Journal Paper

• Naoya Oshima, Kiyoshi Uchiyama, Yoshitaka Ehara, Takahiro Oikawa, Hiroki Tanaka, Tomoya Sato, Hiroshi Uchida, Tomoaki Yamada, Hiroshi Funakubo. Fabrication and Characterization of (110)-oriented (Ba0.5,Sr0.5)TiO3 (BST) Thin Films using PdO//Pd Buffer Layer, Jpn. J. Appl. Phys., Vol. 54, pp. 10NA15-1-4, Sept. 2015.
• Takahisa Shiraishi, Noriyuki Kaneko, Minoru Kurosawa, Hiroshi Uchida, Yasuhiro Suzuki, Takeshi Kobayashi, Hiroshi Funakubo. Vibration Energy Harvesting Properties of Hydrothermally Synthesized (K, Na)NbO3 Films Deposited on Flexible Metal Foil Substrates, Jpn. J. Appl. Phys., Vol. 54, pp. 10ND06-1-6, Sept. 2015.
• Yoshiki Minemura, Daichi Ichinose, Kohei Nagasaka, Jin Woon Kim, Hiromi Shima, Ken Nishida, Takanori Kiguchi, Toyohiko J. Konno, Naoya Oshima, Hiroshi Funakubo, Hiroshi Uchida. Polar-axis-oriented crystal growth of tetragonal PZT films on stainless steel substrate using pseudo-perovskite nanosheet buffer layer, AIP Advances, Vol. 5, pp. 077139-1-8, July 2015.
• Kohei Nagasaka, Naoya Oshima, Jin Woong Kim, Hiromi Shima, Akihiro Akama, Takanori Kiguchi, Ken Nishida, Toyohiko J. Konno, Hiroshi Funakubo, Hiroshi Uchida. Fabrication of (100)c-oriented Mn-doped bismuth ferrite films on silicon and stainless steel substrates using calcium niobate nanosheets, J. Ceram. Soc. Jpn., Vol. 123, No. 5, pp. 322-328, May 2015.

International Conference (Reviewed)

• Hiroshi Funakubo, Takahisa Shiraishi, Tatsuhiko Yokouchi, Takahiro Oikawa, Hiroshi Uchida. Effect of Stress on Ferroelectricity of (Hf0.5Zr0.5)O2 Thin Films, 2015 MRS Fall Meeting & Exhbit, Nov. 2015.
• H.Funakubo, T.Shiraishi, T.Shimizu, T.Yokouchi, T.Oikawa, H.Uchida. Effect of Stress on Ferroelectricity of (Hf0.5Zr0.5)O2 Thin Films, SSDM 2015, Sept. 2015.

International Conference (Not reviewed / Unknown)

• Takahisa Shiraishi, Hiro Einishi, Minoru Kurosawa, Hiroshi Uchida, Nobuhiro Kumada, Takanori Kiguchi, Hiroshi Funakubo. Low Temperature Deposition of Epitaxial (K,Na)NbO3 Films using Hydrothermal Method, EMN 3CG 2015, Dec. 2015.
• Takao Shimizu, Kiriha Katayama, Tatsuhiko Yokouchi, Takahiro Oikawa, Takahisa Shiraishi, Takanori Kiguchi, Toyohiko Konno, Hiroshi Uchida, Hiroshi Funakubo. Preparation of Fluorite-Structured Ferroelectric Thin Films and Their Characterization, 015 International Workshop on Dielectric Thin Films for future electron devices-science and technology, Nov. 2015.
• Kiliha Katayama, Takao Shimizu, Osami Sakata, Takanori Kiguchi, Akihiro Akama, Toyohiko J. Konno, Syogo Nakamura, Hiroshi Uchida, Hiroshi Funakubo. Growth and Structural Analysis of Epitaxial Orthorhombic YO1.5-HfO2 Thin Films, 17th US-Japan Seminar on Dielectric and Piezoelectric Ceramics, Nov. 2015.
• Hiroshi Uchida, Kohei Nagasaka, Jin Woong Kim, Hiromi Shima, Akihiro Akama, Takanori Kiguchi, Ken Nishida, Toyohiko J. Konno, Hiroshi Funakubo. Preferential Crystal Growth of BiFeO3-Based Thin Films Using Metal-Oxide Nanosheet Templates, 17th US-Japan Seminar on Dielectric and Piezoelectric Ceramics, Nov. 2015.
• K. Uchiyama, N. Oshima, Y. Ehara, T. Oikawa, H. Tanaka, T. Sato, H. Uchida, T. Yamada, H. Funakubo. Electric Property of {110}-one-axis oriented (Ba0.5Sr0.5)TiO3 (BST) Thin Films Fabricated by RF-magnetron Sputtering Method, IUMRS-ICAM 2015, Oct. 2015.
• M. Uehara, K. Akiyama, M. Matsushima, T. Shimizu, H. Uchida, Y. Kimura, H. Funakubo. Phase Identification of Ca-Si Films prepared on (001) Al2O3 Substrates Using X-ray Diffraction Wide Area Reciprocal Space Mapping Method, July 2015.
• K. Katayama, T. Shimizu, O. Sakata, T. Kiguchi, A. Akama, T. J. Konno, S. Nakamura, H. Uchida, H. Funakubo. Growth and structural analysis of epitaxial orthorhombic YO1.5-HfO2 thin films, NIMS Conference 2015, July 2015.
• Hiroaki FUKUSHIMA, Tomomi KOZU, Hiromi SHIMA, Hiroshi FUNAKUBO, Hiroshi UCHIDA, Takashi KATODA, Ken NISHIDA. Evaluation of Oxygen Vacancy in ZnO Using Raman Spectroscopy, ISAF-ISIF-PFM 2015, May 2015.

Domestic Conference (Not reviewed / Unknown)

• 茂木翔太, Junichi Kimura, HIROSHI FUNAKUBO, Hiroshi Uchida. 化学溶液堆積法により作製したエピタキシャルBaTiO3-Bi(Mg1/2Ti 1/2)O3薄膜の誘電特性, 第35回エレクトロセラミックス研究討論会, Oct. 2015.
• Takahisa Shiraishi, Kiriha Katayama, Tatsuhiko Yokouchi, Takao Shimizu, 及川貴弘, Hiroshi Uchida, HIROSHI FUNAKUBO, Takanori Kiguchi, Toyohiko Konno. 種々の基板上に作製した (Hf0.5Zr 0.5)O2薄膜の特性, 第35回エレクトロセラミックス研究討論会, Oct. 2015.
• Takao Shimizu, Kiriha Katayama, Takanori Kiguchi, 赤間 章裕, Toyohiko Konno, Hiroshi Uchida, Osami Sakata, HIROSHI FUNAKUBO. 斜方晶エピタキシャルHfO2基薄膜のドメイン構造, 第76回応用物理学会秋季学術講演会, Sept. 2015.
• Kiriha Katayama, Takao Shimizu, Takanori Kiguchi, 赤間 章裕, Toyohiko Konno, Hiroshi Uchida, Osami Sakata, HIROSHI FUNAKUBO. Si基板上への斜方晶エピタキシャルHfO2基薄膜の作製, 第76回応用物理学会秋季学術講演会, Sept. 2015.
• 内山潔, Naoya Oshima, hiroki tanaka, yoshitaka Ehara, 及川貴弘, Tomoya Sato, Hiroshi Uchida, HIROSHI FUNAKUBO. PdO//Pd バッファ層を用いた{110} 配向Pb(Zr,Ti)O3(PZT)薄膜の作製と評価, 日本セラミックス協会第28回秋季シンポジウム, Sept. 2015.
• Mutsuo Uehara, Mao Kurokawa, Kensuke Akiyama, masaaki matsushima, Hiroshi Uchida, YOSHISATO KIMURA, HIROSHI FUNAKUBO. スパッタリング法によるCa-Mg-Si基膜の作製と特性評価, 第76回応用物理学会秋季学術講演会, Sept. 2015.
• 茂木翔太, Hiroshi Uchida, Junichi Kimura, HIROSHI FUNAKUBO. BaTiO3-Bi(Mg1/2Ti1/2)O3エピタキシャル薄膜の作製とその特性評価, 日本セラミックス協会第28回秋季シンポジウム, Sept. 2015.
• HIROSHI FUNAKUBO, Naoya Oshima, Takao Shimizu, Mitsumasa Nakajima, yoshitaka Ehara, 及川 貴弘, Hiroshi Uchida. XRD測定による (100)/(001)配向正方晶Pb(Zr,Ti)O3膜の電界印加下の結晶構造変化の定量分析, 第76回応用物理学会秋季学術講演会, Sept. 2015.
• HIROSHI FUNAKUBO, Takahisa Shiraishi, Kiriha Katayama, Tatsuhiko Yokouchi, Takao Shimizu, 及川 貴弘, Hiroshi Uchida. (Hf0.5Zr0.5)O2 薄膜の強誘電性に及ぼす歪の効果, 日本金属学会２０１５年秋期講演大会, Sept. 2015.
• 野口 慶人, 茂木 翔太, HIROSHI FUNAKUBO, Hiroshi Uchida. ナノシート界面層を利用したBaTiO3薄膜の選択配向成長, 第76回応用物理学会秋季学術講演会, Sept. 2015.
• Takahisa Shiraishi, Minoru Kuribayashi Kurosawa, HIROSHI FUNAKUBO, Hiroshi Uchida, Takanori Kiguchi, Toyohiko Konno. 水熱合成(K0.5Na0.5)NbO3 膜の結晶構造と製膜メカニズムの調査, 第32回強誘電体応用会議（FMA 32）, May 2015.
• 内山 潔, Naoya Oshima, yoshitaka Ehara, 及川貴弘, hiroki tanaka, Tomoya Sato, Hiroshi Uchida, HIROSHI FUNAKUBO. PdO/Pd バッファ層を用いた｛110｝配向ペロブスカイト薄膜の作製とその物性評価, 第32回強誘電体応用会議（FMA 32）, May 2015.
• Kiriha Katayama, Takao Shimizu, Takahisa Shiraishi, 及川貴弘, Takanori Kiguchi, 赤間章裕, Toyohiko Konno, 中村奨梧, Hiroshi Uchida, HIROSHI FUNAKUBO. 斜方晶相を含むエピタキシャルHfO2 基薄膜の作製と評価, 第32回強誘電体応用会議（FMA 32）, May 2015.
• 阿部千穂子, 塩川真里奈, Kiriha Katayama, Takahisa Shiraishi, Takao Shimizu, HIROSHI FUNAKUBO, Hiroshi Uchida. CSD 由来HfO2-ZrO2 固溶体薄膜の結晶構造と誘電特性, 第32回強誘電体応用会議（FMA 32）, May 2015.

[ Save as BibTeX ]    [ Paper, Presentations, Books, Others, Degrees: Save as CSV ]    [ Patents: Save as CSV ]