論文

• Hiroyoshi Tanabe, Akira Jinguji, Atsushi Takahashi. Evaluation of convolutional neural network for fast extreme ultraviolet lithography simulation using imec 3 nm node mask patterns, Journal of Micro/Nanopatterning, Materials and Metrology (JM3), Society of Photo-optical Instrumentation Engineers, Vol. 22, Issue 2, 024201, June 2023.

国際会議発表 (査読有り)

• Hiroyoshi Tanabe, Akira Jinguji, Atsushi Takahashi. Accelerating EUV lithography simulation with weakly guiding approximation and STCC formula, Proc. SPIE 12750, International Conference on Extreme Ultraviolet Lithography 2023, 127500D, Nov. 2023.
• Hiroyoshi Tanabe, Akira Jinguji, Atsushi Takahashi. Evaluation of CNN for fast EUV lithography simulation using iN3 logic mask patterns, Proc. SPIE 12495, Advanced Lithography + Patterning 2023, 124951J, Apr. 2023.

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