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Publication List - Kiriha Katayama (22 entries)
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Journal Paper
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Tomoya Sato,
Daichi Ichinose,
Takaaki Inoue,
Mutsuo Uehara,
Kiriha Katayama,
Hiroshi Funakubo,
Kiyoshi Uchiyama.
Evaluation of Chemical Stability in Perovskite-Type Proton-Conductive Oxide Thin-Films,
Science of Advanced Materials,
vol. 10,
pp. 8-11,
Jan. 2018.
International Conference (Reviewed)
International Conference (Not reviewed / Unknown)
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Takanori Mimura,
Kiriha Katayama,
Takao Shimizu,
Takanori Kiguchi,
Akihiro Akama,
Toyohiko J. Konno,
Osami Sakata,
Hiroshi Funakubo.
Thickness-dependent phase stability of epitaxial ferroelectric HfO2-based films,
STAC-10 (The Tenth International Conference on the Science and Technology for Advanced Ceramics),
Aug. 2017.
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Takao Shimizu,
Kiriha Katayama,
Takahisa Shiraishi,
Takanori Kiguchi,
Shogo Nakamura,
Toyohiko Konno,
Hiroshi Funakubo.
Ferroelectricity in HfO2-based epitaxial thin film,
Pacifichem 2015,
Dec. 2015.
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Takao Shimizu,
Kiriha Katayama,
Tatsuhiko Yokouchi,
Takahiro Oikawa,
Takahisa Shiraishi,
Takanori Kiguchi,
Toyohiko Konno,
Hiroshi Uchida,
Hiroshi Funakubo.
Preparation of Fluorite-Structured Ferroelectric Thin Films and Their Characterization,
015 International Workshop on Dielectric Thin Films for future electron devices-science and technology,
Nov. 2015.
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K. Katayama,
T. Shimizu,
O. Sakata,
T. Kiguchi,
A. Akama,
T. J. Konno,
S. Nakamura,
H. Uchida,
H. Funakubo.
Growth and structural analysis of epitaxial orthorhombic YO1.5-HfO2 thin films,
NIMS Conference 2015,
July 2015.
Domestic Conference (Not reviewed / Unknown)
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Takahisa Shiraishi,
中村奨梧,
範滄宇,
Kiriha Katayama,
Takao Shimizu,
HIROSHI FUNAKUBO,
Takanori Kiguchi,
Toyohiko Konno.
酸化物薄膜の構造解析~HfO2基極薄膜の斜方晶相について~,
共用・計測 合同シンポジウム2016 微細構造解析プラットフォーム・ワークショップ NIMS先端計測シンポジウム2016 合同シンポジウム,
Mar. 2016.
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HIROSHI FUNAKUBO,
Takao Shimizu,
Kiriha Katayama,
Takanori Mimura,
Takanori Kiguchi,
赤間章裕,
Toyohiko Konno,
Hiroshi Uchida.
配向制御したHfO2基強誘電体の作製とその強誘電特性評価,
日本セラミックス協会 2016年年会,
Mar. 2016.
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Takanori Mimura,
Kiriha Katayama,
Takao Shimizu,
Hiroshi Uchida,
Takanori Kiguchi,
赤間章裕,
Toyohiko Konno,
Osami Sakata,
HIROSHI FUNAKUBO.
固相成長による配向制御したHfO2基強誘電体薄膜の作製と特性評価,
第63回応用物理学会春季学術講演会,
Mar. 2016.
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陳 舟,
平永良臣,
Takao Shimizu,
Kiriha Katayama,
Takanori Mimura,
HIROSHI FUNAKUBO,
Yasuo Cho.
走査型非線形誘電率顕微鏡における強誘電性Y:HfO2薄膜のドメイン反転,
第63回応用物理学会春季学術講演会,
Mar. 2016.
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Kiriha Katayama,
Takao Shimizu,
Takanori Kiguchi,
赤間章裕,
Toyohiko Konno,
Hiroshi Uchida,
HIROSHI FUNAKUBO.
HfO2 基エピタキシャル薄膜における強誘電相の安定化,
第54回セラミックス基礎科学討論会,
Jan. 2016.
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Takanori Mimura,
Kiriha Katayama,
Takao Shimizu,
HIROSHI FUNAKUBO,
Hiroshi Uchida,
Takanori Kiguchi,
赤間章裕,
Toyohiko Konno.
固相成長法を用いた強誘電体HfO2 基薄膜のエピタキシャル成長と特性評価,
第54回セラミックス基礎科学討論会,
Jan. 2016.
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陳舟,
平永良臣,
Takao Shimizu,
Kiriha Katayama,
Takanori Mimura,
HIROSHI FUNAKUBO,
Yasuo Cho.
強誘電性Y:HfO2薄膜におけるナノスケールドメイン反転,
電子情報通信学会研究会,
2016.
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中村奨梧,
Takanori Kiguchi,
Takahisa Shiraishi,
範 滄宇,
Toyohiko Konno,
Kiriha Katayama,
Takao Shimizu,
HIROSHI FUNAKUBO.
斜方晶ハフニア薄膜の強誘電相構造,
第35回エレクトロセラミックス研究討論会,
Oct. 2015.
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Takahisa Shiraishi,
Kiriha Katayama,
Tatsuhiko Yokouchi,
Takao Shimizu,
及川貴弘,
Hiroshi Uchida,
HIROSHI FUNAKUBO,
Takanori Kiguchi,
Toyohiko Konno.
種々の基板上に作製した (Hf0.5Zr 0.5)O2薄膜の特性,
第35回エレクトロセラミックス研究討論会,
Oct. 2015.
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Takao Shimizu,
Kiriha Katayama,
Takanori Kiguchi,
赤間 章裕,
Toyohiko Konno,
Hiroshi Uchida,
Osami Sakata,
HIROSHI FUNAKUBO.
斜方晶エピタキシャルHfO2基薄膜のドメイン構造,
第76回応用物理学会秋季学術講演会,
Sept. 2015.
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HIROSHI FUNAKUBO,
Takahisa Shiraishi,
Kiriha Katayama,
Tatsuhiko Yokouchi,
Takao Shimizu,
及川 貴弘,
Hiroshi Uchida.
(Hf0.5Zr0.5)O2 薄膜の強誘電性に及ぼす歪の効果,
日本金属学会2015年秋期講演大会,
Sept. 2015.
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中村奨梧,
範滄宇,
Takahisa Shiraishi,
Takanori Kiguchi,
Toyohiko Konno,
Kiriha Katayama,
Takao Shimizu,
Tatsuhiko Yokouchi,
及川貴弘,
HIROSHI FUNAKUBO.
ABF-STEM 法を用いた斜方晶HfO2の分極構造の解析,
日本セラミックス協会第28回秋季シンポジウム,
Sept. 2015.
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Kiriha Katayama,
Takao Shimizu,
Takanori Kiguchi,
赤間 章裕,
Toyohiko Konno,
Hiroshi Uchida,
Osami Sakata,
HIROSHI FUNAKUBO.
Si基板上への斜方晶エピタキシャルHfO2基薄膜の作製,
第76回応用物理学会秋季学術講演会,
Sept. 2015.
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Kiriha Katayama,
Takao Shimizu,
Takahisa Shiraishi,
及川貴弘,
Takanori Kiguchi,
赤間章裕,
Toyohiko Konno,
中村奨梧,
Hiroshi Uchida,
HIROSHI FUNAKUBO.
斜方晶相を含むエピタキシャルHfO2 基薄膜の作製と評価,
第32回強誘電体応用会議(FMA 32),
May 2015.
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阿部千穂子,
塩川真里奈,
Kiriha Katayama,
Takahisa Shiraishi,
Takao Shimizu,
HIROSHI FUNAKUBO,
Hiroshi Uchida.
CSD 由来HfO2-ZrO2 固溶体薄膜の結晶構造と誘電特性,
第32回強誘電体応用会議(FMA 32),
May 2015.
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