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Publication List - Wataru Kikuchi (6 / 51 entries)
Journal Paper
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Keren Lin,
Shinji Yoshimura,
Michael K. T. Mo,
Wataru Kikuchi,
Yuya Yamashita,
Jun Enomoto,
Motoshi Goto,
Hiroshi Akatsuka,
Takayoshi Tsutsumi.
Development and investigation of a large-diameter helium atmospheric-pressure plasma jet with floating electrode configuration,
Japanese Journal of Applied Physics,
IOP Publishing,
Vol. 65,
No. 2,
026002,
Feb. 2026.
Official location
International Conference (Reviewed)
Domestic Conference (Reviewed)
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Yuchen Ye,
Kenta Doi,
Tetsuji Kiyota,
Wataru Kikuchi,
Wentao He,
Kazuki Shimatani,
Hinata Hanyu,
Yuya Yamashita,
Atsushi Nezu,
Hiroshi Akatsuka.
Comparison of Analytical and Non-parametric Inversion Approaches for EEPFs in Ar ICP based on OES and CRM,
The 73rd JSAP Spring Meeting 2026,
Extended Abstracts of the 73rd JSAP Spring Meeting 2026,
Japan Scociety of Applied Physics,
p. 08-081,
Mar. 2026.
Official location
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Wataru Kikuchi,
Jun Enomoto,
Keren Lin,
Tomoya Taguchi,
Atsushi Nezu,
Hiroshi Akatsuka.
Analysis of Atmospheric-pressure Non-equilibrium Ar Plasma Based on Continuum and Line spectra with Weighted Analysis in DBD and JET Devices,
The 73rd JSAP Spring Meeting 2026,
Extended Abstracts of the 73rd JSAP Spring Meeting 2026,
Japan Scociety of Applied Physics,
p. 08-090,
Mar. 2026.
Official location
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Kazuki Shimatani,
Tetsuji Kiyota,
Kenta Doi,
Yuya Yamashita,
Wataru Kikuchi,
Kenta Ishi,
Jun Enomoto,
Yuchen Ye,
Atsushi Nezu,
Hiroshi Akatsuka.
Spatial Distribution Diagnosis of Electron Temperature and Density in Inductively Coupled Nitrogen-Argon Plasma by Tomographic OES: Validation with High-Resolution Single-Channel Spectroscopy and Langmuir Probe Measurement,
The 43rd Symposium on Plasma Processing (SPP43),
Proceedings of 43rd Symposium on Plasma Processing (SPP-43),
JSAP Div. Plasma Electronics,
pp. 61-62,
Jan. 2026.
Official location
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Wentao He,
Tetsuji Kiyota,
Kenta Doi,
Yuya Yamashita,
Wataru Kikuchi,
Yuchen Ye,
Shuhei Watanabe,
Atushi Nezu,
Hiroshi Akatsuka.
Spatially Resolved Measurement of Oxygen ICP and CCP Using Optical Emission Spectroscopy with Tomographic Analysis,
The 43rd Symposium on Plasma Processing (SPP43),
Proceedings of 43rd Symposium on Plasma Processing (SPP-43),
JSAP Div. Plasma Electronics,
pp. 59-60,
Jan. 2026.
Official location
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