Journal Paper

• Reika Ota, Shinnosuke Yasuoka, Ryoichi Mizutani, Takahisa Shiraishi, Kazuki Okamoto, Kuniyuki Kakushima, Tomoyuki Koganezawa, Osami Sakata, Hiroshi Funakubo. Scalable ferroelectricity of 20-nm-thick (Al0.8Sc0.2)N thin films sandwiched between TiN electrodes, J. Appl. Phys., vol. 134, pp. 214103-1-6, Dec. 2023.
• Rurika Kubota, Yuxian Hu, Takahisa Shiraishi, Akinori Tateyama, Yoshiharu Ito, Minoru Kurosawa, Hiroshi Funakubo. Introduction of strain-relaxed 90° domain structure by lattice mismatch in tetragonal ferroelectric (Bi,K)TiO3 epitaxial films grown hydrothermally below Curie temperature, J. Appl. Phys., vol. 134, pp. 234102, Dec. 2023.
• Shinnosuke Yasuoka, Ryoichi Mizutani, Reika Ota, Takahisa Shiraishi, Takao Shimizu, Kazuki Okamoto, Masato Uehara, Hiroshi Yamada, Morito Akiyama, Hiroshi Funakubo. Invariant polarization switching kinetics in an (Al0.2Sc0.8)N film with frequency and temperature, Appl. Phys. Lett., vol. 123, pp. 202902, Nov. 2023.
• José P. B. Silva, Ruben Alcala, Uygar E. Avci, Nick Barrett, Laura Bégon-Lours, Mattias Borg, Seungyong Byun, Sou-Chi Chang, Sang-Wook Cheong, Duk-Hyun Choe, Jean Coignus, Veeresh Deshpande, Athanasios Dimoulas, Catherine Dubourdieu, Ignasi Fina, Hiroshi Funakubo, Laurent Grenouillet, Alexei Gruverman, Jinseong Heo, Michael Hoffmann, H. Alex Hsain, Fei-Ting Huang, Cheol Seong Hwang, Jorge Íñiguez, Jacob L. Jones, Ilya V. Karpov, Alfred Kersch, Taegyu Kwon, Suzanne Lancaster, Maximilian Lederer, Younghwan Lee, Patrick D. Lomenzo, Lane W. Martin, Simon Martin, Shinji Migita, Thomas Mikolajick, Beatriz Noheda, Min Hyuk Park, Karin M. Rabe, Sayeef Salahuddin, Florencio Sánchez, Konrad Seidel, Takao Shimizu, Takahisa Shiraishi, Stefan Slesazeck, Akira Toriumi, Hiroshi Uchida, Bertrand Vilquin, Xianghan Xu, Kun Hee Ye, Uwe Schroeder. Roadmap on Ferroelectric Hafnia and Zirconia-based materials and devices, APL Mater., vol. 11, pp. 089201-1-70, Aug. 2023.
• Takanori Mimura, Reijiro Shimura, Akinori Tateyama, Yoshiko Nakamura, Takahisa Shiraishi, Hiroshi Funakubo. No-Heating deposition of ferroelectric x%Y-doped (100–x%)(Hf1−yZry)O2 films, Phys. Status Solidi A, 2023, 2300100-1-6, May 2023.
• Akinori Tateyama, Yuichiro Orino, Yoshiharu Ito, Takahisa Shiraishi, Takao Shimizu, Minoru Kurosawa, Hiroshi Funakubo. Simultaneous high frequency measurement of both direct and inverse transverse piezoelectric coefficients of thin films using longitudinal vibration, Sensors and Actuators A: Physical, Vol. 354, 114265, Feb. 2023.
• Akinori Tateyam, Yoshiharu Ito, Takahisa Shiraishi, Minoru Kurosawa, Hiroshi Funakubo. Effect of film thickness on output power of a piezoelectric vibration energy harvester using hydrothermally synthesized (K,Na)NbO3 film, Jpn. J. Appl. Phys., Vol. 62, 016502, Jan. 2023.

International Conference (Not reviewed / Unknown)

• Hiroshi Funakubo, Yuma Takahashi, Takahisa Shiraishi, Kodera Masanori, Reijiro Shimura, Takanori Mimura, Keisuke Ishihama, Kazuki Okamoto, Hiroki Moriwake, Ayako Taguchi, Takao Shimizu, Yasuhiro Fujii, Akitoshi Koreeda. Stabilization and Identification of Ferroelectric HfO2 Thin Films, IWDTF2023 (2023 International Workshop on Dielectric Thin Films for Future Electron Devices - Science and Technology), Oct. 2023.
• H. Funakubo, T. Shimizu, T. Mimura, T. Shiraishi, K. Okamoto. Impact of electric field on crystal structure and properties of HfO2-based ferroelectric films, E-MRS 2023 Fall Meeting, Sept. 2023.
• Hiroshi Funakubo, Akinori Tateyama, Yuichiro Orino, Yoshiharu Ito, Takahisa Shiraishi, Takao Shimizu, Minoru Kurosawa. Characterization of Piezoelectric (K, Na)NbO3 Films for MEMS Applications, ISAF 2023 (IEEE International Symposium on Applications of Ferroelectrics), June 2023.

Domestic Conference (Not reviewed / Unknown)

• Yuxian Hu, Rurika Kubota, Kazuki Okamoto, Takahisa Shiraishi, HIROSHI FUNAKUBO. 水熱法による強誘電体PbTiO3エピタキシャル膜の合成とそのドメイン構造評価, 第43回電子材料研究討論会, Nov. 2023.
• Hiroshi Uchida, 山崎佑介, 横田幸惠, 島宏美, Takahisa Shiraishi, Takanori Kiguchi, HIROSHI FUNAKUBO. 金属酸化物テンプレート上における化学溶液堆積法由来PZT薄膜の結晶成長機構の解明, 第43回電子材料研究討論会, Nov. 2023.
• Koji Hirai, Kazuki Okamoto, Takahisa Shiraishi, 山岡 和希子, 鶴丸 理沙子, 井上 ゆか梨, HIROSHI FUNAKUBO. HfO2-CeO2膜における電気特性の膜厚及び組成依存性, 第84回応用物理学会秋季学術講演会, Sept. 2023.
• HIROSHI FUNAKUBO, 胡雨弦, Kazuki Okamoto, Rurika Kubota, Takahisa Shiraishi. 水熱法で低温作製したPbTiO3エピタキシャル膜のドメイン構造の特徴, 日本セラミックス協会2023年年会, Mar. 2023.
• HIROSHI FUNAKUBO, 胡雨弦, Kazuki Okamoto, Rurika Kubota, Takahisa Shiraishi. 水熱法で低温作製したPbTiO3エピタキシャル膜のドメイン構造の特徴, 日本セラミックス協会2023年年会, Mar. 2023.

Patent

• HIROSHI FUNAKUBO, Takahisa Shiraishi, Shinnosuke Yasuoka, Ryoichi Mizutani, Reika Ota. 窒化アルミニウムスカンジウム膜及び強誘電体素子. Patent. Published. 国立大学法人東京工業大学, 東ソー株式会社. 2023/03/30. PCT/JP2023/013181. 2023/10/05. WO 2023/190869. 2023.
• HIROSHI FUNAKUBO, Minoru Kuribayashi Kurosawa, Takahisa Shiraishi. ビスマス原子、カリウム原子、又は鉛原子をＡサイトに含む強誘電体ペロブスカイト材料の製造方法. Patent. Published. 国立大学法人東京工業大学, 株式会社コイケ. 2021/07/09. 特願2021-114144. 2023/01/20. 特開2023-010186. 2023.

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