Journal Paper

• Hiroyoshi Tanabe, Moe Sugiyama, Masayuki Shimoda, Atsushi Takahashi. Source-position-dependent transmission cross coefficient formula including polarization and mask three-dimensional effects in high-numerical-aperture extreme ultraviolet lithography, Journal of Micro/Nanopatterning, Materials and Metrology (JM3), SPIE, Vol. 25, issue 3, May 2026.

International Conference (Reviewed)

• Hiroyoshi Tanabe, Moe Sugiyama, Masayuki Shimoda, Atsushi Takahashi. STCC formula including polarization and M3D effects in high-NA EUV lithography, Optical and EUV Nanolithography XXXIX, Proc. SPIE, SPIE, Vol. 13979, Feb. 2026.
• Moe Sugiyama, Masayuki Shimoda, Hiroyoshi Tanabe, Atsushi Takahashi. EUV M3D parameter prediction of curvilinear mask patterns by convolutional neural networks, DTCO and Computational Patterning V, Proc. SPIE, SPIE, Vol. 13980, pp. 139801J-1-6, Feb. 2026.

Domestic Conference (Not reviewed / Unknown)

• Yohei Tomonaga, Masayuki Shimoda, Atsushi Takahashi. Minimizing the Maximum Congestion of Vertical Channels in Gap Channels, Technical Committee on VLSI Design Technologies, IEICE Technical Report (VLD2025-82), Vol. 125, No. 382, pp. 36-41, Mar. 2026.
• Haruki Numajiri, Masayuki Shimoda, Atsushi Takahashi. Proposal of a 2-Layer L-Shaped Bottleneck Channel Routing Algorithm, Technical Committee on VLSI Design Technologies, IEICE Technical Report (VLD2025-81), Vol. 125, No. 382, pp. 30-35, Mar. 2026.

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