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Publication List - Yota Takamura 2012 (4 / 242 entries)
Journal Paper
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Y. Takamura,
K. Hayashi,
Y. Shuto,
R. Nakane,
S. Sugahara.
Fabrication of High-Quality Co2FeSi/SiOxNy/Si(100) Tunnel Contacts Using Radical-Oxynitridation-Formed SiOxNy Barrier for Si-Based Spin Transistors,
J. Electron. Mater.,
Springer,
vol. 41,
no. 5,
pp. 954-958,
Apr. 2012.
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Y. Takamura,
S. Sugahara.
Analysis and control of the Hanle effect in metal–oxide–semiconductor inversion channels,
J. Appl. Phys.,
American Institute of Physics,
vol. 111,
Issue 7,
pp. 07C323/1-3,
Mar. 2012.
Domestic Conference (Not reviewed / Unknown)
Degree
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