論文

• Takahisa Shiraishi, Kiliha Katayama, Tatsuhiko Yokouchi, Takao Shimizu, Takahiro Oikawa, Osami Sakata, Hiroshi Uchida, Yasuhiko Imai, Takanori Kiguchi, Toyohiko J. Konno, Hiroshi Funakubo. Effect of the film thickness on the crystal structure and ferroelectric properties of (Hf0.5Zr0.5)O2 thin films deposited on various substrates, Materials Science in Semiconductor Processing, vol. 70, pp. 239–245, Nov. 2017.
• Takao Shimizu, Tatsuhiko Yokouchi, Takahiro Oikawa, Takahisa Shiraishi, Takanori Kiguchi, Akihiro Akama, Toyohiko J. Konno, Alexei Gruverman, Hiroshi Funakubo. Contribution of oxygen vacancies to the ferroelectric behavior of Hf0.5Zr0.5O2 thin films, Appl. Phys. Lett., Vol. 106, pp. 112904-1-5, Mar. 2015.
• Takao Shimizu, Tatsuhiko Yokouchi, Takahisa Shiraish, Takahiro Oikawa, P. S. Sankara Rama Krishnan, Hiroshi Funakubo. Study on the effect of heat treatment conditions on metalorganic-chemical-vapor-deposited ferroelectric Hf0.5Zr0.5O2 thin film on Ir electrode, Jpn. J. Appl. Phys., Vol. 53, pp. 09PA04-1-6, 2014.

国際会議発表 (査読有り)

• Hiroshi Funakubo, Takahisa Shiraishi, Tatsuhiko Yokouchi, Takahiro Oikawa, Hiroshi Uchida. Effect of Stress on Ferroelectricity of (Hf0.5Zr0.5)O2 Thin Films, 2015 MRS Fall Meeting & Exhbit, Nov. 2015.
• H.Funakubo, T.Shiraishi, T.Shimizu, T.Yokouchi, T.Oikawa, H.Uchida. Effect of Stress on Ferroelectricity of (Hf0.5Zr0.5)O2 Thin Films, SSDM 2015, Sept. 2015.

国際会議発表 (査読なし・不明)

• Takao Shimizu, Kiriha Katayama, Tatsuhiko Yokouchi, Takahiro Oikawa, Takahisa Shiraishi, Takanori Kiguchi, Toyohiko Konno, Hiroshi Uchida, Hiroshi Funakubo. Preparation of Fluorite-Structured Ferroelectric Thin Films and Their Characterization, 015 International Workshop on Dielectric Thin Films for future electron devices-science and technology, Nov. 2015.

国内会議発表 (査読なし・不明)

• 白石貴久, 片山きりは, 横内達彦, 清水荘雄, 及川貴弘, 内田 寛, 舟窪 浩, 木口賢紀, 今野豊彦. 種々の基板上に作製した (Hf0.5Zr 0.5)O2薄膜の特性, 第35回エレクトロセラミックス研究討論会, Oct. 2015.
• 舟窪 浩, 白石 貴久, 片山 きりは, 横内 達彦, 清水 荘雄, 及川 貴弘, 内田 寛. (Hf0.5Zr0.5)O2 薄膜の強誘電性に及ぼす歪の効果, 日本金属学会２０１５年秋期講演大会, Sept. 2015.
• 中村奨梧, 範滄宇, 白石貴久, 木口賢紀, 今野豊彦, 片山きりは, 清水荘雄, 横内達彦, 及川貴弘, 舟窪浩. ABF-STEM 法を用いた斜方晶HfO2の分極構造の解析, 日本セラミックス協会第28回秋季シンポジウム, Sept. 2015.

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