論文

• Yukihide Kohira, Chikaaki Kodama, Tomomi Matsui, Atsushi Takahashi, Shigeki Nojima, Satoshi Tanaka. Yield-aware mask assignment by positive semidefinite relaxation in triple patterning using cut process, Journal of Micro/Nanolithography, MEMS, and MOEMS (JM3), Vol. 15, No. 2, pp. 1-7, Mar. 2016.

国際会議発表 (査読有り)

• Yukihide Kohira, Atsushi Takahashi, Tomomi Matsui, Chikaaki Kodama, Shigeki Nojima, Satoshi Tanaka. Manufacturability-aware Mask Assignment in Multiple Patterning Lithography, Proc. the 2016 IEEE Asia-Pacific Conference on Circuits and Systems (APCCAS 2016), pp. 538-541, Oct. 2016.  公式リンク  
  

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