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井手啓介 2016年 研究業績一覧 (6件 / 205件)
論文
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Junghwan Kim,
Norihiko Miyokawa,
Takumi Sekiya,
Keisuke Ide,
Yoshitake Toda,
Hidenori Hiramatsu,
Hideo Hosono,
Toshio Kamiya.
Ultrawide band gap amorphous oxide semiconductor, Ga–Zn–O,
Thin Solid Films,
Vol. 614,
pp. 84-89,
Sept. 2016.
公式リンク
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Junghwan Kim,
Norihiko Miyokawa,
Keisuke Ide,
Yoshitake Toda,
Hidenori Hiramatsu,
Hideo Hosono,
Toshio Kamiya.
Room-temperature fabrication of light-emitting thin films based on amorphous oxide semiconductor,
AIP Advances,
Vol. 6,
p. 015106,
2016.
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Fan-Yong Ran,
Zewen Xiao,
Hidenori Hiramatsu,
Keisuke Ide,
Hideo Hosono,
Toshio Kamiya.
SnS thin films prepared by H2S-free process and its p-type thin film transistor,
AIP Adv.,
Vol. 6,
pp. 015112-1 - 6,
2016.
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Christian A. Niedermeier,
Sneha Rhode,
Sarah Fearn,
Keisuke Ide,
Michelle A. Moram,
Hidenori Hiramatsu,
Hideo Hosono,
Toshio Kamiya.
Solid phase epitaxial growth of high mobility La:BaSnO3 thin films co-doped with interstitial hydrogen,
Appl. Phys. Lett.,
Vol. 108,
pp. 172101-1 -5,
2016.
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Junghwan KIM,
Norihiko MIYOKAWA,
Keisuke IDE,
Hidenori HIRAMATSU,
Hideo HOSONO,
Toshio KAMIYA.
Transparent amorphous oxide semiconductor thin film phosphor, In–Mg–O:Eu,
J. Cerm. Soc. Jpn.,
Vol. 124,
pp. 532-535,
2016.
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Haochun Tang,
Keisuke Ide,
Hidenori Hiramatsu,
Shigenori Ueda,
Naoki Ohashi,
Hideya Kumomi,
Hideo Hosono,
Toshio Kamiya.
Effects of thermal annealing on elimination of deep defects in amorphous In–Ga–Zn–O thin-film transistors,
Thin Solid Films,
Vol. 614,
73-78,
2016.
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