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Publication List - Mayato Toyama 2018 (3 / 6 entries)
International Conference (Reviewed)
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K. Matsuura,
J. Shimizu,
M. Toyama,
T. Ohashi,
I. Muneta,
S. Ishihara,
K. Kakushima,
K. Tsutsui,
A. Ogura,
H. Wakabayashi.
Chip-Level-Integrated nMISFETs with Sputter-Deposited-MoS2 Thin Channel Passivated by Al2O3 Film and TiN Top Gate,
2018 IEEE 2nd Electron Devices Technology and Manufacturing Conference (EDTM),
2018 IEEE Electron Devices Technology and Manufacturing Conference, EDTM 2018 - Proceedings,
pp. 104-106,
Mar. 2018.
Domestic Conference (Not reviewed / Unknown)
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Kenntarou Matsuura,
Junichi Shimizu,
Mayato Toyama,
Takumi Ohashi,
Iriya Muneta,
石原 聖也,
Kuniyuki KAKUSHIMA,
KAZUO TSUTSUI,
Atsushi Ogura,
Hitoshi Wakabayashi.
大面積集積化に向けたスパッタMoS2薄膜を用いたTop-Gate nMISFETs,
第79回応用物理学会秋季学術講演会,
Sept. 2018.
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Takumi Ohashi,
Takuro Sakamoto,
Kentaro Matsuura,
Junnichi Shimizu,
Mayato Toyama,
石原 聖也,
日比野 祐介,
Iriya Muneta,
Kuniyuki KAKUSHIMA,
KAZUO TSUTSUI,
Atsushi Ogura,
Hitoshi Wakabayashi.
Migration制御したスパッタリング法による2次元層状MoS2成膜,
65th JSAP Spring meeting,
Mar. 2018.
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