論文

• Takanori Mimura, Takao Shimizu, Yoshio Katsuya, Osami Sakata, Hiroshi Funakubo. Thickness dependence of phase stability in epitaxial (HfxZr1-x)O2 films, Physical review materials, Vol. 5, pp. 114407, Nov. 2021.
• Okkyun Seo, Akhil Tayal, Jaemyung Kim, Chulho Song, Yoshio Katsuya, Osami Sakata, Jiayi Tang, Nodo Lee, Yong Tae Kim, Yuki Ikeya, Shiori Takano, Akifumi Matsuda, Mamoru Yoshimoto. Modifying the crystal structures of Fe2O3-doped NiO epitaxial thin films grown at room temperature by controlling the oxygen partial pressure, Applied Surface Science, Elsevier, Volume 533, Dec. 2020.  公式リンク  
  
• Takanori Mimura, Takao Shimizu, Yoshio Katsuya, Osami Sakata, Hiroshi Funakubo. Thickness- and orientation- dependences of Curie temperature in ferroelectric epitaxial Y doped HfO2 films, Jpn. J. Appl. Phys., Vol. 59, pp. SGGB04-1-6, Feb. 2020.
• Okkyun Seo, Akhil Tayal, Jaemyung Kim, Chulho Song, Yanna Chen, Satoshi Hiroi, Yoshio Katsuya, Toshiaki Ina, Osami Sakata, Yuki Ikeya, Shiori Takano, Akifumi Matsuda, Mamoru Yoshimoto. Tuning of structural, optical band gap, and electrical properties of room-temperature-grown epitaxial thin films through the Fe₂O₃:NiO ratio, Scientific Reports, SpringerNature, 9, Mar. 2019.  公式リンク  
  
• Takanori Mimura, Takao Shimizu, Takanori Kiguchi, Akihiro Akama, Toyohiko J. Konno, Yoshio Katsuya, Osami Sakata, Hiroshi Funakubo. Effects of heat treatment and in-situ high temperature XRD study on the formation of ferroelectric epitaxial Y doped HfO2 film., Jpn. J. Appl. Phys., Vol. 58, pp. SBBB09-1-5, Feb. 2019.
• Takao Shimizu, Takanori Mimura, Takanori Kiguchi, Takahisa Shiraishi, Toyohiko Konno, Yoshio Katsuya, Osami Sakata, Hiroshi Funakubo. Ferroelectricity mediated by ferroelastic domain switching in HfO2-based epitaxial thin films, Appl. Phys. Lett., Vol. 113, pp. 212901-1-5, Nov. 2018.
• Yanna Chen, Osami Sakata, Ryosuke Yamauchi, Anli Yang, LOKU SINGGAPPULIGE, Rosantha Kumara, Chulho Song, Natalia Palina, Munetaka Taguchi, Yoshio Katsuya, Hiroshi Daimon, Akifumi Matsuda, MAMORU YOSHIMOTO. Lattice distortion and electronic structure of magnesium-doped nickel oxide epitaxial thin films, Physical Review B, American Physical Society, 95, 245301, June 2017.  公式リンク  
  
• Anli Yang, Osami Sakata, Ryosuke Yamauchi, LOKU SINGGAPPULIGE, Rosantha Kumara, Chulho Song, Yoshio Katsuya, Akifumi Matsuda, Mamoru Yoshimoto. Atomic disorder of Li_0.5Ni_0.5O thin films caused by Li doping: estimation from X-ray Debye-Waller factors, Journal of Applied Crystallography, International Union of Crystallography, Volume 48, # 6, Page 1896-1900, Dec. 2015.  公式リンク  
  

国内会議発表 (査読有り)

• 安原 颯, 茶島 圭介, 寺西 貴志, 勝矢 良雄, 坂田 修身, 安井 伸太郎, 谷山 智康, 伊藤 満. エピタキシャルBaTiO3/LiCoO2薄膜の界面状態と正極特性, 第77回応用物理学会秋季学術講演会.

国際会議発表 (査読なし・不明)

• Takao Shimizu, Takanori Mimura, Yuki Tashiro, Takahisa Shiraishi, Takanori Kiguchi, Toyohiko J. Konno, Osami Sakata, Yoshio Katsuya, Hiroshi Funakubo. Structure Change in the HfO2 Ferroelectric Materials Induced by an Electric Field, ICC8 (8th International Congress on Ceramics), Apr. 2021.
• Takao Shimizu, Yoshitaka Ehara, Takanori Mimura, Shintaro Yasui, Tomoaki Yamada, Yasuhiko Imai, Yoshio Katsuya, Osami Sakata, Hiroshi Funakubo. The Domain Switching in Rhombohedral PZT Observed by In Situ X-Ray Diffraction Study by Various Frequencies, 2019 MRS Fall Meeting & Exhibi, Dec. 2019.
• Takanori Mimura, Takao Shimizu, Yoshio Katsuya, Osami Sakata, Hiroshi Funakubo. Stability of Ferroelectric Orthorhombic Phase in Epitaxial HfO2-based Films, 19th US-Japan Seminar on Dielectric and Piezoelectric Ceramics, Nov. 2019.
• T. Mimura, T. Shimizu, Y. Katsuya, O. Sakata, H. Funakubo. Thickness- and orientationdependence of Curie temperature of ferroelectric epitaxial HfO2 based films, SSDM 2019 (2019 International Conference on Solid State Devices and Materials), Sept. 2019.
• Takanori Mimura, Takao Shimizu, Takanori Kiguchi, Akihiro Akama, Toyohiko J. Konno, Yoshio Katsuya, Osami Sakata, Hiroshi Funakubo. Effects of heat treatment and in situ high temperature XRD study on the formation of ferroelectric epitaxial HfO2 based film, SSDM 2018 (2018 International Conference on Solid State Devices and Materials), Sept. 2018.
• T. Mimura, T. Shimizu, T. Kiguchi, A. Akama, T. J. Konno, Y. Katsuya, O. Sakata, H. Funakubo. Temperature Stability of Ferroelectric Phase of Epitaxial Y-doped HfO2 Films, IFAAP 2018 (2018 ISAF-FMA-AMF-AMEC-PFM Joint Conference), May 2018.
• T. Shimizu, T. Mimura, T. Kiguchi, T. Shiraishi, A. Akama, T. J. Konno, O. Sakata, K. Yoshio, H. Funakubo. Domain switching in epitaxial ferroelectric HfO2 films, 2018 Conference on Electronic and Advanced Materials, Jan. 2018.

国内会議発表 (査読なし・不明)

• 田代裕貴, 三村和仙, 清水荘雄, 勝矢良雄, 坂田修身, 木口賢紀, 白石貴久, 今野豊彦, 舟窪浩. HfO2基薄膜のZr, Yドープによる結晶相変化と強誘電相の安定性, 第58回セラミックス基礎科学討論会, Jan. 2020.
• 田代裕貴, 三村和仙, 清水荘雄, 勝矢良雄, 坂田修身, 木口賢紀, 白石貴久, 今野豊彦, 舟窪浩. HfO2基薄膜の電界誘起相転移, 第80回応用物理学会秋季学術講演会, Sept. 2019.
• 清水荘雄, 江原祥隆, 三村和仙, 安井伸太郎, 山田智明, 今井康彦, 勝矢良雄, 坂田修身, 舟窪浩. 時間分解放射光X線回折を用いた菱面体晶 PZTにおける非180˚ドメインスイッチングの周波数応答 特性の評価, 第79回応用物理学会秋季学術講演会, Sept. 2018.
• T. Shimizu, T. Mimura, T. Kiguchi, A. Akama, T. J. Konno, Y. Katsuya, O. Sakata, H. Funakubo. Domain Structure and Electric Field Induced Domain Switching in HfO2 Ferroelectrics, IFAAP 2018 (2018 ISAF-FMA-AMF-AMEC-PFM Joint Conference), May 2018.
• 三村和仙, 清水荘雄, 勝矢良雄, 坂田修身, 舟窪浩. エピタキシャルHfO2基強誘電体における強誘電特性の膜厚依存性, 第65回応用物理学会春季学術講演会, Mar. 2018.
• 三村和仙, 清水荘雄, 木口賢紀, 赤間章裕, 今野豊彦, 勝矢良雄, 坂田修身, 舟窪浩. エピタキシャル成長したHfO2 基強誘電体膜における結晶構造の膜厚依存性, 日本セラミックス協会 2018年年会, Mar. 2018.
• 清水荘雄, 三村和仙, 木口賢紀, 白石貴久, 赤間章裕, 今野豊彦, 坂田修身, 勝矢良雄, 舟窪浩. HfO2基強誘電体のドメイン構造と電場誘起スイッチング, 第37回エレクトロセラミックス研究討論会, Oct. 2017.
• 三村和仙, 清水荘雄, 木口賢紀, 赤間章裕, 今野豊彦, 勝矢良雄, 坂田修身, 舟窪浩. Y2O3-HfO2強誘電体の温度安定性, 第78回応用物理学会秋季学術講演会, Sept. 2017.
• Yanna Chen, Osami Sakata, Ryosuke Yamauchi, Anli Yang, LOKU SINGGAPPULIGE, Rosantha Kumara, Chulho Song, Natalia Palina, Munetaka Taguchi, Yoshio Katsuya, Hiroshi Daimon, Akifumi Matsuda, MAMORU YOSHIMOTO. Lattice distortion and electronic structures of epitaxial Mg_xNi_1-xO thin films, The 30th Annual Meeting of the Japan Society for Synchrotron Radiation Reaearch and Synchrotron radiation Symposium, Nov. 2016.
• 坂田修身, Yanna Chen, Anli Yang, Singgappulige Rosantha Kumara Loku, Chulho Song, Natalia Palina, 勝矢良雄, 山内涼輔, 松田晃史, 吉本護. X線回折によるエピタキシャルMg_xNi_1-xO薄膜の原子配列の秩序度の評価, 日本結晶学会 平成28年度年会, Oct. 2016.

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