Journal Paper

• Sotaro Kageyama, Kazuki Okamoto, Shinnosuke Yasuoka, Keisuke Ide, Kota Hanzawa, Yoshiomi Hiranaga, Pochun Hsieh, Sankalpa Harza, Albert Suceava, Akash Saha, Hiroko Yokota, Kei Shigematsu, Masaki Azuma, Venkatraman Gopalan, Hiroshi Uchida, Hidenori Hiramatsu, Hiroshi Funakubo. Realization of Non-Equilibrium Wurtzite Structure in Heterovalent Ternary MgSiN2 Film Grown by Reactive Sputtering, Adv. Electron. Mater., Vol. 2025, No. 2400880, p. 1-8, Jan. 2025.

Domestic Conference (Not reviewed / Unknown)

• Shumpei Kawano, Kazuki Okamoto, Sotaro Kageyama, 孫納納, Shinnosuke Yasuoka, HIROSHI FUNAKUBO. (Al,Sc)N強誘電体薄膜におけるスイッチング特性の結晶構造依存性, 第72回応用物理学会春季学術講演会, Mar. 2025.
• Sotaro Kageyama, Kazuki Okamoto, Yoshiomi Hiranaga, HIROSHI FUNAKUBO. ウルツ鉱構造(Mg,Si)N-AlN固溶体薄膜の作製と評価”、第72回応用物理学会春季学術講演会, 第72回応用物理学会春季学術講演会, Mar. 2025.
• Sotaro Kageyama, Kazuki Okamoto, Yoshiomi Hiranaga, 上岡義弘, 召田雅実, HIROSHI FUNAKUBO. ウルツ鉱構造異原子価3元系窒化物MgSiN2薄膜の作製と評価, 第72回応用物理学会春季学術講演会, Mar. 2025.
• Sotaro Kageyama, Kazuki Okamoto, Yoshiomi Hiranaga, HIROSHI FUNAKUBO. 異原子価３元系窒化物MgSiN2薄膜の２段階成膜による結晶化温度の低減, 第63回セラミックス基礎科学討論会, Jan. 2025.
• Shumpei Kawano, Kazuki Okamoto, Sotaro Kageyama, 孫納納, HIROSHI FUNAKUBO. (Al,Sc)N強誘電体薄膜の結晶構造及び電気特性に及ぼす成膜条件の影響, 第63回セラミックス基礎科学討論会, Jan. 2025.

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