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Publication List - MASAHIRO ASADA 1995 (20 / 413 entries)
Journal Paper
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T. Suemasu,
Y. Kohno,
W. Saitoh,
M.Watanabe,
M. Asada.
Theoretical and measured characteristics of metal(CoSi2)/ Insulator(CaF2) resonant tunneling transistors and the influence of parasitic elements,
IEEE Trans. Electron Devices,
Vol. 42,
No. 12,
pp. 2203-2210,
Dec. 1995.
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MASAHIRO WATANABE,
W. Saitoh,
T. Suemasu,
Y. Kohno,
M. Asada.
Metal(CoSi2)/insulator(CaF2) hot electron transistor fabricated by electron-beam lithography on a Si substrate,
Jpn. J. Appl. Phys,
Vol. 34,
No. 10A,
pp. 1254-1256,
Oct. 1995.
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MASAHIRO WATANABE,
M. Watanabe,
F. Iizuka,
M. Asada.
Formation of silicon and cobalt silicide nanoparticles in CaF2,
Jpn. J. Appl. Phys,
Vol. 34,
No. 8B,
pp. 4380-4383,
Aug. 1995.
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W. Saitoh,
T. Suemasu,
Y. Kohno,
M. Watanabe,
M. Asada.
Multiple negative differential resistance due to quantum interference of Hot electron waves in metal(CoSi2)/insulator(CaF2) heterostructures and influence of parasitic elements,
Jpn. J. Appl. Phys,
Vol. 34,
No. 8B,
pp. 4481-4484,
Aug. 1995.
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MASAHIRO ASADA.
Teoretical and Measured Characteristics of Metal(CoSi2)/Insulator(CaF2) Resonant Tunneling Transistors and the Influence of Parasitic Elements,
IEEE Transactions on Electron Devices,
Vol. 42,
No. 12,
pp. 2203-2210,
1995.
-
MASAHIRO ASADA.
Multiple Negative Differential Resistance Due to Quantum Interference of Hot Electron Waves in Metal(CoSi2)/Insulator(CaF2) Heterostructures and Influence of Parasitic Elements,
Japanese Journal of Applied Physics,
Vol. 34,
pp. 4481-4483,
1995.
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M.Asada,
M.Watanabe,
T.Suemasu,
Y.Kohno,
W.Saitoh.
Epitaxial Growth of a Metal(CoSi2)/Insulator(CaF2) Nanometer-Thick Heterostructure and Its Application to Quantum-Effect Devices,
Journal of Vacuum Science and Technology,
Vol. A-13,
No. 3,
pp. 623-628,
1995.
International Conference (Reviewed)
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K. Mori,
W. Saitoh,
T. Suemasu,
Y. Kohno,
M. Watanabe,
M. Asada.
Room Temperature Observation of Multiple Negative Differential Resistance in a Metal(CoSi2)/Insulator (CaF2) Quantum Interference Transistor Structure,
Third International Symposium on “New Phenomena in Mesoscopic Structures”,
H4,
188-190,
Dec. 1995.
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M. Watanabe,
T. Suemasu,
W. Saitoh,
M. Asada.
Metal(CoSi2)/Insulator(CaF2) Heterostructure Quantum Effect Device (Invited Paper),
IEEE Lasers and Electro-Optics Society 1995 annual meeting,
(Invited) OMP 2.3,
89-90,
Oct. 1995.
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W. Saitoh,
T. Suemasu,
Y. Kohno,
M.Watanabe,
M. Asada.
Metal(CoSi2)/Insulator(CaF2) Hot Electron Transistor usig Electron-Beam Lithography on Si Substrate,
the 25th European Solid State Device Recearch Conference,
P1.7,
Sept. 1995.
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T. Suemasu,
W. Saitoh,
Y. Kohno,
M.Watanabe,
M. Asada.
Multiple Negative Differential Resistance due to Quantum Interference of Hot Electron Waves in Metal(CoSi2)/Insulator (CaF2) Heterostructure,
International Conference on the Electronic Properties of Two-Dimensional Systems,
PA7,
169-170,
Aug. 1995.
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M. Watanabe,
F. Iizuka,
M. Asada.
Photoluminescence Spectra of Silicon Nanometer Grains (<10nm) Embedded in CaF2Thin Films on Si(111),
1995 Electronic Materials Conference,
D3,
A6,
June 1995.
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T. Suemasu,
Y. Kohno,
W. Saitoh,
K. Mori,
M.Watanabe,
M. Asada.
Metal(CoSi2)/Insulator(CaF2) Resonant Tunneling and Interference Transistors Grown on Si Substrate,
International Workshop on Quantum Functional Devices,
S-11,
May 1995.
-
T. Suemasu,
W. Saitoh,
Y. Kohno,
M.Watanabe,
M. Asada.
Multiple Negative Differential Resistance due to Quantum Interference of Hot Electron Waves in Metal(CoSi2)/ Insulator(CaF2) Heterostructure,
International Workshop on Mesoscopic Physics and Electronics,
H2,
86-87,
Mar. 1995.
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M. Watanabe,
F. Iizuka,
M. Asada.
Formation of Silicon and Cobalt Silicide Nanometer Fine Particles (<10nm) in CaF2,
International Workshop on Mesoscopic Physics and Electronics,
I22,
126-127,
Mar. 1995.
Domestic Conference (Not reviewed / Unknown)
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M. Watanabe,
M. Asada,
T. Matsunuma.
Nanometer crystalline Si embedded in CaF2/Si(111) thin film,
Nat. Conv. Rec. of The Japan Soc. of Appl. Phys.,
26p-ZD-11,
1,
178,
Sept. 1995.
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K. Mori,
W.Saitoh,
T. Suemasu,
Y. Kohno,
M. Watanabe,
M. Asada.
Fabrication and Room Temperature Characterisitics of Small Area Metal (CoSi2)/ Insulator (CaF2) QIT,
Nat. Conv. Rec. of The Japan Soc. of Appl. Phys.,
28p-ZM-9,
3,
1101,
Sept. 1995.
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T. Suemasu,
Y. Kohno,
W. Saitoh,
K. Mori,
M. Watanabe,
M. Asada.
Reduction of operating voltage in Metal(CoSi2)/ Insulator(CaF2) RHET,
Nat. Conv. Rec. of The Japan Soc. of Appl. Phys.,
30p-ZK-6,
3,
1282,
Mar. 1995.
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M. Watanabe,
F. Iizuka,
M. Asada.
Photoluminescence spectra of CaF2/Si(111) thin film including Si fine particles,
Nat. Conv. Rec. of The Japan Soc. of Appl. Phys.,
29a-H-10,
2,
721,
Mar. 1995.
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W. Saitoh,
T. Suemasu,
Y. Kohno,
M. Watanabe,
M. Asada.
Fabrication and room temperature operation of Metal(CoSi2)/ Insulator(CaF2) nanometer-thick small-area hot electron transistor,
Nat. Conv. Rec. of The Japan Soc. of Appl. Phys.,
30p-ZK-7,
3,
1282,
Mar. 1995.
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