論文

• Tomoya Higasihara, Mao-Chun FU, Kouji HATAKEYAMA, Shinji ANDO, Ryosuke TAKAHASHI, Mitsuru UEDA. Synthesis of Alkaline-soluble Triazine-based Poly(phenylene sulfide)s with Single/Double Pendant Carboxylic Acid Moieties and Their Application to Refractive Index Contrast Materials, Chem. Lett., Vol. 50, No. 4, pp. 816-818, Jan. 2021.  公式リンク  
  
• Chun-Kai CHEN, Yan-Cheng LIN, Satoshi MIYAKE, Shinji ANDO, Mitsuru UEDA, Wen-Chang CHEN. Thermally and Mechanically Stable Polyimides as Flexible Substrates for Organic Field-effect Transistors, ACS Appl. Polym. Mater., Vol. 2, pp. 3422-3432, June 2020.  公式リンク  
  
• Mao-Chun FU, Mitsuru UEDA, Shinji ANDO, Tomoya HIGASHIHARA. Development of Novel Triazine-based Poly(phenylene sulfide)s with High Refractive Index and Low Birefringence, ACS Omega, Vol. 5, No. 10, pp. 5134-5141, Mar. 2020.  公式リンク  
  
• Motohiro AIBA, Yuji SHIBASAKI, Mitsuo ODA, Chihiro OOKA, Seijiro FUKUTA, Tomoya HIGASHIHARA, Shinji ANDO, Mitsuru UEDA, Wen-Chang CHEN. Synthesis of Poly(o-cresol) by Oxidative Coupling Polymerization of o-Cresol, J. Polym. Sci. Part B, Polym. Chem, Vol. 57, No. 8, pp. 878-884, Feb. 2019.  公式リンク  
  
• Motohiro Aiba, Kenji Ito, Takahiro Tokuyama, Hiroki Tomioka, Tomoya Higashihara, Mitsuru Ueda, Hidetoshi Matsumoto. Structure-property relationships of random aromatic copolyamide membranes by the partial N-methylation of amide linkages, Macromol. Chem. Phys., Wiley-VCH, Vol. 219, No. 6, pp. 1700522/1-7, Mar. 2018.  公式リンク  
  
• Motohiro Aiba, Takahiro Tokuyama, Hidetoshi Matsumoto, Hiroki Tomioka, Tomoya Higashihara, Mitsuru Ueda. Semipermeable membranes based on polybenzimidazole: simultaneous improvement in water flux and salt rejection by facile crosslinking, Desalination, Elsevier, Vol. 395, pp. 1-7, Oct. 2016.  公式リンク  
  
• Kazuhiro NAKABAYASHI, Takayuki IMAI, Mao-Chun FU, Shinji ANDO, Tomoya HIGASHIHARA, Mitsuru UEDA. Poly(phenylene thioether)s with Fluorene-Based Cardo Structure toward High Transparency, High Refractive Index, and Low Birefringence, Macromolecules, American Chemical Society, Vol. 49, Issue 16, pp. 5849-5856, Aug. 2016.  公式リンク  
  
• Tomoya Higashihara, Shotaro Ito, Seijiro Fukuta, Satoshi Miyane, Yuto Ochiai, Takashi Ishizone, Mitsuru Ueda, Akira Hirao. Synthesis and Characterization of Multicomponent ABC- and ABCD Type Miktoarm Star-Branched Polymers Containing a Poly(3-hexylthiophene) Segment, ACS Macro Lett., vol. 5, page 631-635, Apr. 2016.
• Kazuhiro NAKABAYASHI, Takayuki IMAI, Mao-Chun FU, Shinji ANDO, Tomoya Higashihara, Mitsuru UEDA. Synthesis and Characterization of Poly(Phenylene Thioether)s Containing Pyrimidine Units Exhibiting High Transparency, High Refractive Indices, and Low Birefringence, Journal of Materials Chemistry C, Royal Society of Chemistry, Vol. 3, Issue 27, pp. 7081-7087, June 2015.  公式リンク  
  
• Motohiro Aiba, Takahiro Tokuyama, Hidetoshi Matsumoto, Hiroki Tomioka, Tomoya Higashihara, Mitsuru Ueda. Effect of primary structure on permselectivity of ultrathin semipermeable polybenzimidazole membrane, J. Appl. Polym. Sci., Wiley-VCH, Vol. 132, No. 9, pp. 41531/1-7, Mar. 2015.  公式リンク  
  
• Tomoya Higashihara, Shotaro Ito, Seijiro Fukuta, Tomoyuki Koganezawa, Mitsuru Ueda, Takashi Ishizone, Akira Hirao. Synthesis and Characterization of ABC-Type Asymmetric Star Polymers Comprised of Poly(3-hexylthiophene), Polystyrene, and Poly(2-vinylpyridine) Segments, Macromolecules, American Chemical Society, vol. 48, pp. 245-255, Feb. 2015.
• Motohiro Aiba, Takahiro Tokuyama, Hidetoshi Matsumoto, Hiroki Tomioka, Tomoya Higashihara, Mitsuru Ueda. Effect of N-methyl amide linkage on hydrogen bonding behavior and water transport properties of partially N-methylated random aromatic copolyamides, J. Polym. Sci. A: Polym. Chem., Wiley-VCH, Vol. 52, No. 24, pp. 3453-3462, Dec. 2014.  公式リンク  
  
• Koutarou Aoyagi, Yu Shoji, Saika Ootsubo, Susumu Kawauchi, Mitsuru Ueda, Hidetoshi Matsumoto, Tomoya Higashihara. Design of fullerene-free electron acceptor materials containing perylenediimide units for solution-processed organic electronic devices, Bull. Chem. Soc. Jpn., The Chemical Society of Japan, Vol. 87, No. 10, pp. 1083-1093, Oct. 2014.  公式リンク  
  
• Yusuke INOUE, Yoshihito ISHIDA, Tomoya HIGASHIHARA, Atsushi KAMEYAMA, Shinji ANDO, Mitsuru UEDA. Alkaline-developable and Positive-type Photosensitive Polyimide based on Fluorinated Poly(amic acid) from Diamine with High Hydrophobicity and Fluorinated Diazonaphtoquinone, Journal of Photopolymer Science and Technology, The society of photopolymer science and technology, Vol. 27, No. 2, pp. 211-217, July 2014.  公式リンク  
  
• Motohiro Aiba, Takahiro Tokuyama, Susumu Baba, Hidetoshi Matsumoto, Hiroki Tomioka, Tomoya Higashihara, Mitsuru Ueda. Improvement in semipermeable membrane performance of wholly aromatic polyamide through an additive processing strategy, J. Polym. Sci. A: Polym. Chem., Wiley-VCH, Vol. 52, No. 9, pp. 1275-1281, May 2014.  公式リンク  
  
• Fukuta S, Koganezawa T, Tokita M, Kawauchi S, Mori H, Ueda M, Higashihara T.. ”Face-On” Oriented π-Conjugated Polymers Containing 1,3,4-Thiadiazole Moiety Investigated with Synchrotron GIXS Measurements: Relationship between Morphology and PSC Performance, Journal of Photopolymer Science and Technology, 27, 3, 351-356, Apr. 2014.
• Susumu Kawauchi, Eisuke Gotou, Saki Nakamura, Hideharu Mori, mitsuru ueda, tomoya higashihara. Precision synthesis of regioregular poly(3-hexylthiophene) with low dispersity using a zincate complex catalyzed by nickel with the ligand of 1,2-bis(dicyclohexylphosphino)ethane, Journal of Polymer Science Part A: Polymer Chemistry, Wiley, Vol. 52, No. 26, Page 2287–2296, Mar. 2014.
• Yoshitaka Saito, Hidetoshi Matsumoto, Tomoya Higashihara, Mitsuru Ueda. Synthesis of transparent and thermally stable polycyanurates and their thermal rearrangement, J. Polym. Sci. A: Polym. Chem., Wiley-VCH, Vol. 51, No. 18, pp. 3950-3955, Sept. 2013.  公式リンク  
  
• Yu Shoji, Tomoya Higashihara, Masatoshi Tokita, Junko Morikawa, Junji Watanabe, Mitsuru Ueda. Thermal diffusivity of hexagonal boron nitride composites based on cross-linked liquid crystalline polyimides., ACS applied materials & interfaces, Vol. 5, No. 8, pp. 3417-23, Apr. 2013.  公式リンク  
  
• Yu Shoji, Ryohei Ishige, tomoya higashihara, Junko Morikawa, Toshimasa Hashimoto, ATSUSHI TAKAHARA, junji watanabe, mitsuru ueda. Cross-Linked Liquid Crystalline Polyimides with Siloxane Units: Their Morphology and Thermal Diffusivity, MACROMOLECULES, Vol. 46, No. 3, pp. 747-755, Jan. 2013.
• Yu NAKAGAWA, Yasuo SUZUKI, Tomoya HIGASHIHARA, Shinji ANDO, Mitsuru UEDA. Synthesis of Highly Refractive Poly(phenylene thioether)s Containing a Binaphthyl or Diphenylfluorene Unit, Polymer Chemistry, Royal society of chemistry, Vol. 3, Issue 9, pp. 2531-2536, June 2012.  公式リンク  
  
• Yasuo SUZUKI, Tomoya HIGASHIHARA, Shinji ANDO, Mitsuru UEDA. Synthesis and Characterization of High Refractive Index and High Abbe’s Number Poly(thioether sulfone)s based on Tricyclo[5.2.1.02,6]decane Moiety, Macromolecules, American chemical society, Vol. 45, Issue 8, pp. 3402-3408, Apr. 2012.  公式リンク  
  
• Yasuo Suzuki, Kimiya Murakami, Shinji Ando, Tomoya Higashihara, Mitsuru Ueda. Synthesis and characterization of thianthrene-based poly(phenylene sulfide)s with high refractive index over 1.8, Journal of Materials Chemistry, Royal Society of Chemistry, Vol. 21, Issue 39, p. 15727-15731, Sept. 2011.  公式リンク  
  
• C. W. Bielawski, R. J. Ono, Y. Suzuki, D. M. Khramov, M. Ueda, J. L. Sessler. Synthesis and Study of Redox-Active Acyclic Triazenes: Toward Electrochromic Applications, J Org Chem, Vol. 76, No. 9, p. 3239-3245, Apr. 2011.
• Namiko Fukuzaki, Kazuhiro Nakabayashi, Satoshi Nakazawa, Shigeaki Murata, Tomoya Higashihara, Mitsuru Ueda. Highly Phosphonated Poly(N-phenylacrylamide) for Proton Exchange Membranes., J. Polym. Sci., Part A: Polym. Chem., Vol. 49, pp. 93-100, Apr. 2011.
• Ryohei Ishige, Yu Shoji, Tomoya Higashihara, Mitsuru Ueda, Junji Watanabe. Characteristic Smectic Structures of Main-chain Liquid-crystalline Polyimides, J. Mater. Chem., Vol. 22, pp. 1532-1538, Apr. 2011.
• Yi-Cang Lai, Kaoru Ohshimizu, Ayumi Takahashi, Jung-Ching Hsu, Tomoya Higashihara, Mitsuru Ueda, Wen-Chang Chen. Synthesis of All-conjugated Poly(3-hexylthiophene)-block-poly(3-(4'-(3'',7''-dimethyloctyloxy)-3'-pyridinyl)thiophene) and Its Blend for Photovoltaic Applications., J. Polym. Sci., Part A: Polym. Chem., Vol. 49, pp. 2577-2587, Apr. 2011.
• A. H. Cowley, A. B. Powell, Y. Suzuki, M. Ueda, C. W. Bielawski. A Recyclable, Self-Supported Organocatalyst Based on a Poly(N-Heterocyclic Carbene)., J Am Chem Soc, Vol. 133, No. 14, p. 5218-5220, 2011.
• C. L. Liu, T. Kurosawa, A. D. Yu, T. Higashihara, W. C. Chen, M. Ueda. New Dibenzothiophene-Containing Donor-Acceptor Polyimides for High-Performance Memory Device Applications., J Phys Chem C, Vol. 115, No. 13, p. 5930-5939, 2011.
• Y. Saito, T. Higashihara, M. Ueda. Direct Photo-Patterning of Poly(3-Hexylthiophene)., J Photopolym Sci Tech, Vol. 24, No. 3, p. 273-276, 2011.
• W.-Y. Lee, T. Kurosawa, S.-T. Lin, T. Higashihara, M. Ueda, W.-C. Chen. New Donor–Acceptor Oligoimides for High-Performance Nonvolatile Memory Devices., Chem. Mater., Vol. 23, p. 4487-4497, 2011.
• Y.-C. Lai, K. Ohshimizu, W.-Y. Lee, J.-C. Hsu, T. Higashihara, M. Ueda, W.-C. Chen. Electrically Bistable Memory Devices Based on All-Conjugated Block Copolythiophenes and Their PCBM Composite Films., J Mater Chem, Vol. 21, p. 14502-14508, 2011.
• K. Ohshimizu, A. Takahashi, Y. Rho, T. Higashihara, M. Ree, M. Ueda. Synthesis and Characterization of Polythiophenes Bearing Aromatic Groups at the 3-Position., Macromolecules, Vol. 44, No. 4, p. 719-727, 2011.
• T. Higashihara, K. Ohshimizu, Y. Ryo, T. Sakurai, A. Takahashi, S. Nojima, M. Ree, M. Ueda. Synthesis and Characterization of Block Copolythiophene with Hexyl and Triethylene Glycol Side Chains., Polymer, Vol. 52, p. 3687-3695, 2011.
• T. Higashihara, C.-L. Liu, W.-C. Chen, M. Ueda. Synthesis of Novel Π-Conjugated Rod-Rod-Rod Triblock Copolymers Containing Poly(3-Hexylthiophene) and Polyacetylene Segments by Combination of Quasi-Living Grim and Living Anionic Polymerization., Polymers, Vol. 3, p. 236-251, 2011.
• T. Kasai, T. Higashihara, M. Ueda.. Synthesis of calixresorcinarene derivatives with cross-linking units and evaluation of lithographic performance, J. Phtopolym. Sci. & Eng. Technol., Vol. 24, p. 631-635, 2011.
• C. Zhang, Y. Shoji, T. Higashihara, A. Tsukuda, T. Ochi, M. Ueda. Synthesis of Poly(m-Phenyleneisophthalamide) by Solid-State Polycondensation of Isophthalic Acid with m-Phenylenediamine., J Polym Sci Part A: Polym Chem, Vol. 47, p. 4725-4728, 2011.
• Y. Tamura, Y. Ito, Y. Segawa, T. Higashihara, M. Ueda. Synthesis of a Linear Polymer from an AB2 Monomer of 1-(3-Phenoxypropyl)Piperidine-4-One in Trifluoromethanesulfonic Acid., Polym Chem., Vol. 2, No. 8, p. 1644-1647, 2011.
• K. Ohshimizu, A. Takahashi, T. Higashihara, M. Ueda. Synthesis of Poly(m-Phenylene) and Poly(m-Phenylene)-Block-Poly(3-Hexylthiophene) with Low Polydispersities., J Polym Sci Part A: Polym Chem, Vol. 49, No. 12, p. 2709-2714, 2011.
• T. Nakagawa, K. Nakabayashi, T. Higashihara, M. Ueda. Polymer Electrolyte Membrane Based on Poly(Ether Sulfone) Containing Binaphthyl Units with Pendant Perfluoroalkyl Sulfonic Acids., J Polym Sci Part A: Polym Chem, Vol. 49, No. 14, p. 2997-3003, 2011.
• K. Nakabayashi, T. Higashihara, M. Ueda. Polymer Electrolyte Membranes Based on Poly(Phenylene Ether)s with Pendant Perfluoroalkyl Sulfonic Acids., Macromolecules, Vol. 44, No. 6, p. 1603-1609, 2011.
• Masaya Sugiyama, Tomohito Ogura, tomoya higashihara, mitsuru ueda. Development of a Chemically Amplified Photosensitive Polyimide Based on Poly(amic acid), a Dosslution Inhibitor, and a Photoacid Generator, J. Photopolym. Sci.＆Technol., Vol. 23, pp. 483-488, Aug. 2010.
• Yukari Segawa, tomoya higashihara, mitsuru ueda. Hyperbranched Polymers with Controlled Degree of Branching from 0 to 100%, J. Am. Chem. Soc., Vol. 132, pp. 11000-11001, Aug. 2010.
• Taijirou Nakagawa, Kazuhiro Nakabayashi, tomoya higashihara, mitsuru ueda. A high perfprmance polymer electrolyte membrane based on sulfonated poly(ether sulfone) with binaphthyl units, J.Mater. Chem., Vol. 20, pp. 6662-6667, Aug. 2010.
• mitsuru ueda. Molecular weight control of thermosetting poly(phenylene ether) copolymer produced by heterogeneous oxidative coupling polymerization, High Perform. Polym., Vol. 22, pp. 458-467, Aug. 2010.
• Tomohito Ogura, tomoya higashihara, mitsuru ueda. Pattern formation of polyimide by using photosensitive polybenzoxazole as a top layer, European Polymer Journal, Vol. 46, No. 7, pp. 1576-1581, Aug. 2010.
• Tomohito Ogura, tomoya higashihara, mitsuru ueda. Development of Photosensitive Poly(hydroximide) with high refractive index, J. Photopolym. Sci.＆Technol., Vol. 23, pp. 515-520, Aug. 2010.
• tomoya higashihara, Chen Wen-Chang, mitsuru ueda. Enhancement of P3HT/PCBM Photovoltaic Efficiency Using the Surfactant of Triblock Copolymer Containing Poly(3-hexylthiophene) and Poly(4-vinyltriphenylamine) Segments, Macromolecules, Vol. 43, No. 14, pp. 6085-6091, Aug. 2010.
• Kazuhiro Nakabayashi, tomoya higashihara, mitsuru ueda. Polymer Electrolyte Membranes Based on Cross-Linked Highly Sulfonated Multiblock Copoly(ether sulfone)s, Macromolecules, Vol. 43, pp. 5756-5761, Aug. 2010.
• Ayumi Takahashi, tomoya higashihara, Ree Moonhor, mitsuru ueda. Preparation of Nanoporous Poly(3-hexylthiophene) Films Based on a Template System of Block Copolymers via Ionic Interaction, Macromolecules, Vol. 43, No. 11, pp. 4843-4852, Aug. 2010.
• Kazuhiro Nakabayashi, tomoya higashihara, mitsuru ueda. Highly sulfonated multiblock copoly(ether sulfone)s for fuel cell membranes, J. Polym. Sci. Part-A, Polym. Chem, Vol. 48, No. 12, pp. 2757-2764, Aug. 2010.
• Yu Nakagawa, Tomohito Ogura, tomoya higashihara, mitsuru ueda. Optically Transparent Sulfur-containing Semi-alicyclic Polyimide with High Refractive Index, Vol. 39, pp. 392-393, Aug. 2010.
• Katsuhisa Mizoguchi, tomoya higashihara, mitsuru ueda. Negative-Working Photosensitive Poly(phenylene ether) Based on Poly(2,6-dimethyl-1,4-phenylene ether), a Cross-Linker, and a Photoacid Generator, Macromolecules, Vol. 43, No. 6, pp. 2832-2839, Aug. 2010.
• Nam-Ho YOU, Tomoya HIGASHIHARA, Shinji ANDO, Mitsuru UEDA. Highly Refractive Polymer Resin Derived from Sulfur-Containing Aromatic Acrylate, Journal of Polymer Science Part A: Polymer Chemistry, Wiley, Vol. 48, Issue 12, pp. 2604-2609, May 2010.  公式リンク  
  
• NAM-HO YOU, Tomoya Higasihara, SHINJI ANDO, mitsuru ueda. Highly refractive polymer resin derived from sulfur-containing aromatic acrylat, J. Polym. Sci. Part-A, Polym. Chem.,, Vol. 48, No. 12, pp. 2604-2609, May 2010.  公式リンク  
  
• Tomohito Ogura, tomoya higashihara, mitsuru ueda. Low-CTE photosensitive polyimide based on semialicyclic poly(amic acid) and photobase generator., J. Polym. Sci. Part-A, Polym. Chem., Vol. 48, pp. 1317-1323, Apr. 2010.
• NAM-HO YOU, tomoya higashihara, Yoshiyuki Oishi, SHINJI ANDO, mitsuru ueda. Highly Refractive Poly(phenylene thioether) Containing Triazine Unit, Macromolecules, American Chemical Society, Vol. 43, Issue 10, pp. 4613-4615, Apr. 2010.  公式リンク  
  
• mitsuru ueda. Facile access to internally functionalized dendrimers through efficient and orthogonal click reactions., Chem. Comm., Vol. 46, No. 9, pp. 1556-1558, Apr. 2010.
• Tadanori Kurosawa, tomoya higashihara, Chen Wen-Chang, mitsuru ueda. High performance volatile polymeric memory devices based on novel triphenylamine-based polyimides containing mono- or dual-mediated phenoxy linkages, Macromolecules 43(3), 1236-1244 (2010), Vol. 43, no. 3, pp. 1236-1244, Apr. 2010.
• Yu Shoji, Ryohei Ishige, tomoya higashihara, Junji Watanabe, mitsuru ueda. Thermotropic Liquid Crystalline Polyimides with Siloxane Linkages: Synthesis, Characterization, and Liquid Crystalline Behavior, Macromolecules, Vol. 43, No. 2, p. 805, Jan. 2010.
• Namiko FUKUZAKI, Tomoya HIGASHIHARA, Shinji ANDO, Mitsuru UEDA. Synthesis and Characterization of Highly Refractive Polyimides Derived from Thiophene-Containing Aromatic Diamines and Aromatic Dianhydrides, Macromolecules, American Chemical Society, Vol. 43, Issue 4, pp. 1836-1843, Jan. 2010.  公式リンク  
  
• NAM-HO YOU, Tomoya Higashihara, Yasuo Suzuki, Shinji Ando, Mitsuru Ueda. Synthesis of sulfur-containing poly(thioester)s with high refractive indices and high Abbe numbers, Polymer Chemistry, Royal Society of Chemistry, Vol. 1, Issue 4, pp. 480–484, Jan. 2010.  公式リンク  
  
• tomoya higashihara, Ayumi Takahashi, Shiyuuhei Tajima, Ree Moonhor, mitsuru ueda. Synthesis of block copolymers consisting of poly(3-hexylthiophene) and polystyrene segments through ionic interaction and their self-assembly behavior, Polymer Journal, Vol. 42, No. 1, pp. 43-50, Jan. 2010.
• Nam-Ho YOU, Tomoya HIGASHIHARA, Shinji ANDO, Mitsuru UEDA. Synthesis of highly refractive and transparent polyimides derived from 4,4′‐thiobis[2″,6″‐dimethyl‐4″‐(p‐phenylenesulfanyl)aniline], Journal of Polymer Science: Part A: Polymer Chemistry, Wiley Periodicals, Inc., Vol. 48, Issue 3, pp. 656-662, Dec. 2009.  公式リンク  
  
• Yasuo SUZUKI, Tomoya HIGASHIHARA, Shinji ANDO, Mitsuru UEDA. Synthesis of Amorphous Copoly(Thioether Sulfone)s with High Refractive Indices and High Abbe Numbers, European Polymer Journal, Elsevier, Vol. 46, Issue 1, pp. 34-41, Sept. 2009.  公式リンク  
  
• Yu Shoji, Ryohei Ishige, tomoya higashihara, Susumu Kawauchi, 渡辺順次, mitsuru ueda. Synthesis and Liquid Crystalline Behavior of Laterally Substituted Polyimides with Siloxane Linkages, Macromolecules, Vol. 43, No. 21, pp. 8950-8956, Aug. 2009.
• Yasuo SUZUKI, Tomoya HIGASHIHARA, Shinji ANDO, Mitsuru UEDA. Synthesis of High Refractive Index Poly(thioether sulfone)s with High Abbe’s Number Derived from 2,5-Bis(sulfanylmethyl)-1,4-dithiane, Polymer Journal, Springer Nature Publishing, Vol. 41, No. 10, pp. 860-865, Aug. 2009.  公式リンク  
  
• Nam-Ho YOU, Yasuhiro NAKAMURA, Yasuo SUZUKI, Tomoya HIGASHIHARA, Shinji ANDO, Mitsuru UEDA. Synthesis of Highly Refractive Polyimides Derived from 3,6-Bis(4-aminophenylenesulfanyl)pyridazine and 4,6-Bis(4-aminophenylenesulfanyl)pyrimidine, Journal of Polymer Science Part A: Polymer Chemistry, Wiley, Vol. 47, Issue 19, pp. 4886-4894, Aug. 2009.  公式リンク  
  
• N-H. You, N. Fukuzaki, Y. Suzuki, Y. Nakamura, T. Higashihara, S. Ando, M. Ueda. Synthesis of High-Refractive Index Polyimide Containing Selenophene Unit, J. Polym. Sci. Part-A, Polym. Chem., Vol. 47, pp. 4428 - 4434, July 2009.
• 東原知哉, 上田 充. 重縮合, ネットワークポリマー, Vol. 30, No. 5, pp. 261-272, July 2009.
• 東原知哉, 上田 充. UV硬化型感光性高分子材料の開発, 接着の技術誌, Vol. 29, pp. 1-7, July 2009.
• M. Ueda, mitsuru ueda. Chemically Amplified Photosensitive Polyimides and Polybenzoxazoles, J. Photopolym. Sci.＆Technol., Vol. 22, pp. 761-771, July 2009.
• T. Higashihara, M. Ueda. Living Anionic Polymerization of 4-Vinyltriphenylamine for Synthesis of Novel Block Copolymers Containing Low-Polydisperse Poly(4-vinyltriphenylamine), Macromolecules, Vol. 42, No. 22, pp. 8794–8800, July 2009.
• W. Sinananwanich, Y.Segawa, T. Higashihara, mitsuru ueda. Base-Catalyzed Synthesis of a 100% Hyperbranched Polymer on the Basis of an Indolin-2-one Unit, Macromolecules, Vol. 42, No. 22, pp. 8718–8724, July 2009.
• C-C. Chueh, T. Higashihara, J-H. Tsai, M.Ueda, W-C. Wen. All-conjugated diblock copolymer of poly(3-hexylthiophene)-block- poly(3-phenoxymethylthiophene) for field-effect transistor and photovoltaic applications., Organic Electronics, Vol. 10, No. 8, pp. 1541-1548, July 2009.
• T. Higashihara, Kazuya. Matsumoto, mitsuru ueda. Sulfonated aromatic hydrocarbon polymers as proton exchange membranes for fuel cells, Polymer, Vol. 50, No. 23, pp. 5341-5357, July 2009.
• Keita Endo, Tomohito Ogura, T. Higashihara, mitsuru ueda. A Negative-Type Photosensitive Poly(3-hexylthiophene) with Cross-Linker and Photoacid Generator, Polym. J., Vol. 41, pp. 808-809, July 2009.
• Kazuya Matsumoto, Taijiro Nakagawa, T. Higashihara, mitsuru ueda. Sulfonated poly(ether sulfone)s with binaphthyl units as proton exchange membranes for fuel cell application, J. Polym. Sci. Part-A, Polym. Chem., Vol. 47, pp. 5827-5834, July 2009.
• Yuta Saito, Kazuya Matsumoto, T. Higashihara, mitsuru ueda. A Chemically Amplified, Negative-type Photosensitive Poly(phenylene ether ketone) (PEK) Resist Based on Ketal-protected PEK and a Photoacid Generator, Chem. Lett, Vol. 38, pp. 1048-1049, July 2009.
• N-H. You, C-C. Chueh, C-L. Liu, M. Ueda, W-C. Chen. Synthesis and Memory Device Characteristics of New Sulfur Donor Containing Polyimides, Macromolecules, Vol. 42, No. 13, pp. 4456-4463, July 2009.
• Y. Saito, K. Mizoguchi, T. Higashihara, M. Ueda. Alkaline-developable, chemically amplified, negative-type photosensitive polyimide based on polyhydroxyimide, a crosslinker, and a photoacid generator, J. Appl. Polym. Sci., Vol. 113, pp. 3605-3611, July 2009.
• Tomohito Ogura, ; Tomoya Higashihara, mitsuru ueda. Development of photosensitive poly(benzoxazole) based on a poly(o-hydroxy amide), a dissolution inhibitor, and a photoacid generator, Vol. 22, pp. 429-436, July 2009.
• yuta saito, tomoya higashihara, mitsuru ueda. Highly refractive and photosensitive polyimide, Vol. 22, pp. 423-428, July 2009.
• Keita Endo, Yumiko Ito, Tomoya Higashihara, Mitsuru Ueda. Synthesis of a novel water-soluble polyamide dendrimer based on a facile convergent method, European Polymer Journal, Vol. 45, No. 7, 1994-2001, July 2009.
• Katsuhisa Mizoguchi, tomoya higashihara, mitsuru ueda. An Alkaline-Developable, Chemically Amplified, Negative-Type Photosensitive Poly(benzoxazole) Resist Based on Poly(o-hydroxy amide), an Active Ester-Type Crosslinker, and a Photobase Generator, Macromolecules, Vol. 42, No. 4, pp. 1024-1030, July 2009.
• Tomoya Higashihara, Mitsuru Ueda. Synthesis and characterization of a novel coil-rod-coil triblock copolymers comprised of regioregular poly(3-hexylthiophene) and poly(methyl methacrylate) segments, Reactive and functional polymers, Vol. 69, No. 7, pp. 475-462, July 2009.
• Kazuya Matsumoto, Tomoya Higashihara, Mitsuru Ueda. Locally sulfonated poly(ether sulfone)s with highly sulfonated units as proton exchange membrane, J. Polym. Sci.: PartA: Polym. Chem, Vol. 47, No. 13, pp. 3444-3453, May 2009.
• Tomohito Ogura, Tomoya Higashihara, Mitsuru Ueda. Direct patterning of poly(amic acid) and low-temperature imidization using a crosslinker, a photoacid generator, and a thermobase generator, J. Polym. Sci., Part A: Polym. Chem., Vol. 47, No. 13, pp. 3362-3369, May 2009.
• Katsuhisa Mizoguchi, Tomoya Higashihara, Mitsuru Ueda. An Alkaline-Developable, Negative-Working Photosensitive Polybenzoxazole Based on Poly(o-hydroxyamide), a Vinyl Sulfone-Type Cross-Linker, and a Novel Photobase Generator, Macromolecules, Vol. 42, No. 4, pp. 3780-3787, Feb. 2009.
• Kazuhiro Nakabayashi, Kazuya Matsumoto, Tomoya Higashihara, Mitsuru Ueda. Influence of polymer structure in sulfonated block copoly(ether sulfone) membranes for fuel cell application, Polymer Journal, Vol. 41, No. 4, pp. 332-337, Feb. 2009.
• Katsuhisa Mizoguchi, Tomoya Higashihara, Mitsuru Ueda. Alkaline-Developable, Chemically Amplified, Negative-Type Photosensitive Poly(benzoxazole) Resist Based on Poly(o-hydroxy amide), an Active Ester-Type Crosslinker, and a Photobase Generator, Macromolecules, Vol. 42, No. 4, pp. 1024-1030, Feb. 2009.
• Warapon Sinananwanich, Tomoya Higashihara, Mitsuru Ueda. Synthesis of a Hyperbranched Polymer with Perfect Branching Based on Piperidine-4-one, Macromolecules, Vol. 42, No. 4, pp. 994-1001, Jan. 2009.
• Kazuya Matsumoto, Tomoya Higashihara, Mitsuru Ueda. Locally and Densely Sulfonated Poly(ether sulfone)s as Proton Exchange Membrane, Macromolecules, Vol. 42, No. 4, pp. 1161-1166, Jan. 2009.
• Nam-Ho You, Yasuo Suzuki, Tomoya Higashihara, Shinji Ando, Mitsuru Ueda. Synthesis and characterization of highly refractive polyimides derived from 2,7-bis(4'-aminophenylenesulfanyl)thianthrene-5,5,10,10-tetraoxide and aromatic dianhydrides, Polymer, Elsevier, Vol. 50, Issue 3, pp. 789-795, Jan. 2009.  公式リンク  
  
• Jin-gang LIU, Yasuhiro NAKAMURA, Tomohito OGURA, Yuji SHIBASAKI, Shinji ANDO, mitsuru ueda. Optically Transparent Sulfur-Containing Polyimide-TiO2 Nanocomposite Films with High Refractive Index and Negative Pattern Formation from Poly(amic acid)-TiO2 Nanocomposite Film, Chemistry of Materials, American Chemical Society, Vol. 20, Issue 1, pp. 273-281, Dec. 2008.  公式リンク  
  
• Yumiko Ito, Tomoya Higashihara, Mitsuru Ueda. Positive-working photoresist based on a first-generation dendrimer consisting of 3,5-bis(tetrahydropyranyloxy)benzyl units, J. Photopolym. Sci.＆Technol.,, Vol. 21, pp. 799-803, Nov. 2008.
• Yukari Segawa, Warapon Sinananwanich, M. Ueda. Facile Synthesis of Poly(phenylene ether) and “in-Situ” Functionalization of Polymer Backbones Macromolecules,, Macromolecules, Vol. 41, pp. 8309-8311, Nov. 2008.
• Tomoya Higashihara, Kaoru Ohshimizu, Akira Hirao, Mitsuru Ueda. Facile Synthesis of ABA Triblock Copolymer Containing Regioregular Poly(3-hexylthiophene) and Polystyrene Segments via Linking Reaction of Poly(styryl)lithium, Macromolecules, Vol. 41, pp. 9505-9507, Nov. 2008.
• Kazuhiro Nakabayashi, Kazuya Matsumoto, Tomoya Higashihara, Mitsuru Ueda. Influence of adjusted hydrophilic-hydrophobic lengths in sulfonated multiblock copoly(ether sulfone) membranes for fuel cell application, J. Polym. Sci.: Part A: Polym. Chem., Vol. 46, pp. 7332-7341, Oct. 2008.
• Kazuya Matsumoto, Tomoya Higashihara, Mitsuru Ueda. Star-Shaped Sulfonated Block Copoly(ether ketone)s as Proton Exchange Membranes, Macromolecules, Vol. 41, pp. 7560 - 7565, Sept. 2008.
• Nam-Ho You, Yasuo Suzuki, Daisuke Yorifuji, Shinji Ando, Mitsuru Ueda. Synthesis of High Refractive Index Polyimides Derived from 1,6-Bis(p-aminophenylsulfanyl)-3,4,8,9-tetrahydro-2,5,7,10-tetrathiaanthracene and Aromatic Dianhydrides, Macromolecules, American Chemical Society, Vol. 41, Issue 17, pp. 6361 - 6366, Aug. 2008.  公式リンク  
  
• Rie Okutsu, Yasuo Suzuki, Shinji Ando, Mitsuru Ueda. Poly(thioether sulfone) with High Refractive Index and High Abbe’s Number, Macromolecules, American Chemical Society, Vol. 41, Issue 16, pp. 6165 - 6168, July 2008.  公式リンク  
  
• 鈴木 康夫, 劉 金剛, 芝崎 祐二, 中村 康広, 安藤 慎治, 上田 充. スルホン構造を含む高透明性・高屈折率含硫黄ポリイミドの合成, ポリイミド最近の進歩2008, ポリイミド研究会編, 繊維工業技術振興会, Vol. 2008, pp. 90-92, July 2008.
• Yasuo SUZUKI, Yasuhiro NAKAMURA, Shinji ANDO, Mitsuru UEDA. Synthesis of Highly Refractive Polyimides Derived from 2,5-Bis(4-aminophenylsulfanyl)-1,4-dithiane and Dianhydrides, Journal of Photopolymer Science and Technology, The Society of Photopolymer Science and Technology, Vol. 21, No. 1, p. 131-136, June 2008.  公式リンク  
  
• Rie OKUTSU, Shinji ANDO, Mitsuru UEDA. Sulfur-Containing Poly(meth)acrylates with High Refractive Indices and High Abbe’s Numbers, Chemistry of Materials, American Chemical Society, Vol. 20, Issue 12, p. 4017–4023, May 2008.  公式リンク  
  
• Ziyi Ge, Teruaki Hayakawa, Shinji Ando, Mitsuru Ueda, Toshiyuki Akiike, Hidetoshi Miyamoto, Toru Kajita, Masa-aki Kakimoto. Solution-processible Fluorinated Carbazole Derivative for Phosphorescent Organic Light-emitting Diodes, Chemistry Letters, The Chemical Society of Japan, Vol. 37, No. 3, pp. 294-295, Mar. 2008.  公式リンク  
  
• Ziyi Ge, Teruaki Hayakawa, Shinji Ando, Mitsuru Ueda, Toshiyuki Akiike, Hidetoshi Miyamoto, Toru Kajita, Masa-aki Kakimoto. Synthesis and Properties of 3,8-Bis[4-(9H-carbazol-9-yl)phenyl]-1,10-phenanthroline for Phosphorescent OLEDs, Chemistry Letters, The Chemical Society of Japan, Vol. 37, No. 3, pp. 262-263, Mar. 2008.  公式リンク  
  
• Ziyi Ge, Teruaki Hayakawa, Shinji Ando, Mitsuru Ueda, Toshiyuki Akiike, Hidetoshi Miyamoto, Toru Kajita, Masa-aki Kakimoto. Solution-Processible Bipolar Triphenylamine-Benzimidazole Derivatives for Highly Efficient Single-Layer Organic Light-Emitting Diodes, Chemistry of Materials, American Chemical Society, Vol. 20, Issue 7, pp. 2532-2537, Mar. 2008.  公式リンク  
  
• Yasuo SUZUKI, Jin-gang LIU, Yasuhiro NAKAMURA, Yuji SHIBASAKI, Shinji ANDO, Mitsuru UEDA. Synthesis of Highly Refractive and Transparent Polyimides Derived from 4,4'-[p-Sulfonylbis(phenylenesulfanyl)]diphthalic Anhydride and Various Sulfur-containing Aromatic Diamines, Polymer Journal, Springer Nature Publishing, Vol. 40, No. 5, pp. 414-420, Mar. 2008.  公式リンク  
  
• Ziyi Ge, Teruaki Hayakawa, Shinji Ando, Mitsuru Ueda, Toshiyuki Akiike, Hidetoshi Miyamoto, Toru Kajita, Masa‐aki Kakimoto. Spin-Coated Highly Efficient Phosphorescent Organic Light-Emitting Diodes Based on Bipolar Triphenylamine-Benzimidazole Derivatives, Advanced Functional Materials, Wiley, Vol. 18, Issue 4, pp. 584-590, Feb. 2008.  公式リンク  
  
• Claudio A. TERRAZA, Jin-Gang LIU, Yasuhiro NAKAMURA, Yuji SHIBASAKI, Shinji ANDO, Mitsuru UEDA. Synthesis and Properties of Highly Refractive Polyimides Derived from Fluorene-Bridged Sulfur-Containing Dianhydrides and Diamines, Journal of Polymer Science Part A: Polymer Chemistry, Wiley, Vol. 46, Issue 4, p. 1510-1520, Jan. 2008.  公式リンク  
  
• Jin-Gang Liu, Yasuhiro NAKAMURA, Claudio A. TERRAZA, Yuji SHIBASAKI, Shinji ANDO, Mitsuru UEDA. Highly Refractive Polyimides Derived from 2,8-Bis(p-aminophenylenesulfanyl) dibenzothiophene and Aromatic Dianhydrides, Macromolecular Chemistry and Physics, Wiley, Vol. 209, Issue 2, p. 195-203, Jan. 2008.  公式リンク  
  
• Ziyi Ge, Teruaki Hayakawa, Shinji Ando, Mitsuru Ueda, Toshiyuki Akiike, Hidetoshi Miyamoto, Toru Kajita, Masa-aki Kakimoto. Novel Bipolar Bathophenanthroline Containing Hosts for Highly Efficient Phosphorescent OLEDs, Organic Letters, American Chemical Society, Vol. 10, Issue 3, pp. 421-424, Jan. 2008.  公式リンク  
  
• warapon sinananwanich, mitsuru ueda. Synthesis of a Hyperbranched Polythioketal with 100% Degree of Branching, J. Polym. Sci. Part-A, Polym. Chem, Vol. 46, pp. 2689–2700, 2008.
• Yu Shoji, Katsuhisa Mizoguchi, Mitsuru Ueda. Synthesis of Aramids by Polycondensation of Aromatic Dicarboxylic Acids with Aromatic Diamines Containing Ether Linkages, Polym. J., Vol. 40, pp. 680-681, 2008.
• K. Matsumoto, E. A. Costner, I. Nishimura, M ueda, C. G. Wilson. High Index Resist for 193 nm Immersion Lithography, Macromolecules, Vol. 41, pp. 5674-5680, 2008.
• kazuhiro nakabayashi, kazuya matsumoto, mitsuru ueda. Synthesis and properties of sulfonated multiblock copoly(ether sulfone)s by a chain extender, J. Polym. Sci. Part-A, Polym. Chem, Vol. 46, pp. 3947-3957, 2008.
• katsuhisa mizoguchi, mitsuru ueda. Negative-type photosensitive poly(phenylene ether) based on poly(2,6-dimethyl-1,4-phenylene ether), a crosslinker, and a photoacid generator, J. Polym. Sci. Part-A, Polym. Chem, Vol. 46, 4949-4958, 2008.
• J. Nunoshige, H. Akahoshi, Y. Shibasaki, M. Ueda. Efficient Oxidative Coupling Polymerization for Synthesis of Thermosetting Poly(phenylene ether) Copolymer with a Low Dielectric Loss J. Polym. Sci. Part-A, Polym. Chem., 46,5278-5282 (2008), J. Polym. Sci. Part-A, Polym. Chem.,, Vol. 46, pp. 5278-5282, 2008.
• yuta saito, katsuhisa mizoguchi, mitsuru ueda. Negative-type Chemically Amplified Photosensitive Novolac, J. Photopolym. Sci.＆Technol, Vol. 21, pp. 161-164, 2008.
• tomohito ogura, katsuhisa mizoguchi, mitsuru ueda. Development of Negative-type Photosensitive Polyimide, Based on Poly(amic acid)s, Photobase Generator, and Thermal Base Generator, J. Photopolym. Sci.＆Technol., Vol. 21, pp. 125-130, 2008.
• Kaoru Ohshimizu, mitsuru ueda. Well-Controlled Synthesis of Block Copolythiophenes, Macromolecules, Vol. 41, pp. 5289-5294, 2008.
• Katsuhisa Mizoguchi, Mitsuru Ueda. Direct Patterning of Poly(ether ether sulfone) Using a Cross-linker and a Photoacid Generator, Polym. J, Vol. 40, pp. 645-650, 2008.
• ken-ichi fukukawa, mitsuru ueda. Recent Progress of Photosensitive Polyimides, Polym. J, Vol. 40, 281-296, 2008.
• yumiko ito, isao washio, mitsuru ueda. Facile Synthesis of a Tadpole-Shaped Dendrimer Based on N-Alkylated Oligo(p-benzamide) Macromolecules, 41, 2778-2784 (2008), Macromolecules, Vol. 41, pp. 2778-2784, 2008.
• Jin-gang LIU, Yuji SHIBASAKI, Shinji ANDO, Mitsuru Ueda. Synthesis and Thermal Properties of Polythioetherimides Derived from 4,4'-[p-Thiobis(phenylenesulfanyl)] Diphthalic Anhydride and Various Aromatic Diamines, High Performance Polymers, SAGE Publications, Volume 20, Issue 2, Page 221-237, Nov. 2007.  公式リンク  
  
• mitsuru ueda. Highly Refractive and Transparent Polyimides Derived from 4,4'-[m-Sulfonylbis(phenylenesulfanyl)]diphthalic Anhydride and, macromolecules, Vol. 40, pp. 7902-7909, Oct. 2007.
• K. Ohshimizu, Y. Shibasaki, M. Ueda. Synthesis of Poly(N-fluoroalkyl benzamide) with Controlled Molecular Weight and Polydispersity, Polym. J., Vol. 39, No. 8, 777-782, Aug. 2007.
• J. Nunoshige, H. Akahoshi, Y. Liao, S. Horiuchi, Y. Shibasaki, M. Ueda. Mechanical and Dielectric Properties of a New Polymer Blend Composed of 1,2-Bis(vinylphenyl)ethane and Thermosetting Poly(phenylene ether) Copolymer obtained from 2,6-dimethylphenol and 2-Allyl-6-methylphenol, Polym. J., Vol. 39, No. 8, pp. 828-833, Aug. 2007.
• K. Matsumoto, S. Ando, M. Ueda. Synthesis of Sulfonated Poly(1,4-diphenoxybenzene) for Proton Exchange Membrane, Polym. J., Vol. 39, No. 8, pp. 878-881, Aug. 2007.
• J-G Liu, Y. Nakamura, Y. Shibasaki, S. Ando, M. Ueda. Synthesis and Characterization of High Refractive Index Polyimides Derived from 4,4’-(p-Phenylenedisulfanyl) -dianiline and Various Aromatic Tetracarboxylic Dianhydrides, Polym. J.,, Vol. 39, No. 6, pp. 543-550, June 2007.
• K. Ohshimizu, Y. Shibasaki, M. Komura, K. Nakajima, M. Ueda. Synthesis and Characterization of Aromatic Block Copolyamides by Condensive Chain Polymerization, Chem. Lett.,, Vol. 36, No. 6, 742-743, June 2007.
• K. Tsuchiya, Y. Shibasaki, M. Ueda. A Negative Type Photosensitive Polymer Based on Poly(naphthylene ether), a Cross-Linker, and a Photoacid Generator with Low Dielectric Constant, Polym. J.,, Vol. 39, No. 5, pp. 442-447, May 2007.
• Y. Shibasaki, F. Toyokawa, S. Ando, M. Ueda. Highly transparent photosensitive polybenzoxazole: poly(o-hydroxy amide) derived from 4,4′-(hexafluoroisopropylidene)bis(o-aminophenol) and o-substituted dicarboxylic acid chlorides, Polym. J.,, Vol. 39, pp. 81-89, Jan. 2007.
• Y. Liao, S. Horiuchi, J. Nunoshige, H. Akahorshi, M. Ueda. Reaction-induced phase decomposition of thermoset/thermoplastic blends investigated by energy filtering transmission electron microscopy, Polymer, Vol. 48, pp. 3749-3758, 2007.
• Shunji KONO, Warapon SINANANWANICH, Yuji SHIBASAKI, Shinji ANDO, Mitsuru UEDA. Synthesis of Hyperbranched Polymer with Degree of Branching of Approximately 100% by Polycondensation of 2-(4-Phenoxyphenoxy)fluorenone, Polymer J., Vol. 39, No. 11, pp. 1150–1156, 2007.
• Jin-gang LIU, Yasuhiro NAKAMURA, Yasuo SUZUKI, Yuji SHIBASAKI, Shinji ANDO, mitsuru ueda. Synthesis and Characterization of Highly Refractive Polyimides from 4,40-Thiobis[(p-phenylenesulfanyl)aniline] and Various Aromatic Tetracarboxylic Dianhydrides, J. Polym. Sci. Part A, Polym Chem., Vol. 45, No. 23, pp. 5606-5617, 2007.
• Jin-gang LIU, Yasuhiro NAKAMURA, Yasuo SUZUKI, Yuji SHIBASAKI, Shinji ANDO, mitsuru ueda. Highly Refractive and Transparent Polyimides Derived from 4,4'-[m-Sulfonylbis(phenylenesulfanyl)]diphthalic Anhydride and Various Sulfur-Containing Aromatic Diamines, Macromolecules, Vol. 40, No. 22, pp. 7902-7909, 2007.
• Jin-gang LIU, Yasuhiro NAKAMURA, Yuji SHIBASAKI, Shinji ANDO, Mitsuru UEDA. High Refractive Index Polyimides Derived from 2,7-Bis(4-aminophenylenesulfanyl)thianthrene and Aromatic Dianhydrides, Macromolecules, Vol. 40, No. 13, pp. 4614-4620, 2007.
• Jin-gang LIU, Yasuhiro NAKAMURA, Yuji SHIBASAKI, Shinji ANDO, Mitsuru UEDA. Synthesis and Characterization of High Refractive Index Polyimides Derived from 4,40-(p-Phenylenedisulfanyl)dianiline and Various Aromatic Tetracarboxylic Dianhydrides, Polym. Journal, Vol. 39, No. 6, pp. 543–550, 2007.
• Kazuya MATSUMOTO, Shinji ANDO, mitsuru ueda. Synthesis of Sulfonated Poly(1,4-diphenoxybenzene) for Proton Exchange Membrane, Polym. Journal, Vol. 39, No. 8, pp. 882-7, 2007.
• Yuji SHIBASAKI, Fumihiro TOYOKAWA, Shinji ANDO, Mitsuru UEDA. Highly Transparent Photosensitive Polybenzoxazole: Poly(o-hydroxy amide) Derived from 4,4′-(Hexafluoroisopropylidene)bis(o-aminophenol) and o-Substituted Dicarboxylic Acid Chlorides, Polym. Journal, Vol. 39, No. 1, pp. 81-89, 2007.
• Y. Shibasaki, Y. Suzuki, M. Ueda. Copper-Catalyzed Regio-Controlled Oxidative Coupling Polymerization of 2,5-Dimethylphenol, Macromolecules, Vol. 40, pp. 5322-5325, 2007.
• L-G, Liu, Y. Nakamura, Y. Shibasaki, S. Ando, M. Ueda. High Refractive Index Polyimides Derived from 2,7-Bis(4-aminophenylenesufanyl)thianthrene and Aromatic Dianhydrides, Macromolecules, Vol. 40, pp. 4614-4620, 2007.
• K. Mizoguchi, Y. Shibasaki, M. Ueda. Development of Negative-type Photosensitive Semi-alicyclic Polyimide using a Photobase Generator, J. Photopolym. Sci.＆Technol.,, Vol. 20, pp. 181-186, 2007.
• K. Mizoguchi, K.Tsuchiya, Y. Shibasaki, M. Ueda. A Negative-type Photosensitive Polymer based on Poly(2,6-dimethyl-1,4-phenylene ether), a Cross-linker, and a Photoacid Generator, J. Photopolym. Sci.＆Technol.,, Vol. 20, pp. 187-188, 2007.
• Jin-gang Liu, Yasuhiro Nakamura, Yuji Shibasaki, Shinji Ando, Mitsuru Ueda. High Refractive Index Polyimides Derived from 2,7-Bis(4-aminophenylenesulfanyl)thianthrene and Aromatic Dianhydrides, Macromolecules,, Vol. 40, pp. 4614 – 4620, 2007.
• T. Ogura, M. Ueda. Facile Synthesis of Semiaromatic Poly(amic acid)s from trans-1,4-Cyclohexanediamine and Aromatic Tetracarboxylic Dianhydrides Macromolecules, 40, 3527-3529 (2007), Macromolecules,, Vol. 40, pp. 3527-3529, 2007.
• I. Washio, Y. Shibasaki, M. Ueda. Facile Synthesis of Amine-Terminated Aromatic Polyamide Dendrimers via a Divergent Method, Org. Lett.,, Vol. 9, pp. 1363-1366, 2007.
• S. Nakanishi, M. Ueda. Synthesis of Novel Glass-Forming Liquid Crystals Containing Acrylic Acid Trimer Core Unit and Mesogenic Moiety, and Their Use in Cholesteric Reflection Films, Polym. J.,, Vol. 39, pp. 252-258, 2007.
• T. Ogura, K. Yamaguchi, Y. Shibasaki, M. Ueda. Photosensitive Poly(benzoxazole) Based on Poly(o-hydroxy amide), Dissolution Inhibitor, Thermoacid Generator, and Photoacid Generator, Polym. J.,, Vol. 39, pp. 245-251, 2007.
• S. Nakanishi, M. Ueda. Facile Synthesis of Novel Monodisperse Liquid-Crystalline Oligomers Based on Michael Adducts from Millipede Cyanoacetates, Chem. Lett.,, Vol. 36, pp. 452-453, 2007.
• T. Ogura, M. Ueda. Photosensitive Polybenzoxazole Based on A Poly(o-hydroxy amide), A Dissolution Inhibitor, and A Photoacid Generator, J. Polym. Sci. Part-A, Polym. Chem.,, Vol. 45, pp. 661-668, 2007.
• J. Nunoshige, H. Akahoshi, Y. Shibasaki, M. Ueda. Low Dielectric Loss Copolymer Obtained from 2,6—Dimethylphenol and 2-Allyl-6-methylphenol via Cu-catalyzed Oxidative Coupling Polymerization, Chem. Lett.,, Vol. 36, pp. 238-239, 2007.
• K. Sakayori, Y. Shibasaki, M. Ueda. A Positive-Type Alkaline-Developbale Photosensitive Polyimide Based on the Poly(amic acid) from 2,2’,6,6’-Biphenyltetracarboxylic Dianhydride and 1,3-Bis(4-aminophenoxy)benzene, and a Diazonaphthoquinone, Polym. J.,, Vol. 38, No. 11, Nov. 2006.
• K. Matsumoto, M. Ueda. Synthesis of Hyperbranched Aromatic Poly(ether sulfone) with Sulfonyl Chloride Terminal Groups, Chem. Lett.,, Vol. 35, No. 10, pp. 1196-1197, Oct. 2006.
• K. Sakayori, Y. Shibasaki, M. Ueda. Synthesis and Properties of a Novel High Sensitive Photo-Radical Initiator Based on Biphenyl-2,2’- Dicarboximide Derivatives, Polym. J., Vol. 38, No. 10, pp. 1074-1080, Oct. 2006.
• K. Tsuchiya, M. Ueda. Synthesis of Poly(naphthylene ether) Containing Tetraphenylmethane Group with a Low Dielectric Constant, Polym. J.,, Vol. 38, No. 9, pp. 956-960, Sept. 2006.
• 福川健一, 上田　充. 感光性ポリイミド・ポリベンズオキサゾール, 高分子論文集, Vol. 63, No. 9, pp. 561-576, Sept. 2006.
• K. Fukukawa, M. Ueda. Recent Development of Photosensitive Polybenzoxazoles, Polym. J.,, Vol. 38, No. 5, pp. 405-418, May 2006.
• Kazuya Matsumoto, Yuji Shibasaki, Shinji Ando, Mitsuru Ueda. Synthesis of novel poly[(1,3-adamantyl)bis(2-naphthol)] with low dielectric constant, Polymer, Vol. 47, pp. 3043-3048, Apr. 2006.
• Y. Watanabe, Y. Shibasaki, S. Ando, M. Ueda. Synthesis and Charcterzation of Novel Low-k Polyimides from Aromatic Dianhydride and Aromatic Diamine Containing Phenylene Ether and Perfluorobiphenyl Units, Polym. J., Vol. 38, No. 1, pp. 79-84, Jan. 2006.
• K. Fukukawa, M. Ueda. Facile Synthesis of Photosensitive Poly(semi-alicyclic benzoxazole) and Subsequent Low-Temperature Cyclization of Poly(o-hydroxy amide), Macromolecules, Vol. 39, pp. 2100-2106, 2006.
• T. Ogura, M. Ueda. Direct Synthesis of Active Diester from Dicarboxylic Acid and p-nitrophenol and Synthesis of Poly(o-hydroxyamide), Macromolecules,, Vol. 39, No. 12, pp. 3980-3981, 2006.
• K. Tsuchiya, Y. Shibasaki, M. Aoyagi, M. Ueda. Synthesis of a Novel Poly(binaphthylene ether) Containing Trifluoromethyl Groups with a Low Dilectric Constant, Macromolecules, Vol. 39, No. 11, pp. 3964-3966, 2006.
• Natsuko Yamazaki, Isao Washio, Yuji Shibasaki, Mitsuru Ueda. Facile Synthesis of Aryl-ether Dendrimer from Unprotected AB2 Building Blocks Using Thionyl Chloride as an Activating Agent, Org. Lett.,, Vol. 8, pp. 2311-2324, 2006.
• K. Sakayori, Y. Shibasaki, M. Ueda. Synthesis and properties of poly(amic acid)s and polyimides based on 2,2 ,6,6 -biphenyltetracarboxylic dianhydride, J. Polym. Sci. Part-A, Polym. Chem.,, Vol. 44, pp. 6385-6393, 2006.
• K. Sakayori, Y. Shibasaki, M. Ueda. Synthesis of a Novel High Sensitive and Thermal Stable Photoradical Initiator: N-[2-(2-acryloxyethoxy)ethyl]biphenyldicarboximide, J. Photopolym. Sci.＆Technol.,, Vol. 19, pp. 283-284, 2006.
• K. Iwashita, T. Hattori, T. Minegishi, S. Ando, F. Toyokawa, M. Ueda. Study of Polybenzoxazole Precursors for Low Temperature Curing, J. Photopolym. Sci.＆Technol.,, Vol. 19, pp. 281-282, 2006.
• T. Ogura, M. Ueda. Three Components Positive Type Photosensitive Poly(benzoxazole) Based on Poly(o-hydroxy amide), a Dissolution Inhibitor, and a Photoacid Generator, J.Photopolym. Sci.＆Technol.,, Vol. 19, pp. 291-292, 2006.
• Y. Shibasaki, M. Nakamura, J. N. Kondo, M.Ueda. Oxidative Coupling Polymerization of Substituted Phenols with a Copper Amine Catalyst Immobilized within Mesoporus Silica, Macromol. Symp., Vol. 245-246, No. 87-92, 2006.
• K. Fukukawa, Y. Shibsaki, M. Ueda. Direct Patterning of Ppoly(amic acid) and Low-Temperature Imidization Using A Photo-base Generator, Polym. Adv. Technol., Vol. 17, pp. 131-136, 2006.
• T. Fukuhara, Y. Shibasaki, S. Ando, S. Kishimura, M. Endo, M. Sasago, M. Ueda. Synthesis of Poly[N-(1-adamantyl)vinylsulfonamide-co- 2-(2-methyl)adamantyl methacrylate] for 193 nm Lithography, Macromolecules, Vol. 38, pp. 3041-3043, 2005.
• mitsuru ueda. , Negative-type Chemically Amplified Photosensitive Semi-alicyclic Polybenzoxazole via Acid-catalyzed Electrophilic Substitution, K. Fukukawa, Y. Shibasaki, M. Ueda, No. 37, 2005.
• I. Washio, Y. Shibasaki, M. Ueda. Facile Synthesis of Polyamide Dendrimers from Unprotected AB2 Building Blocks: Dumbbell-Shaped Dendrimer, Star-Shaped Dendrimer, and Dendrimer with a Carboxylic Acid at the Core, Macromolecule, Vol. 38, pp. 2237-2246, 2005.
• K. Fukukawa, Y. Shibasaki, M. Ueda. , J. Polym. Sci. Part-A, Polym. Chem., Vol. 43, pp. 1210-1215, 2005.
• Masayoshi Nomura, Yuji Shibasaki, Mitsuru Ueda, Kouhei Tugita, Musubu Ichikawa, Yoshio Taniguchi. Synthesis of thermally stable and hole-transporting amorphous molecule having four carbazole moieties, Synth. Met., Vol. 148, pp. 155-160, 2005.
• Yasufumi Watanabe, Ken-ichi Fukukawa, Yuji Shibasaki, Mitsuru Ueda. Three-component negative-type photosensitive polyimide precursor based on poly(amic acid), a crosslinker, and a photoacid generator, J. Polym. Sci. Part-A, Polym. Chem., Vol. 43, pp. 593-599, 2005.
• S. Tanaka, T. Iso, J. Sugiyama, K. Takeuchi, M. Ueda. Preparation of Hyperbranched Copolymers Containing Triphenylamine and Divinylbenzene Units., Synth. Met., Vol. 154, pp. 125-128, 2005.
• K. Sakayori, Y. Shibasaki, M. Ueda. Synthesis of a Novel High Sensitive Photo-Radical Initiator with Good Thermal Stability Based on Naphthalic-1,8-N-Alkylimide Derivatives, J. Polym. Sci. Part-A, Polym. Chem., Vol. 43, pp. 5571-5580, 2005.
• A. Kovalev, K. Takeuchi, A.V. Barzykin, M. Asai, M. Ueda, A. L. Rusanov. Chain Growth Polycondensation as a Polymer Generating Reaction in the Synthesis of Oligo(p-phenyleneethynylene)s with Low Polydispersity Macromol. Chem. Phys, 206, 2112-2121 (2005), Macromol. Chem. Phys., Vol. 206, pp. 2112-2121, 2005.
• K. Fukukawa, T. Ogura, Y. Shibasaki, M. Ueda. Themo-base Generator for Low Temperature Solid-phase Imidation of Poly(amic acid), Chem. Lett., Vol. 34, No. 9, 1372-1373, 2005.
• Y. Shibasaki, T. Araki, R. Nagahata, M. Ueda. Control of Molecular Weight Dstribution in Polycondensation Polymers 2. Poly(ether ketone) Synthesis, Eur. Polym. J., Vol. 14, No. 2428-2433, 2005.
• M. Nomura, Y. Shibasaki, M. Ueda, K. Tugita, M. Ichikawa, Y. Taniguchi. New amorphous electron-transporting materials based on Tris-benzimidazoles for all wet-process OLED devices, Synth. Metal, Vol. 151, pp. 261-268, 2005.
• T. Toyokawa, Y. Shibasaki, M. Ueda. A Novel Low Temperature Curable Photosensitive Polybenzoxazole, Polym. J., Vol. 37, No. 7, pp. 517-521, 2005.
• T. Ogura, K.Fukukawa, Y. Shibasaki, M. Ueda. Synthesis of Transparent Poly(o-hydroxy amide) Derivative in the i-line Region for Photosensitive Polybenzoxazole, J. Photopolym. Sci.＆Technol., Vol. 18, pp. 319-320, 2005.
• Y. Watanabe, Y. Shibasaki, S. Ando, M. Ueda. Synthesis and characterization of polyimides with low dielectric constants from aromatic dianhydrides and aromatic diamine containing phenylene ether unit, Polymer, Vol. 46, pp. 5903-5908, 2005.
• Y. Shibasaki, M. Nakamura, R. Ishimaru, J.N.Kondo, M. Ueda. Oxidative Coupling Polymerization of 2,6-Dimethylphenol with a Copper-Amine Catalyst Immobilized within the Interior Of SBA-15, Chem. Lett., Vol. 34, pp. 662-663, 2005.
• Fumihiro Toyokawa, Ken-Ichi Fukukawa, Yuji Shibasaki, Shinji Ando, Mitsuru Ueda. Synthesis of a highly transparent poly(o-hydroxyamide) in the i-line region and its application to photosensitive polymers., J. Polym. Sci. Part-A, Polym. Chem., Vol. 43, pp. 2527-2535, 2005.
• Y. Watanabe, Y. Shibasaki, S. Ando, M. Ueda. New Negative-type Photosesitive Alkaline-developable Semi-aromatic Polyimides with Low Dielectric Constants Based on Poly(amic acid) from Aromatic Diamine Containing Adamantyl Units and Alicyclic Dianhydrides, A Cross-linker, and A photoacid Generator., Polym. J., Vol. 37, pp. 270-276, 2005.
• R. Ishimaru, Y. Shibasaki, M. Hara, M. Ueda, K. Domen, J. Kondo. Control of Pore Size in Mesoporus Silica by Incremental Surface Modification Using Tetramethyl Orthosilicate, Chem. Lett., Vol. 34, pp. 596-597, 2005.
• K. Matsumoto, Y. Shibasaki, M. Ueda. Synthesis of Photosensitive and Thermosetting Poly(phenylene ether) Containing Butenyl Groups, J. Photopolym. Sci & Technol, Vol. 17, pp. 281-282, 2004.
• K. Fukukawa, Y. Shibasaki, M. Ueda . Efficient Catalysts for Low Temperature Solid-Phase Imidization of Poly(amic acid) , Chem. Lett., , Vol. 38, No. 9, pp. 1156-1157, 2004.
• T. Hirayama, D. Shiono, H. Hada, J. Onodera, M. Ueda. New Photoresist Based on Amorphous Low Molecular Weight Polyphenols T, J. Photopolym. Sci & Technol, Vol. 17, pp. 435-440, 2004.
• K. Tsuchiya, Y. Shibasaki, M. Suzuki, M. Ueda. Three-Component, Negative-Type, Alkaline-Developable, Thermally Stable, and Photosesitive Polymer Based on Poly(2,6-dihydroxy-1,5-naphthalene), a Crosslinker, and a Photoacid Generator , J. Polym. Sci. Part-A, Polym. Chem., , Vol. 42, pp. 2235-2240, 2004.
• M. Nomura, Y. Shibasaki, M. Ueda, K. Tugita, M. Ichikawa, Y. Taniguchi. Synthesis and Properties of Poly(di(1-naphthyl)-4-tolylamine) as a Hole Transport Material, Macromolecules,, Vol. 37, pp. 1204-1210, 2004.
• K. Fukukawa, Y. Shibasaki, M. Ueda. Photosensitive Poly(benzoxazole) via Poly(o-hydroxy azobenzene) II. Enviromentally Benign Process in Ethyl Lactate, Polym. J.,, Vol. 36, pp. 489-494, 2004.
• T. Fukuhara, Y. Shibasaki, S. Ando, M. Ueda . Synthesis of Thermosetting Poly(phenylene ether) containing Allyl Groups , Polymer , Vol. 45, pp. 843-847, 2004.
• Y. Watanabe, Y. Shibasaki, S. Ando, M. Ueda . Synthesis of Semiaromatic Polyimides from Aromatic Diamines Containing Adamantyl Units and Alicyclic Dianhydrides , J. Polym. Sci. Part-A Polym. Chem., , Vol. 41, pp. 144-150, 2004.
• K. Tsuchiya, H. Ishii, Y. Shibasaki, S. Ando, M. Ueda . Synthesis of a Novel Poly(binaphthylene ether) with a Low Dielectric Constant , Macromolecules, Vol. 37, pp. 4794-4797, 2004.
• K. Fukukawa, Y. Shibasaki, M. Ueda . A Photosensitive Semi-Alicyclic Poly(benzoxazole) with High Transparency and Low Dielectric Constant. , Macromolecules, Vol. 37, pp. 8256-8261, 2004.
• F. Toyokawa, K. Fukukawa, Y. Shibasaki, M. Ueda . An Efficient Catalyst for Low Temperature Solid-phase Cyclization of Poly(o-hydroxyamide) , Chem. Lett.,, Vol. 33, No. 10, pp. 1342-1343, 2004.
• K. Morita, Y. Shibasaki, M. Ueda. New Positive-type Photosensitive Polyimide Having Sulfo Groups 2. Polyimides from 2,2’-Oxy(or thio)bis(5-aminobenzenesulfonic acid), 4,4’-Oxydianiline, and 4,4’-Hexafluoropropylidene bis(phthalic anhydride), J. Photopolym. Sci & Technol.,, Vol. 17, pp. 263-268, 2004.
• Yuji Shibasaki, Masahiro Nakamura, Ryuhei Ishimaru, Junko N. Kondo, Kazunari Domen, Mitsuru Ueda. Regiocontrolled Oxidative Coupling Polycondensation of 2,5-Dimethylphenol Induced by Mesoporous Interior, Macromolecules, Vol. 37, pp. 9657-9659, 2004.
• H.Iimori, Y. Shibasaki, S. Andou, M. Ueda. Nonstoichiometric Polycondensation 1. Synthesis of Polythioether from Dibrormomethane and 4,4’-Thiobenzenethiol , Macromol. Symp. , Vol. 199, pp. 23-35, 2003.
• Y. Sasada, Y. Shibasaki, M. Suzuki, M. Ueda. Convenient Synthesis of Poly(2,6-dihydroxy-1,5-naphthylene) by Cu(II)-amin Catalyzed Oxidative Coupling Polymerization , Polymer, Vol. 44, pp. 355-360, 2003.
• K. Tsuchiya, Y. Shibasaki, M. Ueda. Tandem Type Polymerization. Synthesis and Characterization of Ordered Poly(amide-thioether) from 2,6-Dichlorophenyl Methacrylate, 4,4’-Thiobis(benzenethiol), and 4,4’-Oxydianiline, Macromolecules, Vol. 36, pp. 1815-1818, 2003.
• T. Fujigaya, Y. Shibasaki, S. Ando, S. Kishimura, M. Endo, M. Sasago, M. Ueda. New Photoresist Materials for 157 nm Lithography. Poly[Vinylsulfonyl Fluoride-co-4(1,1,1,3,3,3-hexafluoro-2-hydroxypropyl)styrene] Partially Protected with tert-Butoxycarbonyl, Chem.Mater, Vol. 15, pp. 1512-1517, 2003.
• M. Okazaki, I. Washio, Y. Shibasaki, M. Ueda. Rapid Synthesis of Polyamide Dendrimers from Unprotected AB2 Building Blocks. M. Okazaki, I. Washio, Y. Shibasaki, M. Ueda, J. Am. Chem. Soc., Vol. 125, pp. 8120-8121, 2003.
• K. Tuchiya, Y. Shibasaki, M. Suzuki, M. Ueda . A New Negative-Type Photosensitive Polymer Based on Poly(2,6-dihydro-1,5-naphthalene), a Cross-Linker, and a Photoacid Generator K. Tuchiya, Y. Shibasaki, M. Suzuki, M. Ueda , J. Photopolym. Sci & Technol., , Vol. 16, pp. 285-286, 2003.
• S. Ando, M. Ueda . DFT Calculations of Photoabsorption Spectra for Alicyclic and Heterocyclic Compounds in the VUV Region S. Ando, M. Ueda , J. Photopolym. Sci & Technol., , Vol. 16, pp. 537-544, 2003.
• K. Okuyama, J. Sugiyama, R. Nagahata, M. Asai, M. Ueda, K. Takeuchi . Oxidative Carbonylation of Phenol to Diphenyl Carbonate Catalyzed by Pd-Carbene Complexes K. Okuyama, J. Sugiyama, R. Nagahata, M. Asai, M. Ueda, K. Takeuchi , J. Mol. Catal A. Chem., Vol. 203, pp. 21-27, 2003.
• K. Okuyama, J. Sugiyama, R. Nagahata, M. Asai, M. Ueda, K. Takeuchi . An Enviromentally Benign Process for Aromatic Polycarbonate Synthesis by Effcient Oxidative Carbonylation catalyzed by Pd-carbene Complex , Green Chem., , Vol. 5, pp. 563-566, 2003.
• K. Okuyama, J. Sugiyama, R. Nagahata, M. Asai, M. Ueda, K. Takeuchi. Direct Synthesis of Polycarbonate from Carbon Monoxide and Bisphenol A Catalyzed by Pd-Carbene Complex. , Macromolecules,, Vol. 36, pp. 6353-6355, 2003.
• M. Ueda, K. Ebara, Y. Shibasaki . New Convenient Synthetic Route for Photosensitive Poly(benzoxazole) M. Ueda, K. Ebara, Y. Shibasaki , Polymer, Vol. 44, pp. 333-339, 2003.
• K. Ebara, Y. Shibasaki, M. Ueda . Chemically Amplified Photosensitive Poly(benzoxazole) , J. Photopolym. Sci & Technol., , Vol. 16, pp. 237-242, 2003.
• H. Iimori, S. Ando, Y. Shibasaki, S. Kishimura, M. Endo, M. Sasago, M. Ueda. A New Photoresist Materials for 157 nm Lithography-3: Poly[2-hydroxy-3-pianyl vinyl sulfonate-co-4-(1,1,1,3,3,3-hexafluoro-2- Hydroxypropyl)styrene H. Iimori, S. Ando, Y. Shibasaki, S. Kishimura, M. Endo, M. Sasago, M. Ueda, J. Photopolym. Sci & Technol., , Vol. 16, pp. 287-292, 2003.
• K. Morita, K. Ebara, Y. Shibasaki, K. Goto, S. Tami, M. Ueda . New Positive-type Photosensitive Polyimide Having Sulfo Groups , J. Photopolym. Sci & Technol.,, Vol. 16, pp. 601-106, 2003.
• mitsuru ueda. , Polymer,, Vol. 44, pp. 6235-6239, 2003.
• S. Ando, T. Fujigaya, M. Ueda. DFT Calculation of Photoabsorption Spectra in the VUV Region for Design of Photoresist Materials for 157 nm Lithography, J.Photopolym. Sci. Technol., Vol. 15, No. 4, pp. 559-568, 2002.
• K. Y-Gill, J-B. Kim, T. Fujigaya, Y. Shibasaki, M. Ueda. A Positive-working Alkaline Developable Photoresist Based on Partially tert-Protected Calix[4]resorcinarene and A Photoacid Generator, J.Mater. Chem., Vol. 12, pp. 53-57, 2002.
• Y. Sakai, M. Ueda, A. Yahagi, N. Tanno. Synthesis and Properties of Aluminium Phthalocyanine Side-chain Polyimide for Third-order Nonlinear Optics, Polymer, Vol. 43, pp. 3497-3503, 2002.
• Y. Shibasaki, Y. Sasada, M. Ueda. , J.Photopolym. Sci. Technol., Vol. 15, No. 2, pp. 197-200, 2002.
• M. Okaniwa, K. Takeuchi, M. Asai, M. Ueda. One-Pot Synthesis of Dendritic Poly(amide-urea)s vis Curtius Rearrangement. 2. Syntheses and Chracterization of Dendritic Poly(amide-urea)s, Macromolecules, Vol. 35, No. 16, pp. 6232-6238, 2002.
• K. Ebara, Y. Shibasaki, M. Ueda. New Synthetic Route for Photosensitive Poly(benzoxazole), J. Polym. Sci. Part-A Polym. Chem.,, Vol. 40, pp. 3379-3405, 2002.
• S. Ando, M. Ueda. Density functional theory calculations of the local spin densities of 3-substituted thiophenes and the oligomerization mechanism of 3-methylsulfanyl thiophene, Synth. Met. , No. 129, pp. 207-213, 2002.
• M. Nomura, K. Fukukawa, Y. Shibasaki, M. Ueda. New Amorphous Hole-transporting Molecular Materials: 1,1,1-Tris(4-(4-diarylaminobenzoyloxy)phenyl)ethane, Synth. Metal, No. 132, pp. 9-13, 2002.
• Y. Watanabe, Y. Shibasaki, S. Ando, M. Ueda. A New Positive-Type Photosensitive Alkaline-Developable Alicyclic Polyimide Based on Poly(amic acid silylester) as a Polyimide Precursor and Diazonaphtoquinone as a Photosensitive Compound, Chem. Mater., Vol. 14, No. 4, pp. 1762-1766, 2002.
• Y. Watanabe, Y. Sakai, Y. Shibasaki, S. Ando, Y.Oishi, K.Mori, M.Ueda. Synthesis of Wholly Alicyclic Polyimides from N-Silylated Alicyclic Diamines and Alicyclic Dianhydrides, Macromolecules, Vol. 35, No. 6, pp. 2277-2281, 2002.
• S. Shibasaki, T. Araki, M. Okazaki, M. Ueda. Cntrol of Molecular Weight Distribution in Polycondensation Polymers. PolyamideSynthesis., Polym. J.,, Vol. 34, No. 4, pp. 261-266, 2002.
• Y. Sasada, Y. Shibasaki, M. Ueda. New Positive-Type Photosensitive Polymer Based on Poly(2,6-dihydroxy-1,5-naphthylene) and Diazonaphtoquinone, J. Polym. Sci. Part-A:Polym. Chem., Vol. 40, pp. 393-398, 2002.
• M. Okaniwa, K. Takeuchi, M. Asai, M. Ueda. One-Pot Synthesis of Dendritic Poly(amide-urea)s vis Curtius Rearrangement. 1. Monomer Syntheses and Model Reactions for the Dendritic Poly(amide-urea)s Synthesis, Macromolecules, Vol. 35, No. 16, pp. 6224-6231, 2002.
• T. Hikita, A. Mochizuki, K. Takeuchi, M. Asai, M. Ueda. Synthesis and Chracterzation of Ordered Poly(urethane-urea)s from p-Isocyanatobenzyl Isocyanate and 4-Aminophenylethyl Alcohol, Macromolecules, Vol. 35, No. 16, pp. 6202-6209, 2002.
• Y. Shibasaki, M. Ueda. Synthesis of Poly(aryl ether) by Pd-Catalyzed Polycondensation, Chem. Lett.,, No. 8, pp. 794-795, 2002.
• T.Fujigaya, S. Ando, Y. Shibasaki, S. Kishimura, M. Endo, M. Sasago, M. Ueda. A New Photoresist Materials for 157 nm Lithography-2, J. Photopolym. Sci. Technol., Vol. 15, No. 4, pp. 643-654, 2002.
• T. Hikita, A. Mochizuki, K. Takeuchi, M. Asai, M. Ueda. Synthesis and Characterization of Ordered Polyurethanes from Tolylene 2,4-diisocyanate and Ethylene Glycol, High Perform. Polym., Vol. 13, pp. 247-255, 2001.
• M. Okazaki, Y. Shibasaki, M. Ueda. New Positive-Type Photosensitive Polyimide: Hyperbranched Poly(Ether imide) with Diazonaphtoquinone, J.Photopolym.Sci.&Tech., Vol. 14, pp. 45-49, 2001.
• K. Ebara, Y. Shibasaki, M. Ueda. Direct Synthesis of Photosensitive Poly(benzoxazole), J.Photopolym.Sci.&Tech., Vol. 14, pp. 55-60, 2001.
• Y. Sasada, M. Tamamura, Y. Shibasaki, M. Ueda. New Positive-Type Chemically Amplified Photosensitive Poly(phenylene ether):4 Partially tert-Butoxycarbonylated Poly(2-hydroxy-6-methyl- Phenol-co-2,6-dimethylphenol) with a Photoacid Generator, J.Photopolym.Sci.& Tech., Vol. 14, pp. 51-54, 2001.
• M. Okazaki, Y. Shibasaki, M. Ueda. New Negative Photosensitive Polyimide based on Hyperbranched Poly(ether-imide), a Cross-linker, and a Photoacid Generator, Chem. Lett., pp. 762-763, 2001.
• R. Nagahata, J. Sugiyama, M. Goyal, K. Honda, M. Asai, M. Ueda, K. Takeuchi. Thermal Polymerization of Uniform Macrocyclic Ethylene Terephthalate Dimer,, Polymer, Vol. 42, pp. 1275-1279, 2001.
• Y. Sakai, M. Ueda, T. Fukuda, T. Kimura, H. Matsuda. Synthesis and Characterzation of Calix[4]resorcinarene bearing Azobenzene Moieties as Novel Photofunctional Amorphous Molecule, J.Photopolym. Sci. & Tech., Vol. 14, pp. 207-214, 2001.
• M.Ishii, M. Okazaki, Y. Shibasaki, T. Teranishi, M. Ueda. Convenient Synthesis of Aliphatic Polyesters By Distannoxane-Catalyzed Polycondensation, BioMacromolecules, Vol. 2, No. 4, pp. 1267-1270, 2001.
• T. Fujigaya, Y. Shibasaki, M. Ueda. New Positive Working Alkaline Developable Photoresist Based on a Simple Amorphous Molecule, Tris(3,5-di-tert-butoxycarbonyl -oxybenzyl) 1,3,5-benzenetricarboxylate and a Photoacid Generator, J. Photopolym. Sci. &. Tech., Vol. 14, pp. 275-280, 2001.
• A. Mochizuki, M. Ueda. Recent Development in Photosensitive Polyimide (PSPI), J. Photopolymer Sci. & Technol., Vol. 14, No. 5, pp. 677-688, 2001.
• T. Hikita, A. Mochizuki, J. Sugiyama, K.Takeuchi, M. Asai, M. Ueda. Head-to-Tail Regularity of Polyurethanes from p-Isocyanatobenzyl Isocyanate and Ethylene Glycol by a Distannoxane Catalyst, Polym. J., Vol. 33, pp. 547-553, 2001.
• L. Li, K. Yonetake, M. Ueda. Synthesis and Characterization of Constitutional Isomeric Poly(amide-ester)s from Adipoyl Chloride and 4-(2-Aminoethyl)phenol, Macromol. Chem. Phys., Vol. 202, pp. 1531-1538, 2001.
• S. Tanaka, K.Takeuchi, M. Asai, T. Iso, M. Ueda. Preparation of Hyperbranched Copolymers Constituted of Triphenylamine and Phenylene Units, Synthetic Metals, Vol. 119, pp. 139-140, 2001.
• T. Hayakawa, K. Fukukawa, M. Morishima, K. Takeuchi, M. Asai, M. Ueda. Formation of Regular Head-to-Tail Poly[3-(4-butylphenyl)]thiophene by an Oxidative Coupling Polymerization with Vanadium Acetylacetone, J. Polym. Sci. Part-A. Polym. Chem., Vol. 39, pp. 2287-2295, 2001.
• H. Ishii, K. Takeuchi, M. Asai, M. Ueda. Oxidative Carbonylation of Phenol to Diphenyl Carbonate Catalyzed by Pd-pyridyl Complexes Tethered on Polymer Support, Catalysis Comm., pp. 145-150, 2001.
• 石井安寿, 竹内和彦, 浅井道彦, 上田　充. 酸化的カルボニル化反応による芳香族カーボネートの合成:高活性パラジウム錯体触媒系の開発とポリカーボネート一段合成への応用, 有機合成化学協会誌, Vol. 59, pp. 790-799, 2001.
• M. Okazaki, T. Hayakawa, K. Takeuchi, M. Asai, M. Ueda. Chemoselective Polyesterification by Direct Polycondensation, J. Polym. Sci. Part-A, Polym. Chem. Ed., Vol. 39, pp. 78-85, 2001.
• K. Yonetake, T. Nakayama, M. Ueda. New Liquid Crystals based on Calixarenes, J. Mater. Chem., Vol. 11, pp. 761-767, 2001.
• L. Li, K. Yonetake, O. Haba, T. Endo, M. Ueda. Constitutional Isomerism IV. Synthesis and Characterization of Poly(amide-ester)s from Isophthaloyl Chloride and 4-Aminophenethyl Alcoho, Polymer J., Vol. 33, pp. 364-370, 2001.
• H. Ishii, M. Ueda, K. Takeuchi, M. Asai. Direct Synthesis of Polycarbonate from Carbon Monoxide And Bisphenol A Using Efficient Pd Complex Catalyst Systems, Macromol.Rapid Commun., Vol. 22, pp. 376-381, 2001.
• L. Li, O. Haba, T. Endo, M. Ueda. Constitutional Isomerism: Synthesis and Characterization of Ordered Polyamides from Isophthalic Acid and N-Phenylethylenediamine by Direct Polycondensation, High Perform. Polym, Vol. 13, pp. 217-232, 2001.
• A. Nishio, A. Mochizuki, J. Sugiyama, K. Takeuchi, M. Asai, M. Ueda. Synthesis and Characterization of Ordered Polyurethanes from a Pair of Diisocyanate Monomers and Ethylene Glycol, High Perform.Polym., Vol. 13, pp. 233-246, 2001.
• K.Takeshi, K.Okuyama, Y.Ohba, M.Ueda . New Negative-Type Photosensitive Poly(phenylene ether):2.Poly(2-hydroxy-6-methylphenol-co-2,6-dimethylphenol),a Cross-Linker,and a Photoacid Generetor, J.Photopolym.Sci. & Tech., Vol. 13, pp. 345-350, 2000.
• T.Hayakawa, Y.Yamakawa, M.Nomura, M.Okazaki, K.Takeuchi, M.Asai, M.Ueda. One-pot Synthesis of Dendritic Polyamide III. Dendritic Polyamide from 5-[3-(4-Aminophenyl)propionylamino] Isophthalic Acid Hydrochloride and 1,1,1-Tris(4-carboxy-methyloxyphenyl)ethane as a Core Molecules, Polym. J., Vol. 32, pp. 784-787, 2000.
• R. Nagahata, J. Sugiyama, M. Goyal, M. Asai, M. Ueda, K. Takeuchi. Solid Phase Thermal Polymerization of Macrocyclic Bisphenol A Carbonate Tetramer Using Bisphenol A as Initiator, Polym.J., Vol. 32, pp. 854-858, 2000.
• R. Nagahata, J. Sugiyama, M. Goyal, M. Asai, M. Ueda, K. Takeuchi. Solid Phase Thermal Polymerization of Macrocyclic Ethylene Terephthalate Dimer Using Various Transesterification Catalysts, J.Polym.Sci.Part-A Polym.Chem., Vol. 38, pp. 3360-, 2000.
• R. Nagahata, J. Sugiyama, M. Goyal, M. Asai, M. Goto, M. Ueda, K. Takeuchi. X-Ray Analysis of the Bisphenol-A-Type Macrocyclic Carbonate Trimer, Polym.Adv. Technol., Vol. 11, pp. 294-300, 2000.
• T. Hayakawa, J. Wang, M. Xiang, X. Li, M. Ueda, C. K. Ober, J. Genzer, E. Sivaniah, E. J. Kramer, D. A. Fischer. Effect of Changing Molecular End Groups on Surface Properties: Synthesis and Characterization of Poly(stylene-b-semifluorinated isoprene) Block Copolymers with -CF2H End Groups, Macromolecules, Vol. 33, pp. 8012-8019, 2000.
• A.Nishio, A.Mochizuki, J.Sugiyama, K.Takeuchi, M.Asai, M.Ueda. p-イソシアナトベンジルイソシアナトと2種の対称ジオールモノマーからの定序性ポリウレタンの合成と性質, 高分子論文集, Vol. 57, pp. 734-742, 2000.
• T.Fujigaya, M.Ueda. 末端にフェノール成分を有するポリアミドアミンデンドリマーを用いたフォトレジストの合成, 高分子論文集, Vol. 57, pp. 836-841, 2000.
• R.Nagahata, J.Sugiyama, M.Goyal, M.Asai, M.Ueda. Synthesis of Ultra High-molecular-weight Polycarbonate, Polym.Adv.Technol., Vol. 11, pp. 727-732, 2000.
• T.Hayakawa, J.Wang, N.Sundarajan, M.Xiang, X.Li, B.Glusen, G.C.Leung, M.Ueda, C.Ober. Switching Surface Polarity:Synthesis and Chracterization of Fluorinated Block Copolymer with Surface-active tert-Butoxycarbonyl Groups, J.Phys.Org.Chem., Vol. 13, pp. 787-795, 2000.
• L.Li, T.Hayakawa, K.Yonetake, M.Ueda. Synthesis and Chracterization of Ordered Poly(amine-thioether)s from 1,4-Phenylene Diacrylate and 4-Aminobenzenethiol, Macromol.Chem.Phys., Vol. 201, pp. 1667-1672, 2000.
• T.Hayakawa, T.Morishita, M.Okazaki, K.Takeuchi, M.Asai, M.Ueda. Chemoselective Synthesis of Polyamides Containing Hydroxyl and Amino Substituents by Direct Polycondensation, J. Polym. Sci. Part-A, Polym. Chem., Vol. 38, pp. 3875-3882, 2000.
• A.Mochizuki, M.Sakamoto, M.Yoshioka, T.Fukuoka, K.Takeshi, M.Ueda. Novel Photosensitive Polymer Based on Polycarbodiimide and Photoamine Generator, J. Polym. Sci. Part-A, Polym. Chem., Vol. 38, pp. 329-336, 2000.
• M.Goyal, R.Nagahata, J.Sugiyama, M.Asai, M.Ueda, K.Takeuchi. Environmentally Benign Synthesis Route for Aromatic Polycarbonates, J.National Institute of Mat. & Chem., Vol. 8, pp. 1-18, 2000.
• H.Ishii, M.Goyal, M.Ueda, K.Takeuchi, M.Asai. Oxidative Carbonylation of Phenol to Diphenyl Carbonate Catalyzed by Pd Compex with 2,2'Bipyridyl Ligands, Applied Catalysis, Vol. 201, pp. 101-105, 2000.
• Y.Sakai, T.Fukuda, H.Matsuda, M.Ueda. Synthesis and Characterization of Calix[4]resorcinarene Bearing Azobenzene Moieties as Novel Photofunctional Materials, J.Photopolym.Sci. & Tech., Vol. 13, pp. 191-196, 2000.
• T.Fujigaya, M.Ueda. New Photoresist Based on Poly(propyleneimine) Dendrimer, J.Photopolym.Sci. & Tech., Vol. 13, pp. 339-344, 2000.
• Y.Watanabe, Y.Sakai, M.Ueda, Y.Oishi, K.Mori. Synthesis of Wholly Alicyclic Polyimides from N-Silylated Alicyclic Diamines, Chem.Lett., pp. 450-451, 2000.
• T.Hayakawa, Y.Osanai, K.Niizeki, O.Haba, M.Ueda. The Curing Reaction of 3-Aryl Substituted Benzoxazine, High.Perform.Polym., Vol. 12, pp. 237-246, 2000.
• H.Takahashi, T.Hayakawa, M.Ueda. Convenient Synthesis of Poly(butylene succinate) Catalyzed by Distannoxane, Chem.Lett., pp. 684-685, 2000.
• H.Ishii, M.Goyal, M.Ueda, K.Takeuchi, M.Asai. Oxidative Carbonylation of Phenol to Diphenyl Carbonate Catalyzed by Pd Compex with Diimine Ligands, Catalysis Lett., Vol. 65, pp. 57-60, 2000.
• A.Nishio, A.Mochizuki, J.Sugiyama, K.Takeuchi, M.Asai, K.Yonetake, M.Ueda. Synthesis and Characterization of Ordered Polyurethanes from Nonsymmetric Diisocyanate and Ethylene Glycol, J.Polym.Sci. Part-A Polym.Chem., Vol. 38, pp. 2106-2114, 2000.
• Kai Fu, T.Nematsu, M.Sone, T.Ito, T.Hayakawa, M.Ueda, J.Watanabe. Aromatic polyesters with flexible side chains. 8. Studies on long periodical structure observed in layered crystalline phase, Macromolecules, ACS, Vol. 33, No. 22, pp. 8367-8370, 2000.

著書

• 安藤 慎治, 上田 充, 高田 十志和. 高屈折率ポリマーと屈折率制御, 高分子と光が織りなす新機能・新物性, CSJカレントレビュー・日本化学会編, 化学同人, pp. 51-60, Nov. 2011.  公式リンク  
• Tomoya Higashihara, Mitsuru Ueda. Product Class 15: Polyamide, Science of Synthesis, Knowledge Updates 2010/4, pp. 301-323, Apr. 2011.
• Tomoya Higashihara, Mitsuru Ueda. Block Copolymers Containing Rod Segments, Complex Macromolecular Architecture, pp. 395-429, Apr. 2011.
• Shinji ANDO, Atsuhisa SUZUKI, Yasuhiro NAKAMURA, Jin-gang LIU, Mitsuru UEDA. Organic/Inorganic-Polyimide Nano-Hybrids with High / Low Refractive Indices for Optical Applications, Proc. STEPI, STEPI conference/Univ. Montpellier, Vol. 8, Oct. 2008.
• Shinji ANDO, Atsuhisa SUZUKI, Yasuhiro NAKAMURA, Jin-gang LIU, Mitsuru UEDA. Organic/Inorganic-Polyimide Nano-Hybrids with High / Low Refractive Indices for Optical Applications, Proc. STEPI, STEPI conference/Univ. Montpellier, Vol. 8, June 2008.
• 安藤 慎治, 劉 金剛, 上田 充. 光学ポリマーの物性予測と高屈折率ポリイミド光学材料の開発, 成形加工, プラスチック成形加工学会, Vol. 20, p. 170-176, Mar. 2008.
• 上田充. 基礎高分子科学, 東京化学同人, pp. 283-376, July 2006.
• 上田充. UV/EB硬化技術の最新動向, シーエムーシ, pp. 115-122, Mar. 2006.
• 多数, 上田充. 実験化学講座　高分子化学, 丸善, pp. 123-133, Mar. 2005.
• ９名, 上田充. 実用高分子化学, 丸善, pp. 45-64, Feb. 2005.
• 角南英夫, 井上正巳, 上田充, 奥崎秀典, 伊藤信吾, 中塚康雄. マイクロエレクトロニクスにおける高分子材料, エヌ•テイー•エス, pp. 77-123, July 2004.
• 多数, 上田充. 精密高分子技術, シーエムーシ, pp. 375-379, 411-420, 431-441, May 2004.
• 多数　９名, 上田充. 高分子工業化学　 2003, 朝倉書店, pp. 1-27, Dec. 2003.
• mitsuru ueda. 先端化学シリーズ　I　　　　　　　　　　　　　 , 2003.
• 多数　３２名, 上田充. 最新ポリイミド, エヌ•テイー•エス, pp. 55-75, Jan. 2002.
• T. Fujigaya, Y. Shibasaki, M. Ueda. Chemically Amplifiled Positive Resist based on Silsesquioxane for 157 nm Lithography, Forefront of Lithographic Materials Research, Forefront of Lithographic Materials Research, pp. 219-228, 2001.
• Y. Sasada, Y. Shibasaki, M. Ueda. New Positive-Type Chemically Amplified Photosensitive Poly(phenylene ether): 5 Poly[tert-butyl- a-( 2-hydroxy-3-methylphenoxy)acetate-co-2,6-dimethylphenol] with Photoacid Generator,, Forefront of Lithographic Materials Research, Forefront of Lithographic Materials Research, pp. 405-410, 2001.

国際会議発表 (査読有り)

• Motohiro Aiba, Takahiro Tokuyama, Hiroki Tomioka, Hidetoshi Matsumoto, Tomoya Higashihara, Mitsuru Ueda. Enhancement of salt rejection and water flux by crosslinking-induced microstructure change of N-substituted polybenzimidazole membranes, 2014 Materials Research Society Fall Meeting, MRS Proceedings, Materials Research Society, Vol. 1745, pp. mrsf14-1745-ff12-05.r1/1-6, Oct. 2015.  公式リンク  
  
• Yusuke INOUE, Yoshihito Ishida, Tomoya HIGASHIHARA, Atsushi KAMEYAMA, Shinji ANDO, Mitsuru UEDA. Alkaline-developable and Positive-type Photosensitive Polyimide based on Fluorinated Poly(amic acid) from Diamine with High Hydrophobicity and Fluorinated Diazonaphtoquinone, Photopolym. Sci. Technol. (Chiba, Japan), Photopolym. Sci. Technol., Vol. 27, No. 2, pp. 211-217, July 2014.
• Yusuke INOUE, Yoshihito ISHIDA, Tomoya HIGASHIHARA, Atsushi KAMEYAMA, Shinji ANDO, Mitsuru UEDA. Alkaline-developable Positive-type Photosensitive Polyimide based on Poly(amic acid) containing card structure and Fluorinated Diazonaphthoquinone, Pacific Polymer Conf. (PPC-2013, Kaohsiung, Taiwan), Pacific Polymer Conf. (PPC-2013), Nov. 2013.
• Yuta Saito, Tomoya Higashihara, Mitsuru Ueda. Direct Patterning of Regioregular Poly(3-hexylthiophene), European Polymer Congress 2011, Aug. 2012.
• Yi-Cang Lai, Kaoru Ohshimizu, Wen-Ya Lee, Tomoya Higashihara, Mitsuru Ueda, Wen-Chang Chen. Electrically Bistable Memory Devices Based on Poly(3-hexylthiophene)-block-poly(3-, European Polymer Congress 2011, Aug. 2012.
• mitsuru ueda. Synthesis of a Hyperbranched Polymer with Controlled Degree of Branching, The 12th Pacific Polymer Conference, Nov. 2011.
• mitsuru ueda. Polymer Electrolyte Membrane Based on Polyacrylate with Phosphonic Acid via Long Alkyl Side Chain, Japan-Korea Joint Symposium, Oct. 2011.
• Tetsunari Mizobe, Ayumi Takahashi, Kaoru Ohshimizu, Tomoya Higashihara, Mitsuru Ueda. Synthesis and characterization of block copolythiophenes with pendant pyridinyl groups, 2011 Taiwan-Japan Bilateral Polymer Symposium, Sept. 2011.
• mitsuru ueda. Development of Negative-type Chemically Amplified Thermally-stable PhotosensitivePolymer, Baekeland 2011, Sept. 2011.
• mitsuru ueda. Synthesis of a Hyperbranched Polymer with Controlled Degree of Branching, Taiwan-Japan Bilateral Polymer Symposium, Sept. 2011.
• mitsuru ueda. Enhancement of P3HT/PCBM Photovoltaic Efficiency and Stability Based on Surfactant Approach, IUMRS International Conference in Asia, Sept. 2011.
• Namiko Fukuzaki, Yoko Tamura, Kazuhiro Nakabayashi, Tomoya Higashihara, Mitsuru Ueda. Synthesis of phosphonated polymers with long side chains which shows high proton, 2011 Taiwan-Japan Bilateral Polymer Symposium, Sept. 2011.
• Tatsuaki Kasai, Tomoya Higashihara, Mitsuru Ueda. Development of molecular resists based on Calix[4]resorcinarene derivatives, 2011 Taiwan-Japan Bilateral Polymer Symposium, Sept. 2011.
• mitsuru ueda. Polymer Electrolyte Membranes Based on Poly(phenylene ether)s with Pendant Perfluoroalkyl Sulfonic Acids, European Polymer Congress, July 2011.
• Yumiko Ito, Ching-Yi Chen, Tomoya Higashihara, Wen-Chang Chen, Mitsuru Ueda. Synthesis of Water-Soluble Polyamide Dendrimers for DNA Sensors, European Polymer Congress 2011, June 2011.
• Tadanori Kurosawa, Wen-Ya Lee, Shiang-Tai Lin, Tomoya Higashihara, Wen-Chang Chen, Mitsuru Ueda. Synthesis of Novel Oligoimides and Their Applications to Organic Memory, European Polymer Congress 2011, June 2011.
• Ayumi Takahashi, Kaoru Ohshimizu, Tomoya Higashihara, Mitsuru Ueda. Synthesis and Characterization of Novel Graphited Polythiophene, European Polymer Congress 2011, June 2011.
• Yasuo Suzuki, Kimiya Murakami, Tomoya Higashihara, Shinji Ando, Mitsuru Ueda. Synthesis and Characterization of Thianthrene-based Poly(phenylene sulfide)s, European Polymer Congress 2011, June 2011.
• Tomoya Higashihara, Mitsuru Ueda. Controlled Synthesis of Poly(3-hexylthiophene) Using Zincate Complex, European Polymer Congress 2011, June 2011.
• Y.Shoji, R.Ishige, T.Higashihara, J.Watanabe, M.Ueda. Thermotropic Liquid Crystalline Polyimides with Siloxane Linkages:Synthesis, Characterization, and Liquid Crystalline Behavior., Polycondensation 2010, Sept. 2010.
• Y.Segawa, W.Sinanawanich, T. Higashihara, M.Ueda. Synthesis of a hyperbranched Poly(phenylene ether) with Controlled Degree of Branching., Polycondensation 2010, Sept. 2010.
• T.Kurosawa, C-C Chueh, C-L. Liu, T. Higashihara, M. Ueda, W-C. Chen.. High Performance Volatile Polymer Memory Devices Based on Novel Triphenylamine-based Polyimides., Polycondensation 2010, Sept. 2010.
• N. Fukuzaki, S.Nakazawa, S.Murata, T. Higashihara, M. Ueda.. Synthesis of Phosphonated Polymer for Proton exchange Membranes., Polycondensation 2010,, Sept. 2010.
• T. Nakagawa, K.Nakabayashi, T. Higashihara, M.Ueda. Synthesis and Properties of Sulfonated poly(ether sulfone)s with binaphthyl units by facile nucleophilic aromatic polymerization., Polycondensation 2010, Sept. 2010.
• Tomoya Higashihara, Jung-Hsun Tsai, Yi-Cang Lai, Chih-Jung Lin, Wen-Chang Chen, Mitsuru Ueda.. Synthesis of Well-Defined Coil-Rod-Coil Triblock Copolymers Containing, Synthesis of Well-Defined Coil-Rod-Coil Triblock Copolymers Containing, Sept. 2010.
• Yu Nakagawa, Tomohito Ogura, Tomoya Higashihara, Mitsuru Ueda. Optically transparent sulfur-containing semi-alicyclic polyimide with high refractive index, 240th ACS National Meeting, 240th ACS National Meeting, Preprint, Aug. 2010.
• Kazuhiro Nakabayashi, Tomoya Higashihara, Mitsuru Ueda. Polymer electrolyte membranes based on cross-linked highly sulfonated multiblock copoly(ether sulfone)s, 240th ACS National Meeting, 240th ACS National Meeting, Aug. 2010.
• Ayumi Takahashi, Tomoya Higashihara, Mitsuru Ueda. Preparation of nanaporous poly(3-hexylthiophene) films via ion-bonded block copolymer template, 239th ACS National Meeting, 239th ACS National Meeting, Preprint, Mar. 2010.
• Nam-Ho You, Tomoya Higashihara, Shinji Ando, Mitsuru Ueda. Synthesis of highly refractive and transparent polyimides derived from 4,4'-thiobis[2",6"-dimethyl-4"-(p-phenylenesulfanyl)aniline, 239th ACS National Meeting, 239th ACS National Meeting, Preprint, Mar. 2010.
• Taegon Kang, Anzar Khan, Kaoru Ohshimizu, Jasmine N. Hunt, Kulandaivelu Sivanandan, Roey J. Amir, Mitsuru Ueda, Craig J Hawker. Facile access to internally functionalized dendrimers by using efficient and orthogonal click reactions, 239th ACS National Meeting, 239th ACS National Meeting, preprint, Mar. 2010.
• T. Higashihara, M. Ueda. Novel Block Copolymers Containing Poly(4-vinyltriphenylamine) and Poly(3-hexylthiophene)., Advanced Polymeric Materials and Technology Symposium, Jan. 2010.
• Y.Shoji, R.Ishige, T.Higashihara, J.Watanabe, M.Ueda. Thermotropic Liquid Crystalline Polyimides with Siloxane Linkages:Synthesis, Characterization, and Liquid Crystalline Behavior., Advanced Polymeric Materials and Technology Symposium, Jan. 2010.
• Y.Segawa, W.Sinanawanich, T. Higashihara, M.Ueda. Synthesis of a hyperbranched Poly(phenylene ether) with Controlled Degree of Branching., Advanced Polymeric Materials and Technology Symposium, Jan. 2010.
• mitsuru ueda. Development of Highly Refractive Polymers for CMOS Image Sensor and Optical Materials, Argentine-Chile Polymer Symposium, Oct. 2009.
• Taijiro Nakagawa, Kazuya Matsumoto, Tomoya Higashihara, Mitsuru Ueda. Sulfonated poly(ether sulfone)s with binaphthyl units as proton exchange membranes for fuel cell application, 238th ACS National Meeting, Aug. 2009.
• Tadanori Kurosawa, Nam-Ho You, Tomoya Higashihara, Mitsuru Ueda. Synthesis and characterization of new polyimides derived from 4,4'-bis(p-aminophenoxy)triphenylamine and N,N-bis[4-(4'-aminophenoxy)phenyl]aminopyrene, 238th ACS National Meeting, Aug. 2009.
• Namiko Fukuzaki, Nam-Ho You, Yasuhiro Nakamura, Tomoya Higashihara, Shinji Ando, Mitsuru Ueda. Synthesis of high refractive index polyimide containing selenophene unit, 238th ACS National Meeting, Aug. 2009.
• Tomohito Ogura, Tomoya Higashihara, Mitsuru Ueda. Synthesis of dissolution inhibitor for photosensitive polybenzoxazole, 238th ACS National Meeting, Aug. 2009.
• Nam-Ho You, Yasuhiro Nakamura, ; Tomoya ;Higashihara, Shinji; Ando, Mitsuru. Ueda. Synthesis and properties of high refractive index polyimides derived from 3,6-bis(4-aminophenylenesulfanyl)pyridazine, ACS meeting, Polymer Preprints (American Chemical Society, Division of Polymer Chemistry), Vol. 50, No. 1, July 2009.
• Tomoya Higashihara, ; Mitsuru. Ueda. Synthesis of a novel coil-rod-coil ABA triblock copolymer comprised of regioregular poly(3-hexylthiophene) and poly(methyl methacrylate) segments, ACS meeting, PMSE Preprints, Vol. 100, pp. 487-488, July 2009.
• mitsuru ueda. Synthesis of a hyperbranched polymers with controlled degree of branching, Tiwan-Japan Bilateral Polymer Symposium, pp. 12, July 2009.
• mitsuru ueda. Synthesis of a hyperbranched polymers with controlled degree of branching, European Polymer Congress, July 2009.
• mitsuru ueda. High refractive index and negative pattern formation from poly(amic acid)-TiO2 nanocomposite film, International Symposium on Polymer Chemistry, June 2009.
• Warapon Sinananwanich, Mitsuru Ueda. Synthesis of a Hyperbranched Polymer with a Degree of Branching of 100% by Polycondensation, 2008 Japan-USA Seminar on Polymer Synthesis, Dec. 2008.
• Warapon Sinananwanich, Mitsuru Ueda. Synthesis of a Hyperbranched Polythioketal with 100% Degree of Branching, 2nd Japan-Korea Joint Seminar 2008 and International Symposium, Nov. 2008.
• Tomoya Higashihara, Mitsuru Ueda. Synthesis of Polystyrene-b-Poly(3-hexylthiophene)-b-Polystyrene and Its Self-Assembly to Nanostructures, Asia Polymer Symposium (APOSYM) 2008, Oct. 2008.
• mitsuru ueda. Thermoplastics with High Refractive Index and High Abbe’s Number, 5th International Symposium on High-Tech Polymer Materials, Oct. 2008.
• Tomoya Higashihara, Mitsuru Ueda. Synthesis of Coil-Rod-Coil Triblock Copolymer Comprised of Polystyrene and Regioregular Poly(3-hexylthiophene) Segments, Polycondensation 2008, Sept. 2008.
• Warapon Sinanawanichi, Tomoya Higashihara, Mitsuru Ueda. Synthesis of a Hyperbarnched Polymer with 100% Degree of Branching Based on Piperidone, Polycondensation 2008, Sept. 2008.
• Warapon Sinananwanich, Mitsuru Ueda. Synthesis of a hyperbranched polythioketal with 100% degree of branching, 236th ACS National Meeting, Aug. 2008.
• Keita Endo, Yumiko Ito, Mitsuru Ueda. Facile synthesis of aromatic polyamide dendrimers with trifluoroacetamide groups at their periphery via a convergent method, 236th ACS National Meeting, Aug. 2008.
• Katsuhisa Mizoguchi, Mitsuru Ueda. A negative-type photosensitive poly(benzoxazole) based on poly(o-hydroxy amide), an ester-type cross-linker, and a photobase generator, 236th ACS National Meeting, Aug. 2008.
• Yu Shoji, Katsuhisa Mizoguchi, Mitsuru Ueda. Synthesis of aramides by polycondensation of aromatic dicarboxylic acids with aromatic diamines containing ether linkages, 236th ACS National Meeting, Aug. 2008.
• Segawa Yukari, Sinananwanich Warapon, Ueda Mitsuru.. Novel functionalization of poly(phenylene ether) at each monomer unit via poly(addition-condensation) mechanism., 236th ACS National Meeting, Aug. 2008.
• Warapon Sinananwanich, Mitsuru Ueda. Synthesis of hyperbranch polymer with 100 % degree of branching, IUPAC MACRO2008, July 2008.
• Yuta Saito, Katsuhisa Mizoguchi, Tomoya Higashihara, Mitsuru Ueda. Negative-type Chemically Amplified Photosensitive Novolac, Macro 2008, June 2008.
• Kaoru Ohshimizu, Mitsuru Ueda. Synthesis of Well-controlled Block Copolythiophenes, IUPAC MACRO2008, June 2008.
• mitsuru ueda. Development of Photosensitive Polyimides and Polybenzoxazoles, Rad.Tech. North America 2008, May 2008.
• mitsuru ueda. Characterization and Lithographic Application of Calix[4]resorcinarene Derivatives, Chem. Mater. 20, 341-356, Vol. 20, pp. 341-356, Jan. 2008.
• mitsuru ueda. Synthesis of Hyperbranched Polymer with Degree of Approximately 100% by Polycondensation of 2-(4-phenoxyphenoxy)fluorene, Polym. J.,, Vol. 39, No. 11, pp. 1150-1156, Nov. 2007.
• mitsuru ueda. Regio-controlled Oxidative Polymerization of 2,5-Dimethylphenol by Using CuCl-TMEDA Complex, Chem. Lett.,, Vol. 36, No. 10, pp. 1234--1235, Nov. 2007.
• mitsuru ueda. Synthesis and Properties of Sulfonated Poly(2,5-diphenoxy-p-phenylene), Polymer, Vol. 48, pp. 5878-5883, Oct. 2007.

国内会議発表 (査読有り)

• 黒澤 忠法, 東原 知哉, 上田 充. ジベンゾチオフェン骨格を有するポリイミドの合成と高分子メモリへの応用, 第60回高分子年次大会, Polym. Prepr. Jpn, Vol. 60, No. 1, p. 445, Aug. 2012.
• 東原知哉, Yi-Cang Lai, Wen-Chang Chen, 上田充. ポリ(3-ヘキシルチオフェン)鎖を有する新規ブロック共重合体の合成と有機薄, 第60回高分子討論会, Polym. Prepr. Jpn., Vol. 60, No. 2, p. 4226, Sept. 2011.
• 馬場 奨, 東原 知哉, 上田 充. カルド構造を有する全芳香族ポリアミドの合成, 第60回高分子討論会, Polym. Prepr. Jpn., Vol. 60, No. 2, p. 2318, Sept. 2011.
• 大清水 薫, 高橋 歩, Yecheol Ryo, 東原 知哉, Moonhor Ree, 上田 充. 3位に芳香環を有するポリチオフェンの合成と構造解析, 第60回高分子年次大会, Polym. Prepr. Jpn., Vol. 60, No. 1, p. 444, May 2011.
• 張 岑尭, 越智 隆志, 佃 明光, 荘司 優, 東原 知哉, 上田 充. 固相重合法による全芳香族ポリアミドの直接重合及び溶融曳糸性の検討, Polym. Prepr. Jpn., Vol. 60, No. 1, p. 443, May 2011.
• 伊藤 由明子, Chen Ching-Yi, 東原 知哉, Chen Wen-Chang, 上田 充. DNAセンサー用デンドリマーの合成, 第60回高分子年次大会, Polym. Prepr. Jpn., Vol. 60, No. 1, p. 230, May 2011.
• 高橋 歩, 大清水 薫, 東原 知哉, 上田 充. チオフェン環含有グラフェンナノシートの精密合成, 第60回高分子年次大会, Polym. Prepr. Jpn., Vol. 60, No. 1, p. 181, May 2011.
• 中川 優, 鈴木 康夫, 東原 知哉, 上田 充. トリアジン環を有するポリフェニレンスルフィドの合成, 第60回高分子年次大会, Polym. Prepr. Jpn., Vol. 60, No. 1, p. 1693, May 2011.
• 鈴木 康夫, 村上 公也, 安藤 慎治, 東原 知哉, 上田 充. チアンスレンを含む超高屈折率ポリフェニレンスルフィドの合成と評価, 第60回高分子年次大会, 高分子学会予稿集, Vol. 60, No. 1, p. 1655, May 2011.
• 葛西 辰昌, 東原 知哉, 上田 充. 架橋成分を有するカリックスアレーン誘導体の合成とレジスト性能評価, 第60回高分子年次大会, Polym. Prepr. Jpn. 2011, 60(1), 1654., Vol. 60, No. 1, p. 1654, May 2011.
• 福崎 菜美子, 中林 千浩, 東原 知哉, 上田 充. 側鎖にホスホン酸を有する新規プロトン伝導性高分子電解質膜の開発, 第60回高分子年次大会, Polym. Prepr. Jpn., Vol. 60, No. 1, p. 1582, May 2011.
• 中川 泰次郎, 中林 千浩, 東原 知哉, 上田 充. ビナフチル基を有するポリエーテルスルホンへのパーフルオロアルキルスルホ, 第60回高分子年次大会, Polym. Prepr. Jpn., Vol. 60, No. 1, p. 1581, May 2011.
• 齋藤 悠太, 酒井 良正, 東原 知哉, 上田 充. 感光性を有する高誘電率ゲート絶縁材料, 第60回高分子年次大会, Polym. Prepr. Jpn., Vol. 60, No. 1, p. 1511, May 2011.
• 東原 知哉, 上田 充. 亜鉛アート錯体を用いたポリ(3-ヘキシルチオフェン)の一次構造制御, 60回高分子年次大会, Polym. Prepr. Jpn, Vol. 60, No. 1, p. 446, May 2011.
• 田村 蓉子, 伊藤 由明子, 東原 知哉, 上田 充. AB2モノマーを用いた分岐度0%直鎖状ポリマーの合成, 第60回高分子年次大会, May 2011.
• 中川 泰次郎, 東原 知哉, 上田 充. ビナフチル基を有するスルホン化ポリエーテルスルホンの合成とプロトン交換膜への応用, 第59回高分子年次大会, Vol. 59, No. 1, p. 1357, May 2010.
• 中林 千浩, 東原 知哉, 上田 充. 高IECスルホン化マルチブロックコポリ(エーテルスルホン)の電解質膜材料への応用, 第59回高分子年次大会, Vol. 59, No. 1, p. 1353, May 2010.
• 福崎 菜美子, 中澤 哲, 村田 成亮, 東原 知哉, 上田 充. ホスホン酸を有する新規プロトン伝導性電解質膜の開発, 第59回高分子年次大会, Vol. 59, No. 1, p. 1345, May 2010.
• 張 岑尭, 荘司 優, 東原 知哉, 上田 充. 固相重合法によるポリ（メタフェニレンイソフタルアミド）の直接合成, 第59回高分子年次大会, Vol. 59, No. 1, p. 432, May 2010.
• 瀬川 縁, 東原 知哉, 上田 充. ハイパーブランチポリマーの分岐度制御, 第59回高分子年次大会, Vol. 59, No. 1, p. 218, May 2010.
• 松本 和也, 東原 知哉, 上田 充. 局所的かつ高密度にスルホン化したポリ(アリレン エーテル)の合成と性質, 第57回高分子討論会, Sept. 2008.
• 鈴木 康夫, 東原 知哉, 上田 充. 高屈折率・高アッベ数を有するポリチオエーテルスルホンの合成, 第57回高分子討論会, Sept. 2008.
• 上田充. 低分子アモルファスレジスト, 第57回高分子討論会, Sept. 2008.
• 溝口 勝久, 上田 充. 新規画像形成機構によるネガ型感光性ポリベンゾオキサゾールの開発, 第57回高分子年次大会, May 2008.
• 奥津 理恵, 鈴木 康夫, 上田 充. 高屈折率・高アッベ数材料を有する熱可塑性樹脂の開発, 第57回高分子年次大会, May 2008.
• 齋藤 悠太, 溝口 勝久, 上田 充. 高感度なネガ型ノボラック樹脂系レジストの開発, 第57回高分子年次大会, May 2008.
• 大清水 薫, 上田 充. ポリチオフェンブロック共重合体の合成と相分離挙動, 第57回高分子年次大会, May 2008.
• 瀬川 縁, シンアナンワーニ ワラポン, 上田 充. p-フェノキシトリフルオロアセトフェノン類の付加縮合重合によるポリ（フェニレンエーテル）の合成, 第57回高分子年次大会, May 2008.
• 荘司 優, 溝口 勝久, 上田 充. 芳香族ジカルボン酸と芳香族ジアミンの重縮合によるアラミドの合成, 第57回高分子年次大会, May 2008.
• 中林 千浩, 松本 和也, 上田 充. 鎖延長剤を用いたスルホン酸基含有マルチブロックコポリ(エーテル スルホン)の合成とその特性評価, 第57回高分子年次大会, May 2008.
• 遠藤 啓太, 伊藤 由明子, 上田 充. コンバージェント法による芳香族ポリアミドデンドリマーの簡便な合成, 第57回高分子年次大会, May 2008.
• 伊藤 由明子, 遠藤 啓太, 東原 知哉, 池田 裕, 野島 修一, 上田 充. 芳香族アミドデンドロンの自己組織化, 第57回高分子年次大会, May 2008.
• ziyi ge, SHINJI ANDO, mitsuru ueda, Shou Ming Wu, Teruaki Hayakawa, MASA-AKI KAKIMOTO, 秋池 利之, 宮本 秀俊, 梶田 徹. Novel Bipolar Bathophenanthroline Containing Hosts for Highly Efficient Phosphorescent OLEDs, 第57回高分子年次大会, May 2008.
• 葛 子義, 安藤 慎治, 上田 充, 早川 晃鏡, 柿本 雅明, 秋池 利之, 宮本 秀俊, 梶田 徹. Synthesis and Properties of 3,8-Bis(4-(9H-carbazol-9-yl)phenyl)-1,10-phenanthroline for Phosphorescent OLEDs, 第57回高分子年次大会, May 2008.
• 松本 和也, 上田 充. スターブロックコポリマーの合成と高分子電解質膜への応用, 第57回高分子年次大会, May 2008.

国際会議発表 (査読なし・不明)

• Motohiro Aiba, Hidetoshi Matsumoto, Tomoya Higashihara, Mitsuru Ueda. Effect of N-methyl amide linkage on hydrogen bonding behavior and membrane properties of partially N-methylated random aromatic copolyamides, The Third International Education Forum on Environment and Energy Science, Abstracts of the Third International Education Forum on Environment and Energy Science (USB), Academy for Co-creative Education of Environment and Energy Science, Tokyo Institute of Technology, pp. B134, Dec. 2014.
• Motohiro Aiba, Takahiro Tokuyama, Hiroki Tomioka, Hidetoshi Matsumoto, Tomoya Higashihara, Mitsuru Ueda. Polyamide-based freestanding ultrathin membranes for forward osmosis, The Second International Education Forum on Environment and Energy Science, Abstracts of the Second International Education Forum on Environment and Energy Science (USB), Academy for Co-creative Education of Environment and Energy Science, Tokyo Institute of Technology, D-213, Dec. 2013.
• Cenyao Zhang, Yu Shoji, Tomoya Higashihara, Mitsuru Ueda. Synthesis of poly(m-phenyleneisophthalamide) by direct polycondensation of isophthalic acid with m-phenylenediamine, 240th ACS National Meeting, Aug. 2010.
• K. Shimakura, Y. Shibasaki, M. Ueda. A positive-working alkaline developable photoresist based on partially acetal-protected calix[4]methylresorcinarene and a photoacid generator, Pasifi-Chem.,, ACS, Vol. FD, Dec. 2005.
• K. Matsumoto, M. Ueda. Synthesis of Poly(1,4-diphenoxybenzene), Pasifi-Chem 2005, ACS, Vol. FD, Dec. 2005.
• N.Nakamura, Y. Shibasaki, M. Ueda. Oxidative coupling polymerization of o-cresol with copper-amine catalysts immobilized within the interior of SBA-15, Psifi-Chem.,, ACS, Vol. FD, Dec. 2005.
• mitsuru ueda. A positive-working alkaline developable photoresist based on partially acetal-protected calix[4]methylresorcinarene and a photoacid generator, Pasifi-Chem.,, ACS, Vol. FD, Dec. 2005.
• T.Ogura, K. Fukukawa, M. Ueda. Thermo-Base Generator for Low Temperature Solid-Phase Imidization of Poly(amic acid), Pasifi-Chem.,, ACS, Vol. FD, Dec. 2005.
• Mitsuru Ueda. Photosensitive Polyimide and Polybenzoxazole, PPC, ACS, Vol. FD, Dec. 2005.
• Mitsuru Ueda. Facile Synthesis of Photosesitive Polyimide and Polybenzoxazole, and Low-Temperature Cyclization of Poly(amic acid) and Poly(o-hydroxy amide), Korea-Japan Polyimide Conference 2005, Polyimide Conference, Vol. FD, Nov. 2005.
• Kondo, J.N.; Nakamura, M.; Shibasaki, Y.; Ueda, M.. Oxidative Coupling Polymerization of O-Cresol with a Copper-Amine Catalyst Immobilized Within the Interior of SBA-15, ACS, Vol. FD, Sept. 2005.
• Mitsuru Ueda. Facile Synthesis of Photosesitive Polyimide and Polybenzoxazole, MRS, MRS, Vol. FD, July 2005.
• Kazuya Matsumoto, Yuji Shibasaki, Shinji Ando, Mitsuru Ueda. Synthesis of poly(1,4-naphthylene) containing adamantane units in the side chains as a low k material, The 8th SPSJ International Polymer Conference, SPSJ, Vol. FD, July 2005.
• Fumihiro Toyokawa, Yuji Shibasaki, Mitsuru Ueda. Low temperature solid-phase cyclization of poly(o-hydroxyamide) and its application to photosensitive polymer, The 8th SPSJ International Polymer Conference, SPSJ, Vol. FD, July 2005.
• Isao Washio, Natsuko Yamazaki, Yuji Shibasaki, Mitsuru Ueda. Facile Synthesis of a Tadpole Dendrimer, The 8th SPSJ International Polymer Conference, SPSJ, Vol. FD, July 2005.
• Mtsuru Ueda. New Photosensitive Polybemzoxazole, RadTech Asia 2005, RadaTech, Vol. FD, May 2005.
• N. Yamazaki, I. Washio, Y. Shibasaki, M. Ueda. FACILE SYNTHESIS OF POLY(PHENYLENE-ETHER) DENDRIMERS FROM UNPROTECTED AB2-BUILDING BLOCK USING THIONYL CHLORIDE AS A CONDENSING AGENT, ACS, ACS, Vol. FD, Mar. 2005.
• T. Fukuhara, T. Hirayama, Y. Sibasaki, S. Ando, M. Ueda. New 193nm Resist, Microlithography 2005, SPIE, Vol. FD, Feb. 2005.
• K. Morita, Y. Shibasaki, M. Ueda. Synthesis of Positive-tone Photosensitive Polyimide having Sulfo Groups., Taiwan-Japan bilateral Symposium on Soft Materials, Taiwan-Japan bilateral Symposium, pp. 42, Sept. 2004.
• M. Ueda. Synthesis of a Novel Poly(binaphthylene ether) with a Low Dielectric Constant, Taiwan-Japan Bilateral Symposium on Soft Materials, Taiwan-Japan Bilateral Symposium, pp. 28-30, Sept. 2004.
• F. Toyokawa, Y. Shibasaki, S. Ando, M. Ueda. Synthesis of a High Transparent Poly(o-hydroxy amide) in the i line Region, Taiwan-Japan bilateral Symposium on Soft Materials, Taiwan-Japan bilateral Symposium, pp. 44-45, Sept. 2004.
• Mitsuru Ueda. Synthesis of Naphthalene Polymer with Low Dielectric Constant, 50th Anniversary of A.N. Nesmeyanov Institute of Organoelement Compound Russian Academy of Sciences, Polymer Conference (Russia), Vol. FD, Sept. 2004.
• Mitsuru Ueda. Facile Synthesis of Polyamide Dendrimers from Unprotected AB2 Building Blocks (II): Polyamide Dendrimer with a Carboxylic Acid at Core, Macro-2004, Macro-2004, Vol. FD, July 2004.
• K.Matsumoto, M. Ueda. Synthesis of Novel Poly[6(7),6';(7')-(1,3-Adamantyl)bis(2-Naphthol)] with Low Dielectric Constant, ACS, ACS, Vol. FD, Mar. 2004.

国内会議発表 (査読なし・不明)

• 福地 貴範, 渡辺 啓太, 永澤 匠, 安藤 慎治, 上田 充, 東原 知哉. ジチアンおよびトリアジン誘導体を用いた高屈折率材料の開発, 高分子学会, 高分子学会予稿集, Vol. 73, No. 1, p. 2Pd052, June 2024.
• 松田 直樹, 石毛 亮平, 原 昇平, 藤冨 晋太郎, 丸山 洋一郎, 上田 充, 安藤 慎治, 東原 知哉. 主鎖にオリゴイソブチレン骨格を有するマルチブロックコポリイミドの開発, 高分子学会, 高分子学会予稿集, Vol. 70, No. 1, p. 2Pe075, May 2021.
• 石毛 亮平, 原 昇平, 安藤 慎治, 松田 直樹, 東原 知哉, 上田 充, 丸山 洋一郎, 藤冨 晋太郎. 全芳香族ポリイミド/ポリジメチルシロキサンからなるマルチブロック共重合体の偏析構造と特異な低熱膨張挙動, 高分子学会, 高分子学会予稿集, 高分子学会, Vol. 70, No. 1, p. 2G13, May 2021.
• 石毛 亮平, 原 昇平, 安藤 慎治, 松田 直樹, 東原 知哉, 上田 充, 丸山 洋一郎, 藤冨 晋太郎. 全芳香族ポリイミド/ポリジメチルシロキサンからなるマルチブロック共重合体の偏析構造と特異な低熱膨張挙動, 高分子学会, 高分子学会予稿集, 高分子学会, Vol. 70, No. 1, p. 2G13, May 2021.
• 相羽 誉礼, 小田 三都郎, 大岡 千洋, 安藤 慎治, 芝崎 祐二, 東原 知哉, 上田 充, 陳 文章. 銅/2-置換ピリジン類触媒によるo-cresol の酸化カップリング重合, 高分子学会, 高分子学会予稿集, Vol. 68, No. 1, p. 1Pc031, May 2019.
• 前田 諒, 野口 慧人, 石田 良仁, 安藤 慎治, 上田 充, 亀山 敦. 側鎖に芳香族複素環類を有するラダー型ポリシルセスキオキサンの合成と光誘起屈折率変化, 高分子学会, 高分子学会予稿集, 高分子学会, Vol. 65, No. 2, p. 1Pc087, Sept. 2016.
• 東原 知哉, 伊藤 祥太郎, 福田 斉二郎, 小金澤 智之, 上田 充, 石曽根 隆, 平尾 明. ポリ(3-ヘキシルチオフェン）鎖を有するABC型非対称スターポリマーの合成と解析, 第64回高分子学会年次大会, 高分子学会予稿集, vol. 64, no. 1, 2M22, May 2015.
• 井上 雄介, 石田 良仁, 東原 知哉, 亀山 敦, 安藤 慎治, 上田 充. 長鎖ジアミンを含む含フッ素ポリアミック酸と 含フッ素ジアゾナフトキノンを用いたアルカリ現像可能な感光性ポリイミド, 高分子学会, 高分子学会予稿集, Vol. 63, No. 1, p. 2433, May 2014.
• 安田 明日美, 石田 良仁, 上田 充, 安藤 慎治, 亀山 敦. 芳香族複素環を有する安息香酸エステル誘導体の転位反応と屈折率変化, 高分子学会, 高分子学会予稿集, Vol. 63, No. 1, p. 2215, May 2014.
• 今井 貴之, 中林 千浩, 安藤 慎治, 東原 知哉, 森 秀晴, 上田 充. 高透明性・高屈折率を有する耐熱性ポリマーの合成, 高分子学会, 高分子学会予稿集, Vol. 63, No. 1, p. 2213, May 2014.
• 齋藤慶考, 東原 知哉, 松本 英俊, 上田 充. 熱異性化能を有する高透明耐熱ポリマー, 第62回高分子学会年次大会, 第62回高分子学会年次大会予稿集, 公益社団法人高分子学会, Vol. 62, No. 1, pp. 319, May 2013.
• 安田 明日美, 奥嶋 由紀, 石田 良仁, 上田 充, 安藤 慎治, 亀山 敦. 芳香族複素環を有する置換安息香酸エステルのPMMAフィルム中での熱転位と屈折率変化, ポリマー材料フォーラム, ポリマー材料フォーラム予稿集, Vol. 22, p. 201, 2013.
• 東原知哉, Yi-Cang Lai, Wen-Chang Chen, 上田充. 新規ポリチオフェンブロック共重合体の合成と有機薄膜太陽電池への応用, 第20回ポリマー材料フォーラム, Nov. 2011.
• 石毛亮平, 荘司優, 東原知哉, 上田充, 渡辺順次. 新規含シロキサン液晶性ポリイミドの形成する特異な液晶相構造, 高分子討論会予稿集, Vol. 59, No. 2, p. 3129, Sept. 2010.
• K.Ohshimizu, A.Takahashi, T.Higashihara, M.Ueda. Side Chain Functionalized Block Copoythiophenes to Adjusting Energy Band Gaps and HOMO levels for Photovoltaic Cells., Japan-Taiwan Bilateral Polymer Symposium, July 2010.
• K.Nakabayashi, T.Higashihara, M.Ueda. Polymer Electrolyte Membranes Based on Sulfonated Multiblock Copoly(ether sulfone)s, Japan-Taiwan Bilateral Polymer Symposium, July 2010.
• A.Takahashi, K.Ohshimizu, T.Higashihara, M.Ueda. Synthesis of Well-controlled Graphene Nanoribon Derived from Polythiophene Precursor., Japan-Taiwan Bilateral Polymer Symposium, July 2010.
• 荘司優, 石毛亮平, 東原知哉, 渡辺順次, 上田充. 新規含シロキサン液晶ポリイミドの液晶挙動に及ぼす置換基効果, 高分子学会年次大会予稿集, Vol. 59, No. 1, p. 234, May 2010.
• 荘司優, 石毛亮平, 東原知哉, 渡辺順次, 上田充. シロキサン結合を有する液晶ポリイミドの合成と液晶挙動, 高分子討論会, Vol. 58, No. 2, p. 3986, Sept. 2009.
• 福崎 菜美子, 鈴木 康夫, 中村 康広, 安藤 慎治, 東原 知哉, 上田 充. チオフェン含有高屈折率ポリイミドの合成, 高分子学会, 高分子学会予稿集, Vol. 58, No. 1, pp. 1500, June 2009.
• 鈴木 康夫, 中村 康広, 安藤 慎治, 上田 充. 2,5-ビス(4-アミノフェニルスルファニル)-1,4-ジチアンをジアミンとした高屈折率・高透明性ポリイミドの合成, 第57回高分子年次大会, May 2008.
• 劉 金剛, 中村康広, 芝崎祐二, 鈴木康夫, 安藤慎治, 上田充. 高透明性、高屈折率含硫黄ポリイミド[I]－合成・ナノハイブリッド化・微細加工, 高分子学会, 高分子学会予稿集, Vol. 56, No. 1, pp. 4903-4, Sept. 2007.
• 鈴木康夫, 劉金剛, 芝崎祐二, 中村康広, 安藤慎治, 上田充. 高透明性・高屈折率含硫黄ポリイミド[II]－スルホン構造を含むポリイミド, 高分子学会, 高分子学会予稿集, Vol. 56, No. 1, pp. 4928-9, Sept. 2007.
• 安藤慎治, 劉 金剛, 中村康広, 芝崎祐二, 鈴木康夫, 上田充. 高透明性・高屈折率含硫黄ポリイミド [III]－DFT計算による物性予測と光学測定による解析, 高分子学会, 高分子学会予稿集, Vol. 56, No. 1, pp. 4905-6, Sept. 2007.
• 劉 金剛, 中村康広, 芝崎祐二, 安藤慎治, 上田充. 新規含硫黄高屈折率、低副屈折率ポリイミドの合成, 高分子学会, 高分子学会予稿集, Vol. 56, No. 1, pp. 1676, May 2007.
• 劉 金剛, 中村康広, 芝崎祐二, 安藤慎治, 上田充. 含硫黄高屈折率ポリイミドの合成[1]:分子設計、合成、およびその物性, 高分子学会, 高分子学会予稿集, Vol. 56, No. 1, pp. 1411, May 2007.
• 河野俊司, 芝崎祐二, 安藤慎治, 上田充. 100%の分岐度を有するポリ〔2-（4-フェノキシ）フェノキシフルオレノン〕の合成, 高分子学会, 高分子学会予稿集, Vol. 56, No. 1, pp. 499, May 2007.
• 葛子義, 早川晃鏡, 安藤慎治, 上田充, 柿本雅明, 秋池 利之, 宮本 秀俊, 梶田 徹. トリフェニルアミン-ベンズイミダゾール誘導体による分岐型バイポーラー性材料の合成と有機ＥＬ素子への応用, 高分子学会, 高分子学会予稿集, Vol. 56, No. 1, pp. 495, May 2007.
• 中村康広, 劉 金剛, 上田充, 安藤慎治. 含硫黄高屈折率ポリイミド [2]:屈折率および光透過性の波長分散と分子構造の関係, 高分子学会, 高分子学会予稿集, Vol. 56, No. 1, pp. 1412, May 2007.
• 山崎奈津子, 鷲尾功, 芝崎祐二, 上田　充. フェニレンエーテル型デンドリマーの簡便な合成, 第54回高分子討論会, 高分子学会, Vol. FD, Sept. 2005.
• T. Ogura, K. Fukukawa, Y. Shibasaki, M. Ueda. Synthesis of Transparent Poly(o-hydroxy amide) Derivatives in i line Region for Photosensitive Polybenzoxazole, The 22rd Photopolymer Conference, Photopolymer Conference, Vol. 18, No. 2, pp. 319-321, June 2005.
• 中村 理弘, 芝崎　祐二, 上田　充. メソポーラス担持型触媒によるo-置換フェノールの酸化カップリング重合, 第５４回高分子年次大会, 高分子学会, Vol. ＦＤ, May 2005.
• 豊川　郁宏, 芝崎　祐二, 安藤　慎治, 上田　充. 2,2-ジメチル-3,3-ビフェニルジカルボン酸とビス(o-アミノフェノール）をモノマーとするi線対応の感光性ポリベンゾオキサゾールの合成, 第５３回高分子年次大会, 高分子学会, Vol. ＦＤ, May 2005.
• 山崎 奈都子, 鷲尾 功, 芝崎　祐二, 上田　充. フェニレンエ－テル型デンドリマーの簡便な合成, 第５４回高分子年次大会, 高分子学会, Vol. ＦＤ, May 2005.
• 盛田　浩介, 芝崎　祐二, 上田　充. ポリ（o-ヒドロキシアゾメチン）を前駆体とする感光性ポリベンズイミダゾールの合成, 第５４回高分子年次大会, 高分子学会, Vol. ＦＤ, May 2005.
• 福原　敏明, 平山　拓, 芝崎　祐二, 上田　充. 新規ArF用フォトレジスト材料の開発, 第５４回高分子年次大会, 高分子学会, Vol. ＦＤ, May 2005.
• 芝崎　祐二, 中村 理弘, 上田　充. メソポーラス担持型触媒による2,6-ジメチルフェノールの酸化重合, 第５４回高分子年次大会, 高分子学会, Vol. ＦＤ, May 2005.
• 渡辺　康史, 芝崎　祐二, 安藤　慎治, 上田　充. 低誘電性を有するポリ（フェニレンエ－テルイミド）の合成, 第５４回高分子年次大会, 高分子学会, Vol. ＦＤ, May 2005.
• 小倉　知士, 福川　健一, 芝崎　祐二, 上田　充. 熱塩基発生剤を用いたポリアミド酸の低温イミド化, 第５４回高分子年次大会, 高分子学会, Vol. ＦＤ, May 2005.
• 島倉　啓, 芝崎　祐二, 上田　充. C-メチルカリクス[4]-2-メチルレゾルシアレンをマトリックスとする低分子アモルファスレジストの合成, 第５４回高分子年次大会, 高分子学会, Vol. ＦＤ, May 2005.
• 上田　充. 感光性ポリイミド、ポリベンズオキサゾールの新展開, 日本化学会, 日本化学会, Vol. FD, Mar. 2005.
• 平山拓, 松丸省吾, 緒方寿幸, 羽田英夫, 小野寺純一, 上田　充. 低分子アモルファス材料からなる電子線レジストからの微細パターン形成とラフネス評価, 高分子学会, Vol. ＦＤ, Sept. 2004.
• 安藤慎治, 豊川郁宏, 福川健一, 芝崎祐二, 上田　充. 密度汎関数法を用いた高透明性ポリベンズオキサゾールの分子設計, 第５３回高分子討論会, 高分子学会, Vol. FD, Sept. 2004.
• K. Matsumoto, Y. Shibsakai, S. Ando, M. Ueda. Synthesis of Photosensitive and Thermosetting Poly(phenylene ether) Containing Butenyl Groups, The 21 Photopolymer Conference, Photopolymer Conference, Vol. 17, No. 2, pp. 281-282, June 2004.
• K. Morita, Y. Shibasaki, M. Ueda. New Positive-type Photosensitive Polyimide Having Sulfo Groups 2. Polyimides from 2,2’-Oxy(or thio)bis(5-aminobenzenesulfonic acid), 4,4’-Oxydianiline, and 4,4’-Hexafluoropropylidene bis(phthalic anhydride), The 21st Photopolymer Conference, Photopolymer Conference, Vol. 17, No. 2, pp. 263-268, June 2004.
• T. Hirayama, D. Shiono, H. Hada, J. Onodera, M. Ueda. New Photoresist Based on Amorphous Low Molecular Weight Polyphenols, The 21st Photopolymer Conference, Photopolymer Conference, Vol. 17, No. 3, pp. 435-440, June 2004.
• 松本 和也, 芝崎　祐二, 安藤　慎治, 上田　充. 新規ネガ型感光性ポリフェニレンエーテルの合成, 第５３回高分子年次大会, 高分子学会, Vol. ＦＤ, May 2004.
• 鷲尾 功, 芝崎　祐二, 上田　充. 簡便なポリアミドデンドリマーの合成, 第５３回高分子年次大会, 高分子学会, Vol. ＦＤ, May 2004.
• 杉山純一, 奥山健一, 上田　充, 竹内和彦. ヒドロキシアパタイト担持パラジウム触媒を用いたポリカーボネート合成, 第５３回高分子年次大会, 高分子学会, Vol. ＦＤ, May 2004.
• 豊川郁宏, 芝崎祐二, 安藤慎治, 上田　充. 高透明非フッ素含有感光性ポリベンゾオキサゾールの合成, 高分子学会, Vol. ＦＤ, May 2004.
• 野村正宣, 芝崎祐二, 上田　充. ホール輸送性ポリ(ジ(1-ナフチル)-4-トルイルアミン)の合成と性質, 第５３回高分子年次大会, 高分子学会, Vol. ＦＤ, May 2004.
• 福原　敏明, 芝崎　祐二, 安藤　慎治, 上田　充. 新規１９３nm用フォトレジスト材料の開発, 第５３回高分子年次大会, 高分子学会, Vol. ＦＤ, May 2004.
• 飯森　弘和, 芝崎　祐二, 上田　充. 電子線リソグラフィー用低分子アモルファス材料の合成, 第５３回高分子年次大会, 高分子学会, Vol. ＦＤ, May 2004.
• 福川　健一, 芝崎　祐二, 安藤　慎治, 上田　充. 高透明性半脂環式感光性ポリベンズオキサゾールの合成, 第５３回高分子年次大会, 高分子学会, Vol. ＦＤ, May 2004.
• 渡辺　康史, 福川　健一, 芝崎　祐二, 上田　充. ピロメリット酸二無水物と4,4-オキシジアニリンからの新規ネガ型感光性ポリイミドの合成, 第５３回高分子年次大会, 高分子学会, Vol. FD, May 2004.
• 盛田　浩介, 芝崎　祐二, 上田　充. スルホン酸基を有する新規感光性ポリイミドの開発, 第５３回高分子年次大会, 高分子学会, Vol. FD, May 2004.
• 山崎 奈都子, 上田　充. 種々の枝または核を有する星形ポリマーの精密合成感熱応答挙動および低分子化合物の補足, 第５３回高分子年次大会, 高分子学会, Vol. ＦＤ, May 2004.
• 上田　充. 重縮合の最近の進歩, 東海高分子シンポジウム, 高分子学会, Vol. FD, Mar. 2004.

その他の論文・著書など

• J-g. Liu, M. Ueda. High refractive index polymers: fundamental research and practical, J. Mater. Chem., Vol. 19, pp. 8907–8919, July 2009.
• 安藤 慎治, 劉 金剛, 上田 充. 光学ポリマーの物性予測と高屈折率ポリイミド光学材料の開発, 成形加工, プラスチック成形加工学会, Vol. 20, pp. 170-176, Mar. 2008.
• K. Fukukawa, M. Ueda. Recent Development of Photosensitive Polybenzoxazoles, Polym. J.,, Vol. 38, No. 5, pp. 405-418, 2006.
• 上田　充. 感光性ポリベンズオキサゾールの新展開, 高分子加工, 高分子刊行会, Vol. 54, No. 8, pp. 346-352, Aug. 2005.
• 上田　充. Atom Economical 重縮合, 高分子, 高分子学会, Vol. 51, No. 4, pp. 258-262, Apr. 2003.
• 上田充. 感光性ポリイミド, 写真学会誌, 写真学会, Vol. 66, No. 4, pp. 367-375, Apr. 2003.
• 上田充. 高分子合成(重縮合系), 高分子学, 高分子学会, Vol. 51, No. 1, pp. 324-325, Jan. 2003.
• 上田　充. 縮合系高分子の精密重合, 石油学会, 石油学会, Vol. 25, No. 3, pp. 189-193, Mar. 2002.

特許など

• 上田充, 東原知哉, 斉藤慶考, 岡田　敬, 宇野　高明. 重合体の製造方法および重合体. 特許. 公開. 国立大学法人東京工業大学, JSR株式会社. 2013/05/13. 特願2013-101403. 2014/10/02. 特開2014-185198. 2014.
• 上田充, 東原知哉, 相羽誉礼, 平鍋　隆一郎, 徳山　尊大, 富岡　洋樹, 栗原　優. 半透膜およびその製造方法、半透膜を用いた濃度差発電方法. 特許. 登録. 国立大学法人東京工業大学, 東レ株式会社. 2013/05/14. 特願2014-515629. 2016/01/12. 再表2013/172330. 特許第6282585号. 2018/02/02 2018.
• 上田充, 東原知哉, SHENGLI, 菅原　周一. ブロック共重合体およびその用途. 特許. 公開. 国立大学法人東京工業大学, JSR株式会社. 2012/11/26. 特願2012-257262. 2014/06/09. 特開2014-105230. 2014.
• 上田充, 東原知哉, チョウ　ケン, 菅原　周一. ポリメタフェニレンおよびその用途. 特許. 公開. 国立大学法人東京工業大学, JSR株式会社. 2012/11/14. 特願2012-250172. 2014/05/29. 特開2014-098086. 2014.
• 上田充, 井上雄介, 斎藤　悠太, 東原知哉, 安田　博幸, 今野　圭二, 栗山　敬祐. 感放射線性樹脂組成物、有機ＥＬ素子用硬化膜の形成方法、有機ＥＬ素子用硬化膜及び有機ＥＬ素子. 特許. 公開. 国立大学法人東京工業大学, JSR株式会社. 2012/05/11. 特願2012-110117. 2013/11/28. 特開2013-238679. 2013.
• 上田充, 安藤慎治, 東原知哉, 鈴木　康夫, 中川　優, 菅原　周一　. ビナフチル骨格を有するポリ（アリーレンチオエーテル）. 特許. 登録. 国立大学法人東京工業大学, JSR株式会社. 2012/03/26. 特願2012-069160. 2013/10/03. 特開2013-199601. 特許第5804460号. 2015/09/11 2015.
• 上田充, 安藤慎治, 東原知哉, 鈴木　康夫, 菅原　周一. トリシクロ［５．２．１．０２，６］デカン構造を繰り返し単位に含む重合体. 特許. 登録. 国立大学法人東京工業大学, JSR株式会社. 2012/02/27. 特願2012-040449. 2013/09/05. 特開2013-173886. 特許第5892509号. 2016/03/04 2016.
• 上田充, 安藤慎治, 鈴木　康夫, 村上　公也, 東原知哉, 菅原　周一, 川島　直之. 高屈折率を有する重合体. 特許. 公開. 国立大学法人東京工業大学, JSR株式会社. 2011/02/28. 特願2011-041677. 2012/09/13. 特開2012-177056. 2012.
• 上田充, 東原知哉, 張　岑尭, 佃　明光　, 越智　隆志　. メタアラミド繊維の製造方法. 特許. 登録. 国立大学法人東京工業大学, 東レ株式会社. 2011/02/10. 特願2011-026916. 2012/09/06. 特開2012-167387. 特許第5707161号. 2015/03/06 2015.
• 東原知哉, 上田充. ポリチオフェン類の製造方法、及び新規なチオフェンモノマー . 特許. 公開. 国立大学法人東京工業大学. 2011/01/28. 特願2011-016641. 2012/08/16. 特開2012-153860. 2012.
• 上田充, 安藤慎治, ユウ　ナム　ホ（Nam-Ho You）, 村上　公也, 菅原　周一. 硫黄を含有する（メタ）アクリレート化合物. 特許. 登録. 国立大学法人東京工業大学, JSR株式会社. 2010/04/12. 特願2010-091117. 2011/11/04. 特開2011-219642. 特許第5370892号. 2013/09/27 2013.
• 上田充, 安藤慎治, ユウ　ナム　ホ, 東原知哉, 菅原　周一. トリアジン単位含有ポリ（フェニレンチオエーテル）. 特許. 登録. 国立大学法人東京工業大学, JSR株式会社. 2010/04/12. 特願2010-091118. 2011/11/04. 特開2011-219643. 特許第5493148号. 2014/03/14 2014.
• 上田充, 東原知哉, 小倉　知士, 池田　章彦. 硬化レリーフパターンの形成方法. 特許. 登録. 国立大学法人東京工業大学, 旭化成イーマテリアルズ株式会社. 2010/03/31. 特願2010-081955. 2011/10/27. 特開2011-215283. 特許第5513217号. 2014/04/04 2014.
• 上田充, 松本　和也, 中川　泰次郎, 東原　知哉, 後藤　幸平. スルホン化ポリマー及びそれを用いたプロトン伝導膜. 特許. 公開. 国立大学法人東京工業大学, JSR株式会社. 2010/02/05. 特願2010-024248. 2010/09/16. 特開2010-202866. 2010.
• 上田充, 安藤慎治, ユウ　ナム　ホ（Nam-Ho You）, 村上　公也, 菅原　周一. 新規（メタ）アクリレート化合物及びその製造方法. 特許. 登録. 国立大学法人東京工業大学, JSR株式会社. 2010/02/18. 特願2010-033325. 2011/09/01. 特開2011-168526. 特許第5578512号. 2014/07/18 2014.
• 上田充, 溝口　勝久, 池田　章彦. アルカリ現像可能なネガ型感光性樹脂組成物、硬化レリーフパターンの製造方法及び半導体装置. 特許. 登録. 国立大学法人東京工業大学, 旭化成イーマテリアルズ株式会社. 2009/04/07. 特願2009-093404. 2010/10/28. 特開2010-243854. 特許第5439640号. 2013/12/27 2013.
• 上田充, 鈴木　康夫, 安藤慎治, 菅原　周一　. 高アッベ数及び優れた耐熱性を有する高屈折率材料. 特許. 公開. 国立大学法人東京工業大学, JSR株式会社. 2009/04/22. 特願2009-104435. 2010/04/15. 特開2010-084122. 2010.
• 上田充, 鈴木　康夫, 安藤慎治, 菅原　周一. 高アッベ数及び優れた耐熱性を有する高屈折率材料. 特許. 登録. 国立大学法人東京工業大学, JSR株式会社. 2009/04/22. 特願2009-104435. 2010/04/15. 特開2010-084122. 特許第5429930号. 2013/12/13 2013.
• 上田充, 荘司　優, 溝口　勝久. 芳香族ポリアミド及びその製造方法. 特許. 公開. 国立大学法人東京工業大学, 東レ 株式会社. 2009/02/27. 特願2009-045653. 2009/11/05. 特開2009-256610. 2009.
• 上田充, 安藤慎治, ユウ　ナム　ホ（Nam-Ho You）, 鈴木　康夫, 中村　康広, 菅原　周一. ジアミン化合物、それを使用して製造されるポリアミック酸及びイミド化重合体. 特許. 登録. 国立大学法人東京工業大学, JSR株式会社. 2009/02/18. 特願2009-035721. 2010/09/02. 特開2010-189322. 特許第5354493号. 2013/09/06 2013.
• 上田充, 荘司　優, 溝口　勝久. 芳香族ポリアミドの製造方法. 特許. 登録. 国立大学法人東京工業大学, 東レ株式会社. 2009/02/27. 特願2009-045653. 2009/11/05. 特開2009-256610. 特許第5280889号. 2013/05/31 2013.
• 上田充, 松本　和也, 後藤　幸平. 新規芳香族化合物およびその製造方法、ポリアリーレンエーテルおよびプロトン伝導膜. 特許. 公開. 国立大学法人東京工業大学, JSR株式会社. 2008/09/05. 特願2008-228602. 2010/03/18. 特開2010-059129. 2010.
• 上田充, 大清水　薫. π共役系高分子及びその製造方法、並びに電荷輸送材料及び有機電子デバイス. 特許. 公開. 国立大学法人東京工業大学, 三菱化学株式会社. 2008/08/18. 特願2008-209593. 2010/02/25. 特開2010-043217. 2010.
• 柿本雅明, 上田充, 安藤慎治, 早川晃鏡, 葛　子義, Vinich　Promarak, 秋池　利之. 有機エレクトロルミネッセンス素子用化合物および有機エレクトロルミネッセンス素子用組成物並びに有機エレクトロルミネッセンス素子. 特許. 公開. 国立大学法人東京工業大学, JSR株式会社. 2008/07/25. 特願2008-191825. 2009/03/19. 特開2009-060089. 2009.
• 上田充, ユウ ナム ホ（Nam-Ho You）, 安藤慎治, 依籐　大輔, 菅原　周一. 新規ジアミン化合物、それを使用して製造されるポリアミック酸及びイミド化重合体. 特許. 登録. 国立大学法人東京工業大学, JSR株式会社. 2008/05/07. 特願2008-121615. 2009/11/19. 特開2009-270009. 特許第5011595号. 2012/06/15 2012.
• 上田充, 安藤慎治, 中村　康広, 鈴木　康夫, 菅原　周一. 新規ジアミン化合物、それを使用して製造されるポリアミック酸及びイミド化重合体. 特許. 登録. 国立大学法人東京工業大学, JSR株式会社. 2008/05/07. 特願2008-121616. 2009/11/19. 特開2009-270010. 特許第5011596号. 2012/06/15 2012.
• 上田充, 溝口　勝久, 池田　章彦. 感光性耐熱性樹脂組成物. 特許. 登録. 国立大学法人東京工業大学, 旭化成イーマテリアルズ株式会社. 2008/05/23. 特願2008-134960. 2009/12/03. 特開2009-282344. 特許第5117281号. 2012/10/26 2012.
• 上田充, 瀬川　縁, シンアナンワーニ ワラポン, 栗山　敬祐. 機能化された新規直鎖状重合体及びその製造方法. 特許. 登録. 国立大学法人東京工業大学, JSR株式会社. 2008/04/30. 特願2008-118073. 2009/11/12. 特開2009-263595. 特許第5283107号. 2013/06/07 2013.
• 上田充, 安藤慎治, 芝崎祐二, 中村　康広, 劉　金剛, 菅原　周一, 栗山　敬祐, 江利山　祐一, 高瀬　英明. 樹脂組成物、硬化膜及び光学用部材. 特許. 公開. 国立大学法人東京工業大学, JSR株式会社. 2008/03/10. 特願2008-059601. 2008/11/13. 特開2008-274229. 2008.
• 上田充, 安藤慎治, 芝崎祐二, 中村　康広, 劉　金剛, 菅原　周一, 栗山　敬祐, 江利山　祐一, 高瀬　英明. 新規ジアミン化合物、それを使用して製造されるポリアミック酸及びイミド化重合体. 特許. 公開. 国立大学法人東京工業大学, JSR株式会社. 2008/03/10. 特願2008-059600. 2008/11/13. 特開2008-273934. 2008.
• 上田充, 安藤慎治, 芝崎祐二, 中村　康広, 劉　金剛, 菅原　周一, 有行　美和, 江利山　祐一, 栗山　敬祐, 高瀬　英明. 樹脂組成物、硬化物及び光学用部材. 特許. 登録. 国立大学法人東京工業大学, JSR株式会社. 2008/03/24. 特願2008-075334. 2008/11/13. 特開2008-274234. 特許第4986071号. 2012/05/11 2012.
• 上田充, 安藤慎治, 奥津　理恵, 菅原　周一. 高アッベ数を有する高屈折率材料. 特許. 登録. 国立大学法人東京工業大学, JSR株式会社. 2008/03/05. 特願2008-054389. 2009/09/17. 特開2009-209277. 特許第4905991号. 2012/01/20 2012.
• 上田充, 中林　千浩. プロトン酸基含有ブロックコポリマー、及びその製造方法、並びに高分子電解質膜. 特許. 公開. 国立大学法人東京工業大学. 2008/03/26. 特願2008-080155. 2009/10/15. 特開2009-235158. 2009.
• 上田充, 安藤慎治, 芝崎祐二, 中村　康広, 劉　金剛, 菅原　周一, 栗山　敬祐, 江利山　祐一, 高瀬　英明. 樹脂組成物、硬化膜及び光学用部材. 特許. 登録. 国立大学法人東京工業大学, JSR株式会社. 2008/03/10. 特願2008-059601. 2008/11/13. 特開2008-274229. 特許第5162787号. 2012/12/28 2012.
• 上田充, 安藤慎治, 芝崎祐二, 中村　康広, 劉　金剛, 菅原　周一, 栗山　敬祐, 江利山　祐一, 高瀬　英明. 新規ジアミン化合物、それを使用して製造されるポリアミック酸及びイミド化重合体. 特許. 登録. 国立大学法人東京工業大学, JSR株式会社. 2008/03/10. 特願2008-059600. 2008/11/13. 特開2008-273934. 特許第5229719号. 2013/03/29 2013.
• 上田充, 安藤慎治, 奥津　理恵, 菅原　周一. 新規含硫黄エチレン性不飽和基含有化合物、及びその重合体. 特許. 登録. 国立大学法人東京工業大学, JSR株式会社. 2007/12/05. 特願2007-314695. 2009/06/25. 特開2009-137868. 特許第5213100号. 2013/03/08 2013.
• 上田充, CLAUDIO A．TERRAZA, 劉　金剛, 中村　康広, 芝崎祐二, 安藤慎治, 菅原　周一, 菊池　利充. テトラカルボン酸二無水物、それを使用して製造されるポリアミック酸及びイミド化合重体. 特許. 公開. 国立大学法人東京工業大学, JSR株式会社. 2007/11/22. 特願2007-303590. 2009/06/11. 特開2009-126825. 2009.
• 上田充, 溝口　勝久, 池田　章彦. ネガ型感光性樹脂組成物　. 特許. 登録. 国立大学法人東京工業大学, 旭化成イーマテリアルズ株式会社. 2007/11/01. 特願2007-285127. 2009/05/28. 特開2009-115835. 特許第5099336号. 2012/10/05 2012.
• 上田充, 安藤慎治, 芝崎祐二, 中村　康広, 劉　金剛, 菅原　周一. 新規ジアミン化合物、それを使用して製造されるポリアミック酸及びイミド化合物重合体. 特許. 公開. 国立大学法人東京工業大学, JSR株式会社. 2007/09/14. 特願2007-239505. 2009/04/02. 特開2009-067745. 2009.
• 上田充, 安藤慎治, 芝崎祐二, 中村　康広, 劉　金剛, 菅原　周一. 新規テトラカルボン酸二無水物、それを使用して製造されるポリアミック酸及びイミド化重合体. 特許. 公開. 国立大学法人東京工業大学, JSR株式会社. 2007/09/14. 特願2007-239504. 2009/04/02. 特開2009-067938. 2009.
• 上田充, 安藤慎治, 芝崎祐二, 中村　康広, 劉　金剛, 菅原　周一. ポリアミック酸及びイミド化重合体. 特許. 登録. 国立大学法人東京工業大学, JSR株式会社. 2007/09/14. 特願2007-239506. 2009/04/02. 特開2009-067939. 特許第4931007号. 2012/02/24 2012.
• 上田充, 安藤慎治, 芝崎祐二, 中村　康広, 劉　金剛, 菅原　周一. ポリアミック酸及びイミド化重合体. 特許. 公開. 国立大学法人東京工業大学, JSR株式会社. 2007/09/14. 特願2007-239502. 2009/04/02. 特開2009-067936. 2009.
• 上田充, 安藤慎治, 芝崎祐二, 中村　康広, 劉　金剛, 菅原　周一. ポリアミック酸及びイミド化重合体. 特許. 公開. 国立大学法人東京工業大学, JSR株式会社. 2007/09/14. 特願2007-239501. 2009/04/02. 特開2009-067935. 2009.
• 上田充, 安藤慎治, 芝崎祐二, 中村　康広, 劉　金剛, 菅原　周一. ポリアミック酸及びイミド化重合体. 特許. 公開. 国立大学法人東京工業大学, JSR株式会社. 2007/09/14. 特願2007-239503. 2009/04/02. 特開2009-067937. 2009.
• 柿本雅明, 上田充, 安藤慎治, 早川晃鏡, 葛　子義, 秋池　利之. 有機エレクトロルミネッセンス素子用化合物および有機エレクトロルミネッセンス素子用組成物並びに有機エレクトロルミネッセンス素子. 特許. 登録. 国立大学法人東京工業大学, JSR株式会社. 2007/08/03. 特願2007-202756. 2009/02/19. 特開2009-038280. 特許第4879114号. 2011/12/09 2011.
• 上田充, 芝崎祐二, 小倉　知士, 劉　金剛, 池田　章彦. 光塩基発生剤およびネガ型感光性樹脂組成物. 特許. 公開. 国立大学法人東京工業大学, 旭化成エレクトロニクス株式会社. 2007/07/12. 特願2007-182797. 2009/01/29. 特開2009-019113. 2009.
• 上田充, 安藤慎治, 芝崎祐二, 奥津　理恵, 菅原　周一, 栗山　敬祐, 江利山　祐一, 高瀬　英明. 新規含硫黄エチレン性不飽和基含有化合物、放射線硬化性組成物及び硬化物. 特許. 公開. 国立大学法人東京工業大学, JSR株式会社. 2007/03/30. 特願2007-093192. 2008/10/16. 特開2008-247849. 2008.
• 上田充, 安藤慎治, 芝崎祐二, 劉　金剛, 奥津　理恵, 菅原　周一, 栗山　敬祐, 江利山　祐一, 高瀬　英明. 新規含硫黄エチレン性不飽和基含有化合物、放射線硬化性組成物及び硬化物. 特許. 公開. 国立大学法人東京工業大学, JSR株式会社. 2007/03/30. 特願2007-093285. 2008/10/16. 特開2008-248172. 2008.
• 上田充, 芝崎祐二, 鈴木　康夫. 触媒、およびポリマーの製造方法. 特許. 公開. 国立大学法人東京工業大学. 2007/02/27. 特願2007-047419. 2008/09/11. 特開2008-208254. 2008.
• 柿本雅明, 上田充, 安藤慎治, 早川晃鏡, 葛　子義, 秋池　利之. 有機エレクトロルミネッセンス素子用化合物、組成物および有機エレクトロルミネッセンス素子. 特許. 登録. 国立大学法人東京工業大学, JSR株式会社. 2006/12/18. 特願2006-340510. 2007/10/18. 特開2007-269772. 特許第4961540号. 2012/04/06 2012.
• 上田充. 多官能化合物、光記録材料、光記録媒体、光記録再生装置、光導波路材料、および光配向膜材料. 特許. 公開. 日東電工株式会社. 2006/07/11. 特願2006-190185. 2008/01/31. 特開2008-019177. 2008.
• 上田充. 多官能化合物の製造方法. 特許. 公開. 日東電工株式会社. 2006/07/11. 特願2006-190186. 2008/01/31. 特開2008-019178. 2008.
• 上田充, 小倉　知士, 山口　宏大, 池田　章彦. ポジ型感光性樹脂組成物. 特許. 公開. 国立大学法人東京工業大学, 旭化成エレクトロニクス株式会社. 2006/05/08. 特願2006-129266. 2007/11/22. 特開2007-304125. 2007.
• 上田充, 小倉　知士, 西村　真也. ポリアミド酸の合成方法及びポリイミドの合成方法. 特許. 公開. 国立大学法人東京工業大学, 株式会社フジクラ. 2006/05/12. 特願2006-134403. 2007/11/22. 特開2007-302832. 2007.
• 上田充, 小倉　知士, 池田　章彦. 活性ジエステル及びポリベンゾオキサゾール前駆体の製造方法. 特許. 公開. 国立大学法人東京工業大学, 旭化成エレクトロニクス株式会社. 2005/12/16. 特願2005-363067. 2007/06/28. 特開2007-161948. 2007.
• 上田充, 福川　健一, 池田　章彦, 花畑　博之. ポジ型感光性樹脂組成物、その製造方法、及びレリーフパターンの形成方法. 特許. 登録. 国立大学法人東京工業大学, 旭化成イーマテリアルズ株式会社. 2005/09/30. 特願2005-286893. 2007/04/12. 特開2007-094317. 特許第4646068号. 2010/12/17 2010.
• 上田充, 福川　健一, 小倉　知士, 土井　一郎, 花畑　博之. ポリイミド前駆体組成物、ポリイミド膜の製造方法及び半導体装置. 特許. 公開. 国立大学法人東京工業大学, 旭化成エレクトロニクス株式会社. 2005/08/26. 特願2005-245463. 2007/03/08. 特開2007-056196. 2007.
• 上田充, 布重　純. 新規共重合体、樹脂組成物、その硬化物及び電子部品. 特許. 公開. 国立大学法人東京工業大学, 株式会社日立製作所. 2005/04/14. 特願2005-116736. 2006/10/26. 特開2006-291125. 2006.
• 野村淳子, 上田充, 芝崎祐二, 石丸　竜平, 中村　理弘. 触媒、及びポリマーの製造方法. 特許. 公開. 国立大学法人東京工業大学. 2005/03/01. 特願2005-056373. 2005/12/08. 特開2005-336457. 2005.
• 上田充, 岡本　正哉, 杉山　順一. ポリカーボネート製造用触媒及びポリカーボネートの製造方法. 特許. 登録. 国立大学法人東京工業大学, 独立行政法人産業技術総合研究所, 出光興産株式会社. 2004/09/24. 特願2004-277261. 2006/04/06. 特開2006-089617. 特許第4403576号. 2009/11/13 2009.

学位論文

• 活性アシル誘導体を用いるポリアミドの合成に関する基礎的研究,  本文,  工学博士,  東京工業大学,  1978/03/31,   
• Synthesis of thermotropic liquid crystalline polyimides with siloxane linkages,  Master (Engineering), 

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