Journal Paper

• Hiroyoshi Tanabe, Akira Jinguji, Atsushi Takahashi. Weakly guiding approximation of a three dimensional waveguide model for extreme ultraviolet lithography simulation, Journal of the Optical Society of America A, Optica Publishing Group, Vol. 41, Issue 8, pp. 1491-1499, July 2024.
• Hiroyoshi Tanabe, Akira Jinguji, Atsushi Takahashi. Accelerating extreme ultraviolet lithography simulation with weakly guiding approximation and source position dependent transmission cross coefficient formula, Journal of Micro/Nanopatterning, Materials, and Metrology, Vol. 23, Issue 1, 014201, Jan. 2024.

International Conference (Reviewed)

• Hiroyoshi Tanabe, Akira Jinguji, Atsushi Takahashi. Pre-training CNN for fast EUV lithography simulation including M3D effects, Proc. SPIE 12954, DTCO and Computational Patterning III, 129540I, Society of Photo-Optical Instrumentation Engineers (SPIE), Apr. 2024.

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