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Publication List - Takamasa Kawanago 2008 (4 / 94 entries)
International Conference (Reviewed)
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K. Kakushima,
K. Okamoto,
K. Tachi,
S. Sato,
J. Song,
T. Kawanago,
P. Ahmet,
N. Sugii,
K. Tsutsui,
T. Hattori,
H. Iwai.
Interfacial Dipole Measurement of Dielectric/Silicon Interface by X-ray Photoelectron Spectroscopy,
214th ECS Meeting (PRiME 2008),
Oct. 2008.
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K. Kakushima,
K. Tachi,
M. Adachi,
K. Okamoto,
S. Sato,
J. Song,
T. Kawanago,
P. Ahmet,
K. Tsutsui,
N. Sugii,
T. Hattori,
H. Iwai.
Advantage of La2O3 Gate Dielectric Over HfO2 for Direct Contact and Mobility Improvment,
the 38th European Solid-State Device Research Conference (ESSDERC2008),
Sept. 2008.
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K. Kakushima,
K. Okamoto,
M. Adachi,
K. Tachi,
S. Sato,
T. Kawanago,
J. Song,
P. Ahmet,
N. Sugii,
K. Tsutsui,
T. Hattori,
H. Iwai.
Impact of Thin La2O3 Insertion for HfO2 MOSFET,
213th ECS Meeting,
May 2008.
Domestic Conference (Not reviewed / Unknown)
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Takamasa Kawanago,
Kuniyuki KAKUSHIMA,
Ahmet Parhat,
KAZUO TSUTSUI,
Nobuyuki Sugii,
takeo hattori,
HIROSHI IWAI.
La2O3/Si直接接合構造における界面特性の評価,
秋季第69回応用物理学会学術講演会,
秋季第69回応用物理学会学術講演会予稿集,
応用物理学会,
No. 2,
pp. 702,
Sept. 2008.
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