Journal Paper

• Ryosuke Yamauchi, Keisuke Kobayashi, Makoto Hosaka, Toshimasa Suzuki, Koji Koyama, Akifumi Matsuda, Hideki Arai, Yushi Kato, Masahiko Mitsuhashi, Satoru Kaneko. Fabrication of Ni/Al₂O₃/Ni Heteroepitaxial Junction by Post Hydrogen Reduction of NiO/Al2O3/NiO Tri-layered Epitaxial Thin Film, Japanese Journal of Applied Physics, The Japan Society of Applied Physics, Vol. 50, 098004, Sept. 2011.
• Ryosuke Yamauchi, Keisuke Kobayashi, Toshimasa Suzuki, Kohji Koyama, Akifumi Matsuda, Hideki Arai, Yushi Kato, Masahiko Mitsuhashi, Satoru Kaneko, Mamoru Yoshimoto. Fabrication of Ni/Al2O3/Ni Heteroepitaxial Junction by Post Hydrogen Reduction of NiO/Al2O3/NiO Tri-layered Epitaxial Thin Film, Jpn. J. Appl. Phys., Vol. 50, pp. 098004-1-098004-2, Sept. 2011.  Official location  

Other Publication

• MAMORU YOSHIMOTO, 譚 ゴオン, 宮宅ゆみ子, Akifumi Matsuda. ガラス表面の原子レベルナノインプリントパターニング –ワンダーガラスの創製をめざして–, 「未来材料」(NTS発行), Vol. 11, No. 11, pp. 14-21, Nov. 2011.

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