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Publication List - Takanori Mimura 2020 (19 / 157 entries)
Journal Paper
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Yoshiomi Hiranaga,
Takanori Mimura,
Takao Shimizu,
Hiroshi Funakubo,
Yasuo Cho.
Local C-V mapping for ferroelectrics using scanning nonlinear dielectric microscopy,
J. Appl. Phys.,
vol. 128,
pp. 244105,
Dec. 2020.
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Reijiro Shimura,
Takanori Mimura,
Takao Shimizu,
Yoshitomo Tanaka,
Yukari Inoue,
Hiroshi Funakubo.
Preparation of near-1-μm-thick {100}-oriented epitaxial Y-doped HfO2 ferroelectric films on (100)Si substrates by an RF magnetron sputtering method,
J.Ceram. Soc. Jpn,
vol. 128,
no. 8,
pp. 539-543,
Aug. 2020.
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Takanori Mimura,
Takao Shimizu,
Yoshio Katsuya,
Osami Sakata,
Hiroshi Funakubo.
Thickness- and orientation- dependences of Curie temperature in ferroelectric epitaxial Y doped HfO2 films,
Jpn. J. Appl. Phys.,
Vol. 59,
pp. SGGB04-1-6,
Feb. 2020.
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Takanori Mimura,
Takao Shimizu,
Hiroshi Uchida,
Hiroshi Funakubo.
Room-temperature deposition of ferroelectric HfO2-based films by the sputtering metho,
Appl. Phys. Lett.,
Vol. 116,
pp. 062901-1-5,
Feb. 2020.
International Conference (Not reviewed / Unknown)
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Hiroshi Funakubo,
Takanori Mimura,
Takao Shimizu.
High stability of Ferroelectric phase in Y-doped HfO2 films,
Electroceramics XVII,
Aug. 2020.
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J. Molina,
T. Mimura,
Y. Nakamura,
T. Shimizu,
H. Funakubo,
I. Fujiwara,
T. Hoshii,
S. Ohmi,
A. Hori,
H. Wakabayashi,
K. Tsutsui,
K. Kakushima.
Interface engineering of BEOL compatible ferroelectric Y:HfO2 device for enhanced endurance,
2020 IMW (The 12th International Memory Workshop),
May 2020.
Domestic Conference (Not reviewed / Unknown)
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Shimizu Takao,
Yoshitaka Ehara,
Takanori Mimura,
Shintaro Yasui,
Tomoaki Yamada,
今井康彦,
Osami Sakata,
HIROSHI FUNAKUBO.
時間分解XRD測定による周期電界下における菱面体PZTの(111)/(-111)ドメイン構造の観察,
第14回物性科学領域横断研究会(領域合同研究会),
Dec. 2020.
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Shimizu Takao,
Yuki Tashiro,
Takanori Mimura,
HIROSHI FUNAKUBO.
HfO2基材料における強誘電相生成機構,
第40回電子材料研究討論会,
Nov. 2020.
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Reijiro Shimura,
Takanori Mimura,
Akinori Tateyama,
Shimizu Takao,
HIROSHI FUNAKUBO.
スパッタリング法によるHfO2基強誘電体厚膜のシリコン基板上への室温製膜とその電気特性および圧電特性評価,
第81回応用物理学会秋季学術講演会,
Sept. 2020.
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Reijiro Shimura,
Takanori Mimura,
Akinori Tateyama,
Takao Shimizu,
HIROSHI FUNAKUBO.
スパッタリング法によるHfO2基強誘電体厚膜の室温製膜とその電気特性評価,
第67回応用物理学会春季学術講演会,
Mar. 2020.
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Takanori Mimura,
Takao Shimizu,
HIROSHI FUNAKUBO.
エピタキシャルHfO2基膜を用いた直方晶相安定化の調査,
第67回応用物理学会春季学術講演会,
Mar. 2020.
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Takao Shimizu,
Takanori Mimura,
HIROSHI FUNAKUBO.
HfO2基強誘電体の相安定性と厚膜化,
第4回元素戦略シンポジウム―産学連携研究新展開―,
Feb. 2020.
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Yuki Tashiro,
Takanori Mimura,
Takao Shimizu,
Yoshio Katsuya,
Osami Sakata,
Takanori Kiguchi,
Takahisa Shiraishi,
Toyohiko Konno,
HIROSHI FUNAKUBO.
HfO2基薄膜のZr, Yドープによる結晶相変化と強誘電相の安定性,
第58回セラミックス基礎科学討論会,
Jan. 2020.
Other Publication
Patent
Degree
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A study on stabilization of ferroelectric phase in epitaxial HfO2 - based films,
Thesis,
Doctor (Engineering),
Tokyo Institute of Technology,
2020/03/26,
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A study on stabilization of ferroelectric phase in epitaxial HfO2 - based films,
Outline,
Doctor (Engineering),
Tokyo Institute of Technology,
2020/03/26,
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A study on stabilization of ferroelectric phase in epitaxial HfO2 - based films,
Summary,
Doctor (Engineering),
Tokyo Institute of Technology,
2020/03/26,
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A study on stabilization of ferroelectric phase in epitaxial HfO2 - based films,
Exam Summary,
Doctor (Engineering),
Tokyo Institute of Technology,
2020/03/26,
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