Journal Paper

• Mina Sato, Mie Tohnishi, Miho Fujimoto, Akihiro Matsutani. Sub-micrometer-sized Patterning of Photoresist by Electron Beam Projection Lithography Using Tabletop Scanning Electron Microscopy System and Stencil Masks, Sensors and Materials, Vol. 37, No. 3, pp. 977-985, Mar. 2025.

International Conference (Reviewed)

• Akihiro Matsutani, Mina Sato, Miho Fujimoto, Mie Tohnishi. SF6/CO2-based Deep Reactive Ion Etching of Si, 38th International Microprocesses and nanotechnology Conference (MNC2025), 19P-1-92L, Nov. 2025.
• Mie Tohnishi, Mina Sato, Akihiro Matsutani. Investigation of magnet placement effect on plasma density and etching profile in Si plasma etching, MNC 2025, Nov. 2025.
• Mina Sato, Mie Tohnishi, Akihiro Matsutani. Dependence of Etching Rate Ratio on Ion Energy and Crystal Orientation for KOH Etching of Amorphized Si Etching Masks Formed by N+ Irradiation, MNC2025 (38th International Microprocesses and Nanotechnology Conference), Nov. 2025.

Domestic Conference (Not reviewed / Unknown)

• Mie Tohnishi, Mina Sato, Akihiro Matsutani. SmCo磁石で高密度化されたRIEチャンバー内のプラズマ分布の観察, 第86回応用物理学会秋季学術講演会, Sept. 2025.
• Mina Sato, Mie Tohnishi, Akihiro Matsutani. N+照射により形成したアモルファス化SiエッチングマスクのKOHエッチングに対するエッチング速度のイオンエネルギー依存性, 第86回応用物理学会秋季学術講演会, Sept. 2025.
• Mina Sato, Mie Tohnishi, Miho Fujimoto, Akihiro Matsutani. 卓上SEM とステンシルマスクを用いたEPL 法の開発, 第72回応用物理学会春季学術講演会, Mar. 2025.
• 小澤 亮太, 水書 稔治,, 津久井遼, 山本広大, Miho Fujimoto, Mina Sato, Mie Tohnishi, Akihiro Matsutani. 複屈折結 晶を利用した位相変位干渉計素子の試作と光学的特性, 2024 年衝撃波シンポジウム, 1B4-2, Mar. 2025.

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