|
Publication List - Kiriha Katayama 2015 (12 / 22 entries)
International Conference (Not reviewed / Unknown)
-
Takao Shimizu,
Kiriha Katayama,
Takahisa Shiraishi,
Takanori Kiguchi,
Shogo Nakamura,
Toyohiko Konno,
Hiroshi Funakubo.
Ferroelectricity in HfO2-based epitaxial thin film,
Pacifichem 2015,
Dec. 2015.
-
Takao Shimizu,
Kiriha Katayama,
Tatsuhiko Yokouchi,
Takahiro Oikawa,
Takahisa Shiraishi,
Takanori Kiguchi,
Toyohiko Konno,
Hiroshi Uchida,
Hiroshi Funakubo.
Preparation of Fluorite-Structured Ferroelectric Thin Films and Their Characterization,
015 International Workshop on Dielectric Thin Films for future electron devices-science and technology,
Nov. 2015.
-
K. Katayama,
T. Shimizu,
O. Sakata,
T. Kiguchi,
A. Akama,
T. J. Konno,
S. Nakamura,
H. Uchida,
H. Funakubo.
Growth and structural analysis of epitaxial orthorhombic YO1.5-HfO2 thin films,
NIMS Conference 2015,
July 2015.
Domestic Conference (Not reviewed / Unknown)
-
中村奨梧,
Takanori Kiguchi,
Takahisa Shiraishi,
範 滄宇,
Toyohiko Konno,
Kiriha Katayama,
Takao Shimizu,
HIROSHI FUNAKUBO.
斜方晶ハフニア薄膜の強誘電相構造,
第35回エレクトロセラミックス研究討論会,
Oct. 2015.
-
Takahisa Shiraishi,
Kiriha Katayama,
Tatsuhiko Yokouchi,
Takao Shimizu,
及川貴弘,
Hiroshi Uchida,
HIROSHI FUNAKUBO,
Takanori Kiguchi,
Toyohiko Konno.
種々の基板上に作製した (Hf0.5Zr 0.5)O2薄膜の特性,
第35回エレクトロセラミックス研究討論会,
Oct. 2015.
-
HIROSHI FUNAKUBO,
Takahisa Shiraishi,
Kiriha Katayama,
Tatsuhiko Yokouchi,
Takao Shimizu,
及川 貴弘,
Hiroshi Uchida.
(Hf0.5Zr0.5)O2 薄膜の強誘電性に及ぼす歪の効果,
日本金属学会2015年秋期講演大会,
Sept. 2015.
-
Takao Shimizu,
Kiriha Katayama,
Takanori Kiguchi,
赤間 章裕,
Toyohiko Konno,
Hiroshi Uchida,
Osami Sakata,
HIROSHI FUNAKUBO.
斜方晶エピタキシャルHfO2基薄膜のドメイン構造,
第76回応用物理学会秋季学術講演会,
Sept. 2015.
-
Kiriha Katayama,
Takao Shimizu,
Takanori Kiguchi,
赤間 章裕,
Toyohiko Konno,
Hiroshi Uchida,
Osami Sakata,
HIROSHI FUNAKUBO.
Si基板上への斜方晶エピタキシャルHfO2基薄膜の作製,
第76回応用物理学会秋季学術講演会,
Sept. 2015.
-
中村奨梧,
範滄宇,
Takahisa Shiraishi,
Takanori Kiguchi,
Toyohiko Konno,
Kiriha Katayama,
Takao Shimizu,
Tatsuhiko Yokouchi,
及川貴弘,
HIROSHI FUNAKUBO.
ABF-STEM 法を用いた斜方晶HfO2の分極構造の解析,
日本セラミックス協会第28回秋季シンポジウム,
Sept. 2015.
-
Kiriha Katayama,
Takao Shimizu,
Takahisa Shiraishi,
及川貴弘,
Takanori Kiguchi,
赤間章裕,
Toyohiko Konno,
中村奨梧,
Hiroshi Uchida,
HIROSHI FUNAKUBO.
斜方晶相を含むエピタキシャルHfO2 基薄膜の作製と評価,
第32回強誘電体応用会議(FMA 32),
May 2015.
-
阿部千穂子,
塩川真里奈,
Kiriha Katayama,
Takahisa Shiraishi,
Takao Shimizu,
HIROSHI FUNAKUBO,
Hiroshi Uchida.
CSD 由来HfO2-ZrO2 固溶体薄膜の結晶構造と誘電特性,
第32回強誘電体応用会議(FMA 32),
May 2015.
Patent
[ Save as BibTeX ]
[ Paper, Presentations, Books, Others, Degrees: Save as CSV
]
[ Patents: Save as CSV
]
|