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中村友二 2014年 研究業績一覧 (9件 / 25件)
論文
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Hisashi Sato,
Nobuyuki Shishido,
Shoji Kamiya,
Kozo Koiwa,
Masaki Omiya,
Masahiro Nishida,
Takashi Suzuki,
Tomoji Nakamura,
Takeshi Nokuo.
Local distribution of residual stress of Cu in LSI interconnect,
MaterialsLetters,
Volume 136,
Page 362-365,
Dec. 2014.
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Chuantong Chen,
Kozo Koiwa,
Nobuyuki Shishido,
Shoji Kamiya,
Masaki Omiya,
Hisashi Sato,
Masahiro Nishida,
Takashi Suzuki,
Tomoji Nakamura,
Takeshi Nokuo,
Tadahiro Nagasawa.
Specimen size effect on elastic-plastic strength evaluation of interface between thin films,
Eng. Fract. Mech.,
Vol. 131,
pp. 371-381,
Sept. 2014.
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Chuantong Chen,
Nobuyuki Shishido,
Shoji Kamiya,
Kozo Koiwa,
Hisashi Sato,
Masaki Omiya,
Masahiro Nishida,
Takashi Suzuki,
Tomoji Nakamura,
Takeshi Nokuo,
Toshiaki Suzuki.
Evaluation for interface strength fluctuations induced by inhomogeneous grain structure of Cu line in LSI Interconnects,
Microelectronic Engineering,
Elsevier,
Volume 120,
Page 52-58,
May 2014.
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Nobuyuki Shishido,
Yuka Oura,
Hisashi Sato,
Shoji Kamiya,
Kozo Koiwa,
Masaki Omiya,
Masahiro Nishida,
Takashi Suzuki,
Tomoji Nakamura,
Takeshi Nokuo,
Toshiaki Suzuki.
Crystal orientation effect on local adhesion strength of the interface between a damascene copper line and the insulation layer,
Microelectronic Engineering,
Elsevier,
Volume 120,
Page 71-76,
May 2014.
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Mizushima Yoriko,
Kim Youngsuk,
Nakamura Tomoji,
Sugie Ryuichi,
Hashimoto Hideki,
Uedono Akira,
Ohba Takayuki.
Impact of back-grinding-induced damage on Si wafer thinning for three-dimensional integration,
Jpn. J. Appl. Phys.,
Institute of Physics,
Vol. 53,
No. 5,
Apr. 2014.
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Noriyuki Taoka,
Osamu Nakatsuka,
Yoriko Mizushima,
Hideki Kitada,
Young Suk Kim,
Tomoji Nakamura,
Takayuki Ohba,
Shigeaki Zaima.
Observation of lattice spacing fluctuation and strain undulation around through-Si vias in wafer-on-wafer structures using X-ray microbeam diffraction,
Japanese Journal of Applied Physics,
Volume 53,
Apr. 2014.
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Mayumi B. Takeyama,
Masaru Sato,
Yoshihiro Nakata,
Yasushi Kobayashi,
Tomoji Nakamura,
Atsushi Noya.
Characterization of silicon nitride thin films deposited by reactive sputtering and plasma-enhanced CVD at Low temperatures,
Japanese Journal of Applied Physics,
Institute of Physics,
Volume 53,
Apr. 2014.
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Akira Uedono,
Yoriko Mizushima,
Youngsuk Kim,
Tomoji Nakamura,
Takayuki Ohba,
Nakaaki Yoshihara,
Nagayasu Oshima,
Ryoichi Suzuki.
Vacancy-type defects induced by grinding of Si wafers studied by monoenergetic,
Journal of Applied Physics,
AIP,
Vol. 116,
134501,
2014.
その他の論文・著書など
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中村 友二.
LSIの配線技術と表面科学,
表面科学,
The Surface Science Society of Japan,
Vol. 35,
No. 5,
pp. 236-243,
May 2014.
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