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Publication List - Takamasa Kawanago 2016 (8 / 94 entries)
Journal Paper
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Takamasa Kawanago,
Shunri Oda.
Utilizing self-assembled-monolayer-based gate dielectrics to fabricate molybdenum,
Applied Physics Letters,
Vol. 108,
pp. 041605 (2016) 1-4,
Jan. 2016.
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Takamasa Kawanago,
Shunri Oda.
Utilizing self-assembled-monolayer-based gate dielectrics to fabricate molybdenum disulfide field-effect transistors,
Applied Physics Letters,
Vol. 108,
pp. 041605-5,
Jan. 2016.
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"J. Chen",
"T. Kawanago",
"H. Wakabayashi",
"K. Tsutsui",
"H. Iwai",
"D. Nohata",
"H. Nohira",
"K. Kakushima".
La2O3 gate dielectrics for AlGaN/GaN HEMT,
Microelectronics Reliability,
Vol. 60,
pp. 16-19,
2016.
International Conference (Not reviewed / Unknown)
Domestic Conference (Not reviewed / Unknown)
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Yukio Kawano,
Ryo Ikoma,
Takamasa Kawanago,
SHUNRI ODA.
ジデシルホスホン酸(C12H25-PA)をゲート絶縁膜の用いたMoS2 FETの作製,
第77回応用物理学会秋季学術講演,
Sept. 2016.
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杜 婉静,
Takamasa Kawanago,
SHUNRI ODA.
Multifunctional Phosphonic Acid Self-Assembled Monolayer for Metal Patterning,
第77回応用物理学会秋季学術講演会,
Sept. 2016.
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Takamasa Kawanago,
SHUNRI ODA.
自己組織化単分子膜をゲート絶縁膜に用いた低電圧駆動MoS2 FETの作製,
第63回応用物理学会春季学術講演会,
June 2016.
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Takumu Honda,
米田 淳,
Kenta Takeda,
Takamasa Kawanago,
Tetsuo Kodera,
Seigo Tarucha,
SHUNRI ODA.
多層Al ゲート構造を用いたSi-MOS 量子ドットデバイス作製プロセスの検討,
第63回応用物理学会春季学術講演会,
Mar. 2016.
Patent
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