Journal Paper

• M. Ishikawa, K. Yazawa, T. Fujisawa, T. Hasegawa, T. Yamada, T. Morita, M. Kurosawa, H. Funakubo. Growth of Epitaxial KNbO3 Thick Films by Hydrothermal Method and Their Characterization, Jpn. J. Appl. Phys., vol. 48, no. 9, pp. 09KA14-1 -09KA14-5, Sept. 2009.
• Yuki Mizutani, Hiroshi Uchida, Hiroshi Funakubo, Seiichiro Koda. Preparation of (001)-Oriented CaBi4Ti4O15 and SrBi4Ti4O15 Films Using LaNiO3 Nucleation Layer on Pt-passivated Si Wafer, Jpn. J. Appl. Phys., Vol. 48, pp. 09KA10-1-4, 2009.
• Mutsuo Ishikawa, Keisuke Yazawa, Takashi Fujisawa, Shintaro Yasui, Tomoaki Yamada, Tomohito Hasegawa, Takeshi Morita, Minoru Kurosawa, Hiroshi Funakubo. Growth of Epitaxial KNbO3 Thick Films by Hydrothermal Method and Their Characterization, Jpn. J. Appl. Phys., Vol. 48, pp. 09KA14-1-4, 2009.
• Jeong Hwan Kim, Hiroshi Funakubo, Yoshihiro Sugiyama, Hiroshi Ishiwara. Characteristics of Undoped and Mn-Doped BiFeO3 Films Formed on Pt and SrRuO3/Pt Electrodes by Radio-Frequency Sputtering, Jpn. J.Appl. Phys., Vol. 48, pp. 09KB02-1-4, 2009.
• Tetsu Miyoshi, Mitsumasa Nakajima, Hiroshi Funakubo. Effects of Substrate Clamping on Electrical Properties of Polycrystalline Piezoelectric Films, Jpn. J.Appl. Phys., Vol. 48, pp. 09KD09-1-6, 2009.
• Hiroshi Funakubo, Shingo Okaura, Muneyasu Suzuki, Hiroshi Uchida, Seiichiro Koda. Effect of the Annealing Temperature on Dielectric Properties of Bi1.5Zn1.0Nb1.5O7 Films Prepared by MOCVD, Key Eng. Mater., Vol. 388, pp. 175-178, 2009.
• Ken Nishida, Hiroshi Kishi, Minoru Osada, Hiroshi Funakubo, Masamichi Nishide, Hironari Takeuchi, Takashi Katoda, Takashi Yamamoto. Raman Spectroscopy Evaluation of Oxygen Vacancy Migration by Electrical Field in Multilayer Ceramic Capacitors, Jpn. J.Appl. Phys., Vol. 48, pp. 09KF11-1-4, 2009.
• Shintaro Yokoyama, Hiroshi Funakubo, Hitoshi Morioka, Keisuke Saito, Tomoaki Yamada, Mutsuo Ishikawa. Composition dependency of epitaxial Pb(Zr,Ti)O3 films with different film thickness, Ferroelectrics, Vol. 389, No. 1, pp. 10-17, 2009.
• Kazuhisa Kawano, Hiroaki Kosuge, Noriaki Oshima, Tadashi Arii, Yutaka Sawada, Hiroshi Funakubo. Ligand Structure Effect on A Divalent Ruthenium Precursor for MOCVD, Mater. Res. Soc. Symp. Proc., Vol. 1155, pp. 1155-C09-11, 2009.
• Kaoru Miura, Tatsuo Furuta, Hiroshi Funakubo. Electronic and structure propeties of BaTiO3: Propsal about the role of Ti3s and 3p states for ferroelectricity, Solid State Commun., Vol. 150, pp. 205-208, 2009.
• Masamichi Nishide, Hiroshige Takeuchi, Takeshi Tai, Takashi Katoda, Shintaro Yokoyama, Shintaro Yasui, Hiroshi Funakubo, Ken Nishida, Takashi Yamamoto. Evaluation of Relative Volume Fraction of Tetragonal Phase and Rhombohedral Phase in Pb(Zr,Ti)O3 Film by Raman Spectroscopy, Integ. Ferro., Vol. 112, pp. 33–41, 2009.
• Shintaro Yasui, OSAMI SAKATA, Mitsumasa Nakajima, Satoru Utsugi, Keisuke Yazawa, Tomoaki Yamada, HIROSHI FUNAKUBO. Piezoelectric Properties of {100}-oriented Epitaxial BiCoO3–BiFeO3 Films Measured using Synchrotron X-ray Diffraction, Jpn. J. Appl.Phys., Vol. 48, pp. 09KD06-1-4, 2009.
• ken nishida, takashi yamamoto, Minoru Osada, OSAMI SAKATA, Shigeru Kimura, Keisuke Saito, Masamichi Nishide, Takashi Katoda, Shintaro Yokoyama, HIROSHI FUNAKUBO. Orientation controlled deposition of Pb(Zr,Ti)O3 films using micron-size patterned SrRuO3 buffer layer, J. Mater.Sci., Vol. 44, pp. 5339-5344, 2009.
• Hiroshi Nakaki, Yong Kwan Kim, Shintaro Yokoyama, Rikyu Ikariyama, Hiroshi Funakubo, Ken Nishida, Keisuke Saito, Hitoshi Morioka, Osami Sakata. Strain-relaxed structure in (001)/(100)-oriented epitaxial Pb(Zr,Ti)O3 films grown on (100) SrTiO3 substrates by metal organic chemical vapor deposition, J. Appl. Phys., Vol. 105, No. 014107, pp. 1-5, 2009.
• Kaoru Miura, Makoto Kubota, Masaki Azuma, Hiroshi Funakubo. Electronic and Structural Properties of BiZn0:5Ti0:5O3, Jpn. J. Appl. Phys., Vol. 48, pp. 09KF05-1-4, 2009.
• Satoru Utsugi, Takashi Fujisawa, Rikyu Ikariyama, Shintaro Yasui, Hiroshi Nakaki, Tomoaki Yamada, Mutsuo Ishikawa, Masaaki Matsushima, Hiroshi Funakubo. Domain structure of (100)/(001)- oriented epitaxial PbTiO3 thick films with various volume fraction of (001) orientation grown by metal organic chemical vapor deposition, Appl.Phys. Lett., Vol. 94, No. 052906, pp. 1 -3, 2009.
• T.Kondo, H.Funakubo, K.Akiyama, H.Enta, Y.Seki, M.H.Wang, T.Uchida, Y.Sawada. Deposition of undoped indium oxide thin films on stripe-patterned substrates by spray CVD, J. Crystal Growth, Vol. 311, pp. 642-646, 2009.
• Mutsuo Ishikawa, Shintaro Yasui, Satoru Utsugi, Takashi Fujisawa, Tomoaki Yamada, Takeshi Morita, Minoru Kurosawa, Hiroshi Funakubo. Growth of Epitaxial Potassium Niobate Film on (100)SrRuO3/(100)SrTiO3 by Hydrothermal Method and their Electromechanical Properties, Mater. Res. Soc. Symp. Proc., Vol. 1139, 1139-GG03-52, 2009.
• Hiroshi Naganuma, Kayoko Yamada, Hiromi Shima, Kensuke Akiyama, Takashi Iijima, Hiroshi Funakubo. Fabrication of conductive oxide polycrystalline BaPbO3 films by chemical solution deposition and their electrical resistivity, J Electroceram, Vol. 22, pp. 78-81, 2009.
• Takeshi Kondo, Yutaka Sawada, Hiroshi. Funakubo, Kensuke Akiyama, Takanori Kiguchi. Good conformability of indium-tin-oxide thin films prepared by spray chemical vapor deposition, Electrochem. Solid-State Lett., Vol. 12, No. 5, pp. D42-D44, 2009.
• Hitoshi Morioka, Keisuke Saito, Hiroshi Nakaki, Rikyu Ikariyama, Toshiyuki Kurosawa, Hiroshi Funakubo. Impact of 90o Domain Wall Motion in Pb(Zr0:43Ti0:57)O3 Film on the Ferroelectricity Induced by an Applied Electric Field, Applied Physics Express 2, pp. 041401-1 -3, 2009.
• Shintaro Yasui, Mitsumasa Nakajima, Hiroshi Naganuma, Soichiro Okamura, Ken Nishida, Takashi Yamamoto, Takashi Iijima, Masaki Azuma, Hitoshi Morioka, Keisuke Saito, Mutsuo Ishikawa, Tomoaki Yamada, Hiroshi Funakubo. Composition control and thickness dependence of {100}-oriented epitaxial BiCoO3-BiFeO3 films grown by metalorganic chemical vapor deposition, J.Appl.Phys., Vol. 105, pp. 061620-1-5, 2009.
• Hiromi Shima, Ken Nishida, Hiroshi Funakubo, Takashi Iijima, Takashi Katoda, Hiroshi Naganuma, Souichiro Okamura. Influence of Pb and La Contents on the Lattice Configuration of La-Substituted Pb(Zr,Ti)O3 Films Fablicated by CSD Method, IEEE Trans. Urtla, Ferro. Freq. Control, Vol. 56, No. 4, pp. 687-692, 2009.
• Shinichi Ito, Tomoaki Yamada, Kenji Takahashi, Shoji Okamoto, Takafumi Kamo, Hiroshi Funakubo, Ivoyl Koutsaroff, Marina Zelner, Andrew Cervin-Lawry. Effect of bottom electrode on dielectric property of sputtered-(Ba,Sr) TiO3 films, J.Appl.Phys., Vol. 105, pp. 061606-1-4, 2009.
• Takashi Fujisawa, Hiroshi Nakaki, Rikyu Ikariyama, Tomoaki Yamada, Mutsuo Ishikawa, Hiroshi Funakubo, Hitoshi Morioka. Crystal Structure and Electrical Property Comparisons of Epitaxial Pb(Zr, Ti)O3 Thick Films Grown on (100)CaF2 and (100)SrTiO3 Substrates, J.Appl.Phys., Vol. 105, pp. 061614-1-5, 2009.
• Takashi Fujisawa, Hiroshi Nakaki, Rikyu Ikariyama, Mitsumasa Nakajima, Tomoaki Yamada, Mutsuo Ishikawa, Hitoshi Morioka, Takashi Iijima, Hiroshi Funakubo. Growth of Epitaxial Pb(Zr,Ti)O3 Thick Films on (100)CaF2 Substrates with Perfect Polar-axis-orientation and Their Electrical and Mechanical Property Characterization, Mater. Res. Soc. Symp. Proc., Vol. 1129, pp. 1129-V11-02, 2009.
• Hiroki Kuwabara, Akihiro Sumi, Shoji Okamoto, Hiromasa Hoko, Jeffrey S. Cross, Hiroshi Funakubo. Low Temperature Preparation of (111)-oriented Pb(Zr, Ti)O3 Films Using Lattice – matched (111)SrRuO3/Pt Bottom Electrode by Metal Organic Chemical Vapor Deposition, Jpn. J. Appl. Phys., Vol. 48, No. 4, pp. 04C067-1-4, 2009.
• Gang He, takashi Iijima, Hiroshi Funakubo. Combinatorial Preparation Process of Pb(Zr1-xTix)O3 Thin Films by Chemical Solution Deposition Methods, J. Ceram. Soc. Jpn., Vol. 117, No. 5, pp. 698-702, 2009.
• Kazuhisa Kawano, Hiroaki Kosuge, Noriaki Oshima, Hiroshi Funakubo. The Effect of Precursor Ligands on the Deposition Characteristics of Ru Films by MOCVD, Electrochem. Solid-State Lett., Vol. 12, No. 10, pp. D80-D83, 2009.
• Hitoshi Morioka, Keisuke Saito, Shintaro Yokoyama, Takahiro Oikawa, Toshiyuki Kurosawa, Hiroshi Funakubo. Effect of film thickness on ferroelectric domain structure and properties of Pb(Zr0.35Ti0.65)O3/SrRuO3/SrTiO3 heterostructures, J. Mater.Sci., Vol. 44, pp. 5318-5324, 2009.
• Hitoshi Morioka, Keisuke Saito, Takeshi Kobayashi, Shintaro Yasui, Toshiyuki Kurosawa, Hiroshi Funakubo. In situ Observation of the Fatigue-Free Piezoelectric Microcantilever by Two-Dimensional X-ray Diffraction, Jpn. J. Appl. Phys., Vol. 48, pp. 09KA03-1-5, 2009.
• Takashi Yamamoto, Mitsutaka Yamamoto, Takashi Yamamoto, Mitsutaka Yamamoto, Ken Nishida, Hiroshi Funakubo, Takashi Iijima, Toru Aiso, Yasuko Ichikawa. Electric-Field-Induced Transverse Displacement in Pt/Pb(Zr,Ti)O3 Film/Pt/Si Structure, Jpn. J. Appl. Phys., Vol. 48, pp. 09KA04-1-4, 2009.

Domestic Conference (Not reviewed / Unknown)

• Mutsuo Ishikawa, Hiro Einishi, Tomohito Hasegawa, Takeshi Morita, yoshifumi saijo, Minoru Kuribayashi Kurosawa, HIROSHI FUNAKUBO. VHF帯超音波イメージングを目的としたKNbO3配向制御膜トランスデューサ, 第３０回超音波エレクトロニクスの基礎と応用に関するシンポジウム講演論文集, pp. 321-322, Nov. 2009.
• T.Kiguchi, K.Aoyagi, T.J.Konno, N.Wakiya, K.Shinozaki, S.Utsugi, T. Yamada, H. Funakubo. Geometric phase analysis of nano-strain field in oxide thin films, 22nd Fall Meeting of The Ceramic Society of Japan, 22nd Fall Meeting of The Ceramic Society of Japan, No. 2E01, pp. 121, Sept. 2009.
• Mutsuo Ishikawa, Hiro Einishi, Tomohito Hasegawa, Shintaro Yasui, Tomoaki Yamada, Minoru Kuribayashi Kurosawa, Takeshi Morita, HIROSHI FUNAKUBO, HIROSHI FUNAKUBO. KNbO3 エピタキシャル膜の製膜と圧電特性の評価, 信学技報, US2009-24, pp. 11-14, July 2009.
• Mutsuo Ishikawa, Satoru Utsugi, Takashi Fujisawa, Shintaro Yasui, Tomoaki Yamada, Minoru Kuribayashi Kurosawa, Takeshi Morita, HIROSHI FUNAKUBO. 水熱合成法を用いたKNbO3厚膜の成膜, 第２６回強誘電体応用会議講演論文集, pp. 163-164, May 2009.
• Tomohito Hasegawa, Minoru Kuribayashi Kurosawa, Mutsuo Ishikawa, HIROSHI FUNAKUBO, Shinichi Takeuchi, yoshifumi saijo. 水熱合成PZT多結晶膜による超小型超音波プローブの開発-超音波イメージングと分解能の検討-, 日音講論集, pp. 1241-1242, Mar. 2009.
• Tomohito Hasegawa, Minoru Kuribayashi Kurosawa, Mutsuo Ishikawa, HIROSHI FUNAKUBO, Shinichi Takeuchi, yoshifumi saijo. 水熱合成PZT多結晶膜を用いた小型超音波プローブの特性, 圧電材料・デバイスシンポジウム2009, 圧電材料・デバイスシンポジウム2009講演論文集, pp. 37-40, Feb. 2009.

Other Publication

• Hiroshi Funakubo, Shintaro Yasui, Tomoaki Yamada, Mutsuo Ishikawa. Preparation and Characterization of BiFeO₃ Based Thin Films Grown by MOCVD, Mater. Integ., vol. 22, No. 2, pp. 25-31, 2009.

Patent

• HIROSHI FUNAKUBO. 圧電材料および圧電素子. Patent. Registered. 国立大学法人東京工業大学, キヤノン株式会社, 学校法人上智学院, 独立行政法人産業技術総合研究所. 2009/12/24. 特願2009-293305. 2010/08/19. 特開2010-183067. 特許第5599185号. 2014/08/22 2014.
• HIROSHI FUNAKUBO. 圧電材料および圧電素子. Patent. Published. 国立大学法人東京工業大学, キヤノン株式会社, 学校法人上智学院, 独立行政法人産業技術総合研究所. 2009/12/24. 特願2009-293305. 2010/08/19. 特開2010-183067. 2010.
• HIROSHI FUNAKUBO. ペロブスカイト構造酸化物薄膜の作製方法. Patent. Published. 国立大学法人東京工業大学, キャノンオプトロン株式会社. 2009/09/07. 特願2009-206439. 2011/03/24. 特開2011-057475. 2011.
• HIROSHI FUNAKUBO. 金属酸化物および圧電材料. Patent. Registered. 国立大学法人東京工業大学, キヤノン株式会社, 学校法人上智学院, 国立大学法人京都大学, 独立行政法人産業技術総合研究所, 学校法人東京理科大学, 国立大学法人山梨大学. 2009/07/24. 特願2009-173542. 2010/03/11. 特開2010-053024. 特許第5354538号. 2013/09/06 2013.
• HIROSHI FUNAKUBO. 金属酸化物および圧電材料. Patent. Registered. 国立大学法人東京工業大学, キヤノン株式会社, 国立大学法人山梨大学, 独立行政法人産業技術総合研究所. 2009/07/28. 特願2009-175789. 2010/03/11. 特開2010-053028. 特許第5566059号. 2014/06/27 2014.
• HIROSHI FUNAKUBO. 金属酸化物および圧電材料. Patent. Published. 国立大学法人東京工業大学, キヤノン株式会社, 国立大学法人京都大学, 学校法人上智学院, 国立大学法人山梨大学, 独立行政法人産業技術総合研究所, 学校法人東京理科大学. 2009/07/24. 特願2009-173542. 2010/03/11. 特開2010-053024. 2010.
• HIROSHI FUNAKUBO. 金属酸化物および圧電材料. Patent. Published. 国立大学法人東京工業大学, キヤノン株式会社, 国立大学法人山梨大学, 独立行政法人産業技術総合研究所. 2009/07/28. 特願2009-175789. 2010/03/11. 特開2010-053028. 2010.
• HIROSHI FUNAKUBO. 金属酸化物、圧電材料および圧電素子. Patent. Published. 国立大学法人東京工業大学, キヤノン株式会社, 国立大学法人山梨大学, 国立大学法人京都大学, 独立行政法人産業技術総合研究所, 学校法人東京理科大学. 2009/05/20. 特願2009-122468. 2010/01/14. 特開2010-006688. 2010.
• HIROSHI FUNAKUBO. 金属酸化物、圧電材料および圧電素子. Patent. Registered. 国立大学法人東京工業大学, キヤノン株式会社, 国立大学法人山梨大学, 国立大学法人京都大学, 独立行政法人産業技術総合研究所, 学校法人東京理科大学. 2009/05/20. 特願2009-122468. 2010/01/14. 特開2010-006688. 特許第5219921号. 2013/03/15 2013.
• HIROSHI FUNAKUBO. 圧電材料. Patent. Published. 国立大学法人東京工業大学, キヤノン株式会社, 国立大学法人山梨大学, 国立大学法人京都大学, 独立行政法人産業技術総合研究所, 学校法人東京理科大学. 2009/02/27. 特願2009-047136. 2009/11/05. 特開2009-256186. 2009.
• HIROSHI FUNAKUBO. 圧電材料. Patent. Registered. 国立大学法人東京工業大学, キヤノン株式会社, 国立大学法人山梨大学, 国立大学法人京都大学, 独立行政法人産業技術総合研究所, 学校法人東京理科大学. 2009/02/27. 特願2009-047136. 2009/11/05. 特開2009-256186. 特許第5355148号. 2013/09/06 2013.
• HIROSHI FUNAKUBO. 金属イリジウム及び／又はイリジウム酸化物薄膜の製造方法. Patent. Published. 国立大学法人東京工業大学, 東ソー株式会社. 2008/03/26. 特願2008-079643. 2009/10/15. 特開2009-235439. 2009.
• HIROSHI FUNAKUBO. 機能性酸化物構造体、及び機能性酸化物構造体の製造方法. Patent. Registered. 国立大学法人東京工業大学, 富士フイルム株式会社. 2008/03/03. 特願2008-052318. 2009/09/17. 特開2009-208985. 特許第4977640号. 2012/04/20 2012.
• HIROSHI FUNAKUBO. 機能性酸化物構造体. Patent. Registered. 国立大学法人東京工業大学, 富士フイルム株式会社. 2008/03/03. 特願2008-052319. 2009/09/17. 特開2009-212225. 特許第4977641号. 2012/04/20 2012.

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