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Publication List - Toshifumi Yuji 2010 (3 / 37 entries)
Journal Paper
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Toshifumi YUJI,
Takuya URAYAMA,
Shuitsu FUJII,
Yoshitoki IIJIMA,
Yoshifumi SUZAKI,
Hiroshi AKATSUKA.
Basic Characteristics for PEN Film Surface Modification Using Atmospheric-Pressure Nonequilibrium Microwave Plasma Jet,
Electronics and Communications in Japan,
Wiley Periodicals Inc.,
Vol. 93,
No. 5,
pp. 42-49,
May 2010.
Official location
International Conference (Reviewed)
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H. Kataoka,
N. Mungkung,
T. Yuji,
M. Kawano,
Y. Kiyota,
D. Uesugi,
K. Nakabayashi,
Y. Suzaki,
H. Shibata,
N. Kashihara,
K. Sakai,
T. Bouno,
H. Akatsuka.
Surface modification of silicon wafer by low-pressure high-frequency plasma chemical vapor deposition method,
2010 24th International Symposium on Discharges and Electrical Insulation in Vacuum (ISDEIV),
2010 24th International Symposium on Discharges and Electrical Insulation in Vacuum (ISDEIV),
IEEE,
pp. 505 - 508,
Aug. 2010.
Official location
Domestic Conference (Not reviewed / Unknown)
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Toshifumi Yuji,
Shinji Aoki,
Yuimichi Kohno,
Hiroshi Akatsuka.
Space Charge Measurements of Surface Cleaning Sample Using Atmospheric-Pressure Non-equilibrium Discharge Plasma Jet,
The 2010 Annual Meeting, I.E.E. Japan,
The 2010 Annual Meeting Record, I.E.E. Japan,
The Institute of Electrical Engineers of Japan,
p. 243,
Mar. 2010.
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