論文

• Hsi-Chih Wang, Takehiro Seshimo, Takahiro Dazai, Kazufumi Sato, Kan Hatakeyama, Yuta Nabae, Teruaki Hayakawa. Development of PS-PMMA Block Copolymers Incorporating Poly(n-butyl methacrylate) for Low Temperature Thermal Annealing toward Perpendicular Microdomain Alignment, Journal of Photopolymer Science and Technology, Vol. 38, No. 3, pp. 223-230, June 2025.
• Ryota Uehara, Shinsuke Maekawa, Takehiro Seshimo, Sugawara Ryutaro, Takahiro Dazai, Kazufumi Sato, Kan Hatakeyama, Yuta Nabae, Teruaki Hayakawa. The Effect of Side-Chain Modification via Hydrogen Bonding on the Microphase-Separated Structure of PS-b-P4VP-b-PMMA, Journal of Photopolymer Science and Technology, Vol. 38, No. 3, pp. 205-210, June 2025.
• Shinsuke Maekawa, Lander Verstraete, Hyo Seon Suh, Takehiro Seshimo, Takahiro Dazai, Kazufumi Sato, Kan Hatakeyama, Yuta Nabae, Teruaki Hayakawa. High-Fidelity Directed Self-Assembly Using Higher-chi Polystyrene-Block-Poly(Methyl Methacrylate) Derivatives for Dislocation-Free Sub-10 nm Features, Advanced Functional Materials, John Wiley & Sons, Ltd, Vol. n/a, No. n/a, pp. 2421066, Jan. 2025.  公式リンク  
  
• Riku Mizusaki, Shinsuke Maekawa, Takehiro Seshimo, Takahiro Dazai, Kazufumi Sato, Kan Hatakeyama-Sato, Yuta Nabae, Teruaki Hayakawa. Dual function of precisely modified hydroxy-PS-b-PMMA as neutral layers and thin films for perpendicularly oriented lamella, RSC Applied Interfaces, RSC, Vol. 2, No. 1, pp. 74-81, Aug. 2024.  公式リンク  
  
• Shinsuke Maekawa, Takehiro Seshimo, Takahiro Dazai, Kazufumi Sato, Kan Hatakeyama, Yuta Nabae, Teruaki Hayakawa. Chemically tailored block copolymers for highly reliable sub-10-nm patterns by directed self-assembly, Nature Communications, Vol. 15, No. 1, pp. 5671, July 2024.  公式リンク  
  
• Lei Dong, Rin Odashima, Takehiro Seshimo, Yuta Nabae, Teruaki Hayakawa. Synthesis and Morphology Studies of Polysiloxane-based Triblock Copolymers, Journal of Photopolymer Science and Technology, Vol. 32, No. 6, pp. 817-822, Nov. 2019.

学位論文

• Perpendicular Orientation Control of Si-Containing Block Copolymer Domains for Next Generation Lithography,  Thesis,  Doctor (Engineering),  Tokyo Institute of Technology,  2016/03/26, 
• Perpendicular Orientation Control of Si-Containing Block Copolymer Domains for Next Generation Lithography,  Exam Summary,  Doctor (Engineering),  Tokyo Institute of Technology,  2016/03/26,   
• Perpendicular Orientation Control of Si-Containing Block Copolymer Domains for Next Generation Lithography,  Summary,  Doctor (Engineering),  Tokyo Institute of Technology,  2016/03/26,   
• Perpendicular Orientation Control of Si-Containing Block Copolymer Domains for Next Generation Lithography,  Outline,  Doctor (Engineering),  Tokyo Institute of Technology,  2016/03/26,   

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