yagi. 90°光ハイブリッド構成による波長可変レーザ向けSiフォトニクス波長ロッカー, 2025年電子情報通信学会総合大会, Mar. 2025.
• Shun Ito1, Yoshitaka Oiso1, Suguru Yoshida1, Nobuhiko Nishiyama. Proposal of 1-µm-band InGaAs membrane lasers and investigation of Optical Confinement, Proposal of 1-μm-band InGaAs membrane lasers and investigation of Optical Confinement, Mar. 2025.
• Masato Yoshii, Takehiko Kikuchi, Kenji Morita, Toshiaki Kitamura, Nobuhiko Nishiyama. Si基板上SiO2窓構造への異種材料小片接合プロセスに向けたエッチングプロセスの検討, Mar. 2025.
• Haoyu Chen, Eissa Moataz, Kaibin Yao, Tsuyoshi Horikawa, Nobuhiko Nishiyama. Design of Layer-to-Layer Coupler between Si and SiON Waveguides using Low Index (~1.6) SiON, The 72nd JSAP Spring Meeting 2025, Mar. 2025.
• Hideaki Okayama, Hiroyuki Takahashi, Hideki Ono, Daisuke Shimura, Kenichi Tanigawa, Takahito Suzuki, Hironori Furuta, Nobuhiko Nishiyama. 高位置ずれ耐性を有する化合物半導体・Si導波路素子貼り付け構造の初期検討, 第72回応用物理学会春季学術講演会, Mar. 2025.

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