論文

• Kazuaki Suzuki, Ian Haig. Investigation of the application of phase contrast imaging using a point X-ray source to industrial non-destructive testing, Phil. Trans. R. Soc. A, Royal Society Publishing, Vol. 372, p. 20130036, Jan. 2014.
• O. R. Wood II, W. J. Trybula, J. Greschner, S. Kalt, T. Bayer, S. Shimizu, H. Yamamoto, Kazuaki Suzuki, M. S. Gordon, C. F. Robinson, R. S. Dhaliwal, C. W. Thiel, N. Caldwell, M. S. Lawliss, C. Huang. Ultrathin membrane masks for electron projection lithography, J. Vac. Sci. Technol. B, American Vacuum Society, Vol. 22, pp. 3072-3076, Dec. 2004.
• Kazuaki Suzuki, N. Hirayanagi, T. Fujiwara, A. Yamada, J. Ikeda, T. Yahiro, S. Kojima, J. Udagawa, H. Yamamoto, N. Katakura, M. Suzuki, T. Aoyama, H. Takekoshi, T. Umemoto, H. Shimizu, S. Fukui, S. Suzuki, T. Okino, Y. Ohkubo, T. Shimoda, T. Tanida, Y. Watanabe, Y. Kohama, K. Ohmori, F. Mori, S. Takemoto, T. Yoshioka, H. Hirose, K. Morita, K. Hada, S. Kawata, Y. Kakizaki, T. Miura. Full-field exposure performance of electron projection lithography tool, J. Vac. Sci. Technol. B, American Vacuum Society, Vol. 22, No. 6, pp. 2885-2890, Dec. 2004.
• Kazuaki Suzuki, T. Fujiwara, S. Kojima, N. Hirayanagi, T. Yahiro, J. Udagawa, S. Shimizu, H. Yamamoto, M. Suzuki, H. Takekoshi, S. Fukui, M. Hamashima, J. Ikeda, T. Okino, H. Shimizu, S. Takahashi, A. Yamada, T. Umemoto, S. Katagiri, Y. Ohkubo, T. Shimoda, K. Hirose, T. Tanida, Y. Watanabe, T. Kaminaga, Y. Kohama, F. Mori, S. Takemoto, T. Yoshioka, H. Hirose, K. Morita, K. Hada, S. Kawata, T. Sato, Y. Sato, M. Tokunaga, K. Okamoto, Y. Kakizaki, T. Miura. First dynamic exposure results from an electron projection lithography tool, J. Vac. Sci. Technol. B, American Vacuum Society, Vol. 21, No. 6, pp. 2686-2690, Dec. 2003.
• Kazuaki Suzuki, S. Shimizu. Development status of EPL technology, J. Photopolym. Sci. Technol., Vol. 15, No. 3, pp. 395-402, June 2002.
• S. Kawata, M. Hamashima, T. Miura, Kazuaki Suzuki, K. Okamoto, T. Yamaguchi. Progress and preliminary results on EB stepper, JPN. J. APPL. PHYS., Vol. 41, pp. 4136-4140, 2002.
• T. Yahiro, N. Hirayanagi, T. Irita, H. Shimizu, Kazuaki Suzuki. High-accuracy aerial image measurement for electron beam projection lithography, J. Microtith., Microfab., Microsyst., Vol. 1, pp. 136-143, 2002.
• T. Yahiro, S. Suzuki, T. Irita, S. Kawata, Kazuaki Suzuki. Direct measurement of chromatic aberrations induced by SiNx continuous membrane mask, J. Vac. Sci. Technol. B, American Vacuum Society, Vol. 20, pp. 2634-2639, 2002.
• T. Yahiro, S. Suzuki, T. Irita, N. Hirayanagi, H. Shimizu, S. Kojima, K. Morita, S. Kawata, T. Okino, Kazuaki Suzuki. Direct measurement of Coulomb effects in electron beam projection lithography, J. Vac. Sci. Technol. B, American Vacuum Society, Vol. 19, pp. 2468-2473, 2001.
• S.D. Golladay, H.C. Pfeiffer, C.A. Bohnenkamp, R.S. Dhaliwal, W.A. Enichen, M.S. Gordon, R.A. Kendall, J.E. Lieberman, W. Stickel, J.D. Rockrohr, E.V. Tressler, A. Tanimoto, T. Yamaguchi, K. Okamoto, Kazuaki Suzuki, T. Miura, T. Okino, S. Kawata, K. Morita, S. Suzuki, H. Shimizu, S. Kojima, G. Varnell, W.T. Novak, M. Sogard. PREVAIL - EPL alpha tool: Early results, J. Vac. Sci. Technol. B, American Vacuum Society, Vol. 19, pp. 2459-2467, 2001.
• H.C. Pfeiffer, R.S. Dhaliwal, S.D. Golladay, S.K. Doran, M.S. Gordon, T.R. Groves, R.A. Kendall, J.E. Lieberman, P.E. Petric, D.J. Pinckney, R.J. Quickle, C.F. Robinson, J.D. Rockrohr, J.J. Senesi, W. Stickel, E.V. Tressler, A. Tanimoto, T. Yamaguchi, K. Okamoto, Kazuaki Suzuki, T. Okino, S. Kawata, K. Morita, S. Suzuki, H. Shimizu, S. Kojima, G. Varnell, W.T. Novak, D.P. Stumbo, M. Sogard. Projection reduction exposure with variable axis immersion lenses: Next generation lithography, J. Vac. Sci. Technol. B, American Vacuum Society, Vol. 17, pp. 2840-2846, 1999.
• Kazuaki Suzuki, ken Ozawa, Osamu Tanitsu, Masato Go. Dosage control for scanning exposure with pulsed energy fluctuation and exposed position jitter, JPN. J. APPL. PHYS., Vol. 34, pp. 6565-6572, Dec. 1995.
• Akira Miyaji, Kazuaki Suzuki, Akikazu Tanimoto. Excimer lithography for ULSI, Optical and Quantum Electronics, Chapman & Hall, Vol. 25, pp. 297-310, 1993.
• Kazuaki Suzuki, Yukako Matsumoto, Masayuki Murayama. The method of measuring optical performance in KrF excimer lithography, JPN. J. APPL. PHYS., Vol. 31, pp. 4167-4173, 1992.
• Y. Tanaka, M. Fujii, H. Inoue, Nobuyuki Kawai, K. Koyama, Y. Maejima, F. Makino, K. Makishima, M. Matsuoka, K. Mitsuda, T. Murakami, J. Nishimura, M. Oda, Y. Ogawara, T. Ohashi, N. Shibazaki, Kazuaki Suzuki, I. Waki, T. Yamagami, I. Kondo, H. Murakami, S. Hayakawa, T. Hirano, H. Kunieda, K. Masai, F. Nagase, N. Sato, Y. Tawara, S. Kitamoto, S. Miyamoto, H. Tsunemi, K. Yamashita, M. Nakagawa. X-ray astronomy satellite Tenma, Publ. Astron. Soc. Japan, Vol. 36, pp. 641-658, 1984.
• K. Mitsuda, H. Inoue, K. Koyama, K. Makishima, M. Matsuoka, Y. Ogawara, N. Shibazaki, Kazuaki Suzuki, Y. Tanaka, T. Hirano. Energy spectra of low-mass binary X-ray sources observed from Tenma, Publ. Astron. Soc. Japan, Vol. 36, pp. 741-759, 1984.
• K. Koyama, T. Ikegami, H. Inoue, Nobuyuki Kawai, K. Makishima, M. Matsuoka, K. Mitsuda, T. Murakami, Y. Ogawara, T. Ohashi, Kazuaki Suzuki, Y. Tanaka, I. Waki. Performance verification of the gas scintillation proportional counters on board the Tenma Satellite, Publ. Astron. Soc. Japan, Vol. 36, pp. 659-666, 1984.
• Kazuaki Suzuki, M. Matsuoka, H. Inoue, K. Mitsuda, T. Ohashi, Y. Tanaka, T. Hirano, S. Miyamoto. Detection of iron K-emission lines from low-mass bunary X-ray sources; Scorpious X-1 and 4U 1608-52, Publ. Astron. Soc. Japan, Vol. 36, pp. 761-767, 1984.
• T. Ohashi, H. Inoue, K. Koyama, F. Makino, M. Matsuoka, Kazuaki Suzuki, Y. Tanaka, S. Hayakawa, H. Tsunemi, K. Yamashita. Properties of the iron line from Vela X-1, Publ. Astron. Soc. Japan, Vol. 36, pp. 699-707, 1984.

著書

• 鈴木一明. EUVリソグラフィと露光装置, EUVリソグラフィ技術 ～レジスト材料・光源・露光装置技術・各種構成の変遷と現状～, 株式会社 AndTech, May 2023.
• Bruce W. Smith, Kazuaki Suzuki. Microlithography, Science and Technology, Third Edition, CRC Press, May 2020.  公式リンク  
• T. Miura, Kazuaki Suzuki, H. Arimoto, S. Kawata. Chap.9 Electron Projection Lithography, Nanofabrication: Fundamentals and Applications (A.A. Tseng (Editor)), World Scientific Publishing, pp. 285-340, 2008.  公式リンク  
• Kazuaki Suzuki, Bruce W. Smith. Microlithography, Science and Technology, Second Edition, CRC Press, May 2007.  公式リンク  
• 鈴木一明. パターン露光装置（I）, ULSI製造装置実用便覧, サイエンス・フォーラム, pp. 370-377, 1991.

国際会議発表 (査読有り)

• Norihiro Matsunaga, Tomoya Sato, Atsushi Yamada, Masayuki Zaike, Toshinori Tsuruya, Tadashi Hatano, Masashi Yamamoto, Kazuaki Suzuki. Application of a compact X-ray source with small focal spot using a 950 keV linear accelerator, International Symposium on Digital Industrial Radiology and Computed Tomography - DIR2019, July 2019.  公式リンク  
  
• Norihito Matsunaga, Tomoya Sato, Atsushi Yamada, Masayuki Zaike, Toshinori Tsuruya, Kosuke Nakanishi, Tadashi Hatano, Masashi Yamamoto, Kazuaki Suzuki. Development of 950 kV X-ray source with small focal spot using a linear accelerator, 9th International Conference on Industrial Computed TomographyItaly, Feb. 2019.  公式リンク  
  
• J. Ikeda, A. Yamada, S. Shimizu, N. Hirayanagi, Kazuaki Suzuki. Application of electron projection lithography to contacts in 65nm node and beyond, 16th MicroProcesses and nanotechnology conference, Digest of papers of 16th MicoProcesses and Nanotechnology Conference, pp. 12-13, Oct. 2003.
• Kazuaki Suzuki. Photo-stitchnig by a high resolution optical stepper, 1st MicroProcess Conference, Digest of papers of 1st MicroProcess Conference, pp. 46-47, 1988.

国際会議発表 (査読なし・不明)

• T. Toki, P. Izikson, J. Kosugi, N. Sakasai, K. Saotome, Kazuaki Suzuki, D. Kandel, J. Robinson, Y. Koyanagi. Simultaneous optimization of dose and focus controls in advanced ArF immersion scanners, SPIE Advanced Lithography, Proceeding of SPIE, Vol. 7640, pp. 764016-1-8, 2010.
• T. Miura, K. Murakami, Kazuaki Suzuki, Y. Kohama, K. Morita, K. Hada, Y. Ohkubo, H. Kawai. Nikon EUVL development progress update, SPIE Advanced Lithography, Proceeding of SPIE, Vol. 6921, pp. 69210M-1-10, 2008.
• T. Miura, K. Murakami, Kazuaki Suzuki, Y. Kohama, K. Morita, K. Hada, Y. Ohkubo. Nikon EUVL development progress update, SPIE Advanced Lithography, Proceeding of SPIE, Vol. 6517, pp. 651707-1-10, 2007.
• T. Miura, K. Murakami, Kazuaki Suzuki, Y. Kohama, Y. Ohkubo, T. Asami. Nikon EUVL development progress summary, Proceeding of SPIE, Vol. 6151, pp. 615105-1-10, 2006.
• C. Romeo, P. Cantu, D. Henry, H. Takekoshi, N. Hirayanagi, Kazuaki Suzuki, M. McCallum, H. Fujita, T. Takikawa, M. Hoga. Device based evaluation of electron projection lithography, SPIE Microlithography, Proceeding of SPIE, Vol. 5751, pp. 699-706, 2005.
• T. Miura, S. Kawata, K. Hada, Y. Kakizaki, M. Miyazaki, Kazuaki Suzuki, N. Hirayanagi, A. Yamada, J. Ikeda, T. Yahiro, J. Udagawa, H. Takekoshi, T. Umemoto, Y. Ohkubo, T. Shimoda, T. Tanida, Y. Watanabe, K. Ohmori, F. Mori, S. Takemoto, T. Yoshioka, K. Morita. Nikon EPL tool: the latest development status and results, SPIE Microlithography, Proceeding of SPIE, Vol. 5751, pp. 471-482, 2005.
• T. Fujiwara, N. Hirayanagi, J. Udagawa, J. Ikeda, S. Shimizu, H. Takekoshi, Kazuaki Suzuki. Total performance of Nikon EB stepper R&D tool, SPIE Microlithography, Proceeding of SPIE, Vol. 5374, pp. 468-477, 2004.
• Sumito Shimizu, Kazuaki Suzuki. CD controllability of proximity effect correction in EPL, SPIE Microlithography, Proceeding of SPIE, Vol. 5037, pp. 983-990, 2003.
• H. Yamamoto, T. Aoyama, N. Hirayanagi, Kazuaki Suzuki. Distortion management strategy for EPL reticles, SPIE Microlithography, Proceeding of SPIE, Vol. 5037, pp. 991-998, 2003.
• N. Hirayanagi, T. Fujiwara, K. Hada, T. Shimoda, Kazuaki Suzuki. Nikon EB stepper: its system design and preliminary performance, SPIE Advanced Lithograpgy, Proceeding of SPIE, Vol. 5037, pp. 504-511, 2003.
• Kazuaki Suzuki. EPL Technology Development, Photomask Japan, Proceeding of SPIE, Vol. 4654, pp. 775-789, 2002.
• Kazuaki Suzuki, T. Fujiwara, K. Hada, N. Hirayanagi, S. Kawata, K. Morita, K. Okamoto, T. Okino, S Shimizu, T. Yahiro, H. Yamamoto. Nikon EB stepper: the latest development status, SPIE Microlithography, Proceeding of SPIE, Vol. 4343, pp. 80-87, 2001.
• T. Fujiwara, T. Irita, S. Shimizu, H. Yamamoto, Kazuaki Suzuki. Highly accurate CD control at stitching region for electron-beam projection lithography, SPIE Microlithography, Proceeding of SPIE, Vol. 4343, pp. 727-735, 2001.
• Kazuaki Suzuki. Nikon's lithography roadmap and the development status of EB Stepper, SEMI TEchnology Symposium 2000, Proceeding of SEMI Technology Symposium 2000, SEMI, pp. 3-37 - 3-43, Dec. 2000.
• K. Morita, T. Yahiro, S. Shimizu, H. Yamamoto, N. Hirayanagi, T. Fujiwara, S. Suzuki, H. Shimizu, S. Kawata, T. Okino, Kazuaki Suzuki. Data of scattered electron characteristics in 100kV EB stepper, SPIE Microlithography, Proceeding of SPIE, Vol. 3997, pp. 703-712, 2000.
• T. Okino, Kazuaki Suzuki, K. Okamoto, S. Kawata, K. Uchikawa, S. Suzuki, S. Shimizu, T. Fujiwara, A. Yamada, K. Kamijo. Investigation of proximy effect correction in electron projection lithography (EPL), SPIE Microlithography, Proceeding of SPIE, Vol. 3997, pp. 235-244, 2000.
• Kazuaki Suzuki, T. Fujiwara, K. Hada, N. Hirayanagi, S. Kawata, K. Morita, K. Okamoto, T. Okino, S. Shimizu, T. Yahiro. Nikon EB stepper: its system concept and countermeasure for critical issues, SPIE Microlithography, Proceeding of SPIE, Vol. 3997, pp. 214-224, 2000.
• Kazuaki Suzuki, Shinji Wakamoto, Kenji Nishi. KrF step and scan exposure system using higher N.A. projection lens, SPIE Microlithography, Proceeding of SPIE, Vol. 2726, pp. 767-779, 1996.

国内会議発表 (査読なし・不明)

• 鈴木一明. EUVリソグラフィの最新状況と高エネルギーリソグラフィに対する一考察, 第155回有機エレクトロニクス材料研究会, 第155回JOEM講演要旨集, pp. 25-31, July 2006.
• 鈴木一明. 電子線投影露光装置（EPL）, NGL2003 次世代リソグラフィワークショップ, NGL2003 次世代リソグラフィワークショップ予稿集, 応用物理学会 次世代リソグラフィ技術研究会, pp. 7-10, July 2003.

その他の論文・著書など

• 鈴木一明. EUVリソグラフィと露光装置, 月刊クリーンテクノロジー, 日本工業出版, No. 5, pp. 25-31, May 2024.
• 鈴木一明. 卓越博士育成のための産学協創教育－東京工業大学 物質・情報卓越教育院の取り組み－, エストレーラ, 公益財団法人 統計情報研究開発センター, No. 322, Jan. 2021.
• 鈴木一明. X線CT技術, O plus E, アドコム・メディア, Vol. 39, No. 1, pp. 38-41, Jan. 2017.
• 鈴木一明. 露光装置の性能を最大限活用するAPC/AEC, O plus E, アドコム・メディア, Vol. 32, pp. 1079-1083, Sept. 2010.
• 鈴木一明. Alternative Lithographic Technologies (SPIE Advanced Lithography 2009), 応用物理学会分科会シリコンテクノロジー, 応用物理学会, No. 112, pp. 3-6, May 2009.
• S. P. Renwick, D. Williamson, Kazuaki Suzuki, K. Murakami. Optical Lithography in the Extreme UV, Optics and Photonics News, Vol. 10, pp. 34-39, 2007.
• 鈴木一明. The 3rd International EPL Workshop Report, 電子ジャーナル, 電子ジャーナル, No. 128, pp. 124-125, Nov. 2004.
• 鈴木一明. EPL技術, オプトロニクス, オプトロニクス社, Vol. 22, No. 4, pp. 141-145, 2003.
• 鈴木一明. ニコンのEPL装置, 電子ジャーナル, 電子ジャーナル, No. 105, pp. 92-93, Dec. 2002.
• 鈴木一明. 電子ビームリソグラフィ技術, 電気学会誌, Vol. 120, No. 6, pp. 348-351, June 2000.
• K. Okamoto, Kazuaki Suzuki, H. Pfeiffer, M. Sogard. High-throughput e-beam stepper lithography, Solid State Technology, No. 5, p. 118, May 2000.
• 鈴木一明. EPL技術の特徴と今後の展望, 電気学会光応用・視覚研究会, 電気学会光応用・視覚研究会資料, pp. 23-28, 2000.
• 鈴木一明. 256MDRAM量産対応スキャン形エキシマレーザステッパ「NSR-S201A」, 電子材料, 工業調査会, No. 3, pp. 107-111, Mar. 1995.
• 鈴木一明. エキシマレーザステッパ, 電子材料, No. 3, pp. 76-80, Mar. 1992.
• 鈴木一明, 池上健, 井上一, 小山勝二, 松岡勝, 大橋隆哉, 田中靖郎, 和気泉. 「天馬」搭載蛍光比例計数管の特性, 宇宙科学研究所報告, Vol. 30, pp. 1-29, Dec. 1985.

学位論文

• 微細化パターンの結像特性に基づくリソグラフィ用露光装置のシステム設計,  本文,  博士(工学),  東京大学,  2017/10/12,   公式リンク  公式リンク  

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