Journal Paper

• José P. B. Silva, Ruben Alcala, Uygar E. Avci, Nick Barrett, Laura Bégon-Lours, Mattias Borg, Seungyong Byun, Sou-Chi Chang, Sang-Wook Cheong, Duk-Hyun Choe, Jean Coignus, Veeresh Deshpande, Athanasios Dimoulas, Catherine Dubourdieu, Ignasi Fina, Hiroshi Funakubo, Laurent Grenouillet, Alexei Gruverman, Jinseong Heo, Michael Hoffmann, H. Alex Hsain, Fei-Ting Huang, Cheol Seong Hwang, Jorge Íñiguez, Jacob L. Jones, Ilya V. Karpov, Alfred Kersch, Taegyu Kwon, Suzanne Lancaster, Maximilian Lederer, Younghwan Lee, Patrick D. Lomenzo, Lane W. Martin, Simon Martin, Shinji Migita, Thomas Mikolajick, Beatriz Noheda, Min Hyuk Park, Karin M. Rabe, Sayeef Salahuddin, Florencio Sánchez, Konrad Seidel, Takao Shimizu, Takahisa Shiraishi, Stefan Slesazeck, Akira Toriumi, Hiroshi Uchida, Bertrand Vilquin, Xianghan Xu, Kun Hee Ye, Uwe Schroeder. Roadmap on Ferroelectric Hafnia and Zirconia-based materials and devices, APL Mater., vol. 11, pp. 089201-1-70, Aug. 2023.
• Yusuke Yamasaki, Yukie Yokota, Hiromi Shima, Hiroshi Funakubo, Hiroshi Uchida. Enhanced polarization properties of one-axis-oriented PZT thin films on transparent glass substrates by controlling chemical composition, J. Ceram. Soc. Jpn., vol. 131, no. 7, pp. 229-235, July 2023.
• Masaki Okura, Yoshiharu Ito, Takahisa Shiraishi, Takanori Kiguchi, Toyohiko J. Konno, Hiroshi Funakubo, Hiroshi Uchida. Lower-Temperature Processing of Potassium Niobate Films by Microwave-Assisted Hydrothermal Deposition Technique, J. Ceram. Soc. Jpn., Vol. 130, No. 1, pp. 123-130, Jan. 2022.
• Atsuo Katagiri, Mutsuo Uehara, Mao Kurokawa, Kensuke Akiyama, Takao Shimizu, Masaaki Matsushima, Hiroshi Uchida, Yoshisato Kimura, Hiroshi Funakubo. Composition Dependence of Crystal Structures and Electrical Properties of Ca-Mg-Si Films Prepared by Sputtering, Journal of ELECTRONIC MATERIALS, vol. 49, no. 12, pp. 7509-7517, Oct. 2020.
• Akinori Tateyama, Yoshiharu Ito, Yoshiko Nakamura, Takao Shimizu, Yuichiro Orino, Minoru Kurosawa, Hiroshi Uchida, Takahisa Shiraishi, Takanori Kiguchi, Toyohiko J. Konno, Takeshi Yoshimura, Hiroshi Funakubo. Good piezoelectricity of self-polarized thick epitaxial (K,Na)NbO3 films grown below the Curie temperature (240°C) using a hydrothermal method, Appl. Phys. Lett., vol. 117, pp. 142903-1-6, Sept. 2020.
• Yoshiharu Ito, Akinori Tateyama, Yoshiko Nakamura, Takao Shimizu, Minoru Kurosawa, Hiroshi Uchida, Takahisa Shiraishi, Takanori Kiguchi, Toyohiko J. Konno, Mutsuo Ishikawa, Nobuhiro Kumada, Hiroshi Funakubo. High yield preparation of (100)c-oriented (K,Na)NbO3 thick films by hydrothermal method using amorphous niobium source, J. Ceram. Soc. Jpn., vol. 128, no. 8, pp. 512-517, Aug. 2020.
• Hiroshi Uchida, Masaki Okura, Yoshiharu Ito, Takahisa Shiraishi, Takanori Kiguchi, Toyohiko J. Konno, Hiroshi Funakubo. Rapid deposition of (K,Na)NbO3 thick films using microwave-assisted hydrothermal technique, Jpn. J. Appl. Phys., vol. 59, pp. SPPB02, July 2020.
• Keisuke Yazawa, Benjamin Ducharne, Hiroshi Uchida, Hiroshi Funakubo, John E. Blendell. Barkhausen Noise Analysis of Thin Film Ferroelectrics, Appl. Phys. Lett., Vol. 117, pp. 012902-1-4, June 2020.
• Takanori Mimura, Takao Shimizu, Hiroshi Uchida, Hiroshi Funakubo. Room-temperature deposition of ferroelectric HfO2-based films by the sputtering metho, Appl. Phys. Lett., Vol. 116, pp. 062901-1-5, Feb. 2020.
• Atsuo Katagiri, Shota Ogawa, Takao Shimizu, Masaaki Matsushima, Kensuke Akiyama, Hiroshi Uchida, Hiroshi Funakubo. Epitaxial growth of Mg2Si films on (111) Si substrates covered with epitaxial SiC layers, Jpn. J. Appl. Phys., Vol. 59, pp. SF1001-1-4, Jan. 2020.
• Yoshiharu Ito, Akinori Tateyama, Yoshiko Nakamura, Takao Shimizu, Minoru Kurosawa, Hiroshi Uchida, Takahisa Shiraishi, Takanori Kiguchi, Toyohiko J. Konno, Mutsuo Ishikawa, Hiroshi Funakubo. Growth of epitaxial (K, Na)NbO3 films with various orientations by hydrothermalmethod and their properties, Jpn. J. Appl. Puys., Vol. 58, pp. SLLB14, Sept. 2019.
• P.S. Sankara Rama Krishnan, Anna N. Morozovska, Eugene A. Eliseev, Shota Ogawa, Atsuo Katagiri, Masaaki Matsushima, Kensuke Akiyama, Hiroshi Uchida, Hiroshi Funakubo. Kinetics of Interfacial Microstructural Variation across Insulator-Thermoelectric Semiconductor interface and its Effects on Thermoelectric Properties of Magnesium Silicide Thin Films, Materialia, Vol. 7, pp. 100340, Sept. 2019.
• Yuta Muto, Takahisa Shiraishi, Yoshiharu Ito, Akinori Tateyama, Hiroshi Uchida, Takanori Kiguchi, Hiroshi Funakubo, Toyohiko J. Konno. Effect of Ta-substitution on the deposition of (K,Na)(Nb,Ta)O3 films by hydrothermal method, Jpn. J. Appl. Phys., Vol. 58, pp. SLLB12, Aug. 2019.
• Yoshiharu ITO, Akinori TATEYAMA, Yoshiko NAKAMURA, Takao SHIMIZU, Minoru KUROSAWA, Hiroshi UCHIDA, Takahisa SHIRAISHI, Takanori KIGUCHI, Toyohiko J. KONNO, Mutsuo ISHIKAWA, Hiroshi FUNAKUBO. Deposition of orientation-controlled thick (K, Na)NbO3 films on metal substrates by repeated hydrothermal deposition technique, Journal of the Ceramic Society of Japan, Vol. 127, No. 7, pp. 478-484, July 2019.
• Takahisa SHIRAISHI, Yuta MUTO, Yoshiharu ITO, Akinori TATEYAMA, Hiroshi UCHIDA, Takanori KIGUCHI, Minoru K. KUROSAWA, Hiroshi FUNAKUBO, Toyohiko. J. KONNO. Low-temperature deposition of Li substituted (K,Na)NbO3 films by a hydrothermal method and their structural and ferroelectric properties, Journal of the Ceramic Society of Japan, Vol. 127, No. 6, pp. 388-393, June 2019.
• Akinori Tateyama, Yoshiharu Ito, Yoshiko Nakamura, Takao Shimizu, Yuichiro Orino, Minoru Kurosawa, Hiroshi Uchida, Takahisa Shiraishi, Takanori Kiguchi, Toyohiko J. Konno, Nobuhiro Kumada, Hiroshi Funakubo. Effects of starting materials on the deposition behavior of hydrothermally synthesized {100}c -oriented epitaxial (K,Na)NbO3 thick films and their ferroelectric and piezoelectric properties, J. Crystal Growth, Vol. 511, pp. 1-7, Apr. 2019.
• Mutsuo Uehara, Atsuo Katagiri, Mao Kurokawa, Kensuke Akiyama, Takao Shimizu, Masaaki Matsushima, Hiroshi Uchida, Yoshisato Kimura, Hiroshi Funakubo. Preparation of CaMgSi and Ca7Mg7.25Si14 single phase films and their thermoelectric properties, MRS Adv., Vol. 4, No. 25-26, pp. 1503-1508, Feb. 2019.
• Taisei Suzuki, Takao Shimizu, Takanori Mimura, Hiroshi Uchida, Hiroshi Funakubo. Epitaxial ferroelectric Y-doped HfO2 film grown by the RF magnetron sputtering, Jpn. J. Appl. Phys., Vol. 57, pp. 11UF15-1-4, Oct. 2018.
• Takahisa SHIRAISHI, Noriyuki KANEKO, Minoru K. KUROSAWA, Hiroshi UCHIDA, Hiroshi FUNAKUBO. Hydrothermal Deposition of KNbO3 Films on Metal Substrates having Three-Dimensional Structure, J. Jpn. Soc. Powder Powder Metallurgy, Vol. 65, No. 10, pp. 673-677, Oct. 2018.
• Shuhei Nakayama, Hiroshi Funakubo, Hiroshi Uchida. Crystallization behavior and ferroelectric property of HfO2–ZrO2 films fabricated by chemical solution deposition, Jpn. J. Appl. Phys., Vol. 57, pp. 11UF06-1-5, Sept. 2018.
• Takanori Mimura, Takao Shimizu, Hiroshi Uchida, Osami Sakata, Hiroshi Funakubo. Thickness-dependent crystal structure and electric properties of epitaxial ferroelectric Y2O3-HfO2 films, Appl. Phys. Lett., Vol. 113, pp. 102901-1-4, Sept. 2018.
• Takahisa Shiraishi, Sujin Choi, Takanori Kiguchi, Takao Shimizu, Hiroshi Uchida, Hiroshi Funakubo, Toyohiko J. Konno. Fabrication of ferroelectric Fe doped HfO2 epitaxial thin films by ion-beam sputtering method and their characterization, Jpn. J. Appl. Phys., Vol. 57, pp. 11UF02, Aug. 2018.
• Tomoya Sato, Daichi Ichinose, Naoya Oshima, Takanori Mimura, Yuichi Nemoto, Takao Shimizu, Yasuhiko Imai, Hiroshi Uchida, Osami Sakata, Hiroshi Funakubo. Time response demonstration of in-situ lattice deformation under an applied electric field using synchrotron-based time-resolved XRD in polar-axis-oriented epitaxial Pb(Zr,Ti)O3 film, Jpn. J. Appl. Phys., Vol. 57, pp. 0902B8-1-5, June 2018.
• Hiroshi Uchida, Noriyuki Kaneko, Shintaro Yasui, Hiroshi Funakubo. Solid-solution Thin Films of Ternary BaTiO₃-Bi(Mg_1/2Ti_1/2)O₃-BiFeO₃ System Epitaxially Grown on SrRuO₃//SrTiO₃ Substrates via Chemical Solution Process, Japanese Journal of Applied Physics, vol. 57, pp. 0902B5, June 2018.
• Takahisa Shiraishi, Yoshiharu. Ito, Mutsuo Ishikawa, Hiroshi Uchida, Takanori Kiguchi, Minoru K. Kurosawa, Hiroshi Funakubo, Toyohiko. J. Konno. Preparation of {001}c-oriented epitaxial (K, Na)NbO3 thick films by repeated hydrothermal deposition technique, J. Ceram. Soc. Jpn., vol. 126, no. 5, pp. 281-285, May 2018.
• Mao Kurokawa, Takao Shimizu, Mutsuo Uehara, Atsuo Katagiri, Kensuke Akiyama, Masaaki Matsushima, Hiroshi Uchida, Yoshisato Kimura, Hiroshi Funakubo. Control of p- and n-type Conduction in Thermoelectric Non-doped Mg2Si Thin Films Prepared by Sputtering Method, MRS Advances, vol. 3, no. 24, pp. 1355-1359, Feb. 2018.
• Takahisa Shiraishi, Kiliha Katayama, Tatsuhiko Yokouchi, Takao Shimizu, Takahiro Oikawa, Osami Sakata, Hiroshi Uchida, Yasuhiko Imai, Takanori Kiguchi, Toyohiko J. Konno, Hiroshi Funakubo. Effect of the film thickness on the crystal structure and ferroelectric properties of (Hf0.5Zr0.5)O2 thin films deposited on various substrates, Materials Science in Semiconductor Processing, vol. 70, pp. 239–245, Nov. 2017.
• Naoya Oshima, Kiyoshi Uchiyama, Yoshitaka Ehara, Takahiro Oikawa, Hiroki Tanaka, Tomoya Sato, Hiroshi Uchida, Tomoaki Yamada, Hiroshi Funakubo. Influence of Internal Strains of (110)-One-Axis-Oriented (Ba0.5Sr0.5)TiO3 (BST) Thin Films on Their Dielectric Behaviors, Science of Advanced Materials, vol. 9, pp. 1806–1809, Oct. 2017.
• Takahisa Shiraishi, Mutsuo Ishikawa, Hiroshi Uchida, Takanori Kiguchi, Minoru K. Kurosawa, Hiroshi Funakubo, Toyohiko. J. Konno. Characterization of (111)-oriented epitaxial (K0.5Na0.5)NbO3 thick films deposited by hydrothermal method, Jpn. J. appl. Phys., vol. 56, pp. 10PF04-1-5, Sept. 2017.
• Naoya Oshima, Kiyoshi Uchiyama, Yoshitaka Ehara, Takahiro Oikawa, Daichi Ichinose, Hiroki Tanaka, Tomoya Sato, Hiroshi Uchida, Hiroshi Funakubo. Fabrication and Characterization of {110}-oriented Pb(Zr,Ti)O3 Thin Films on Pt/SiO2/Si substrates using PdO//Pd Buffer Layer, Jpn. J. Appl. Phys., vol. 56, pp. 10PF09-1-4, Sept. 2017.
• Hiroshi Uchida, Daichi Ichinose, Takahisa Shiraishi, Hiromi Shima, Takanori Kiguchi, Akihiko Akama, Ken Nishida, Toyohiko J. Konno, Hiroshi Funakubo. Polarization switching behavior of one-axis-oriented lead zirconate titanate films fabricated on metal oxide nanosheet layer, Jpn. J. Appl. Phys., vol. 56, pp. 10PF10-1-5, Sept. 2017.
• Chihoko Abe, Syuhei Nakayama, Marina Shiokawa, Hiroaki Kawashima, Kiliha Katayama, Takahisa Shiraishi, Takao Shimizu, Hiroshi Funakubo, Hiroshi Uchida. Crystal structure and dielectric / ferroelectric properties of CSD-derived HfO2-ZrO2 solid solution films, Ceramic International, vol. 43, pp. S501–S505, Aug. 2017.
• Hiroaki Fukushima, Hiroshi Uchida, Hiroshi Funakubo, Takashi Katoda, Ken Nishida. Evaluation of oxygen vacancies in ZnO single crystals and powders by micro-Raman spectroscopy, Journal of the Ceramic Society of Japan, vol. 125, no. 6, pp. 445-448, June 2017.
• Mao Kurokawa, Mutsuo Uehara, Daichi Ichinose, Takao Shimizu, Kensuke Akiyama, Masaaki Matsushima, Hiroshi Uchida, Yoshisato Kimura, Hiroshi Funakubo. Preparation of preferentially (111)-oriented Mg2Si thin films on (001)Al2O3 and (100)CaF2 substrates and their thermoelectric properties, Japanese Journal of Applied Physics, vol. 56, pp. 05DC02-1-4, Mar. 2017.
• Kiliha Katayama, Takao Shimizu, Osami Sakata, Takahisa Shiraishi, Syogo Nakamura, Takanori Kiguchi, Akihiro Akama, Toyohiko J. Konno, Hiroshi Uchida, Hiroshi Funakubo. Growth of (111)-oriented epitaxial and textured ferroelectric Y-doped HfO2 films for downscaled devices, Appl. Phys. Lett., vol. 109, pp. 112901-1-5, Sept. 2016.
• Hiroshi Uchida, Tomotake Oi, Keito Noguchi, Shota Moki, Jin Woon Kim, Hiromi Shima, Ken Nishida, Takanori Kiguchi, Akihiko Akama, Toyohiko J. Konno, Hiroshi Funakubo. Orientation control of barium titanate films using metal oxide nanosheet layer, Japanese Journal of Applied Physics, vol. 55, pp. 10TA15-1-7, Sept. 2016.
• Yuichi Nemoto, Daichi Ichinose, Takao Shimizu, Hiroshi Uchida, Wakiko Yamaoka, Yusuke Sato, Hiroshi Funakubo. Growth of epitaxial tetragonal (Bi,K)TiO3 films and their ferroelectric and piezoelectric properties, Jpn. J. Appl. Phys., vol. 55, pp. 10TA13, Sept. 2016.
• Hiroaki Fukushima, Daichi Ichinose, Hiroshi Funakubo, Hiroshi Uchida, Hiromi Shima, Ken Nishida. Angular dependence of Raman spectrum for Pb(Zr,Ti)O3 epitaxial films, Jpn. J. Appl. Phys., vol. 55, pp. 10TC07-1-5, Sept. 2016.
• Takanori Mimura, Kiliha Katayama, Takao Shimizu, Hiroshi Uchida, Takanori Kiguchi, Akihiro Akama, Toyohiko J. Konno, Osami Sakata, Hiroshi Funakubo. Formation of (111) orientation-controlled ferroelectric orthorhombic HfO2 thin films from solid phase via annealing, Appl. Phys. Lett., vol. 109, pp. 052903-1-4, Aug. 2016.
• Takahisa Shiraishi, Kiliha Katayama, Tatsuhiko Yokouchi, Takao Shimizu, Takahiro Oikawa, Osami Sakata, Hiroshi Uchida, Yasuhiko Imai, Takanori Kiguchi, Toyohiko J. Konno, Hiroshi Funakubo. Impact of mechanical stress on ferroelectricity in (Hf0.5Zr0.5)O2 thin films, Appl. Phys. Lett., vol. 108, pp. 262904-1-5, June 2016.
• Kiliha Katayama, Takao Shimizu, Osami Sakata, Takahisa Shiraishi, Shogo Nakamura, Takanori Kiguci, Akihiro Akama, Toyohiko J. Kono, Hiroshi Uchida, Hiroshi Funakubo. Orientation control and domain structure analysis of {100}-oriented epitaxial ferroelectric orthorhombic HfO2-based thin films, J. Appl. Phys., vol. 119, pp. 134101-1-7, Apr. 2016.
• Mutsuo Uehara, Kensuke Akiyama, Takao Shimizu, Masaaki Matsushima, Hiroshi Uchida, Yoshisato Kimura, Hiroshi Funakubo. Preparation of Ca–Si Films on (001) Al2O3 Substrates by an RF Magnetron Sputtering Method and Their Electrical Properties, Journal of Electronic Materials, Vol. 45, No. 6, pp. 3121-3126, Mar. 2016.
• Junichi Kimura, Itaru Takuwa, Masaaki Matsushima, Takao Shimizu, Hiroshi Uchida, Takanori Kiguchi, Takahisa Shiraishi, Toyohiko J. Konno, Tatsuo Shibata, Minoru Osada, Takayoshi Sasaki, Hiroshi Funakubo. Thermally stable dielectric responses in uniaxially (001)-oriented CaBi4Ti4O15 nanofilms grown on a Ca2Nb3O10- nanosheet seed layer, Sci. Rep., Vol. 6, pp. 20713-1-9, Feb. 2016.
• Naoya Oshima, Kiyoshi Uchiyama, Yoshitaka Ehara, Takahiro Oikawa, Hiroki Tanaka, Tomoya Sato, Hiroshi Uchida, Tomoaki Yamada, Hiroshi Funakubo. Fabrication and Characterization of (110)-oriented (Ba0.5,Sr0.5)TiO3 (BST) Thin Films using PdO//Pd Buffer Layer, Jpn. J. Appl. Phys., Vol. 54, pp. 10NA15-1-4, Sept. 2015.
• Takahisa Shiraishi, Noriyuki Kaneko, Minoru Kurosawa, Hiroshi Uchida, Yasuhiro Suzuki, Takeshi Kobayashi, Hiroshi Funakubo. Vibration Energy Harvesting Properties of Hydrothermally Synthesized (K, Na)NbO3 Films Deposited on Flexible Metal Foil Substrates, Jpn. J. Appl. Phys., Vol. 54, pp. 10ND06-1-6, Sept. 2015.
• Yoshiki Minemura, Daichi Ichinose, Kohei Nagasaka, Jin Woon Kim, Hiromi Shima, Ken Nishida, Takanori Kiguchi, Toyohiko J. Konno, Naoya Oshima, Hiroshi Funakubo, Hiroshi Uchida. Polar-axis-oriented crystal growth of tetragonal PZT films on stainless steel substrate using pseudo-perovskite nanosheet buffer layer, AIP Advances, Vol. 5, pp. 077139-1-8, July 2015.
• Kohei Nagasaka, Naoya Oshima, Jin Woong Kim, Hiromi Shima, Akihiro Akama, Takanori Kiguchi, Ken Nishida, Toyohiko J. Konno, Hiroshi Funakubo, Hiroshi Uchida. Fabrication of (100)c-oriented Mn-doped bismuth ferrite films on silicon and stainless steel substrates using calcium niobate nanosheets, J. Ceram. Soc. Jpn., Vol. 123, No. 5, pp. 322-328, May 2015.
• Takahisa Shiraishi, Noriyuki Kaneko, Ishikawa Mutsuo, Minoru Kurosawa, Hiroshi Uchida, Hiroshi Funakubo. Ferroelectric and piezoelectric properties of KNbO3 films deposited on flexible organic substrate by hydrothermal method, Jpn. J. Appl. Phys., Vol. 53, pp. 09PA10-1-4, Sept. 2014.
• Junichi Kimura, Chentir Mohamed-Tahar, Takao Shimizu, Hiroshi Uchida, Hiroshi Funakubo. Lead- and alkaline-metal-free BaTiO3 - Bi(Mg0.5Ti0.5)O3 - BiFeO3 solid solution thin films with high dielectric constant prepared on Si substrates by solution-based method., Jpn. J. Appl. Phys., Vol. 53, pp. 09PA12-1-6, 2014.
• Shota Moki, Junichi Kimura, Noriyuki Kaneko, Hiroshi Funakubo, Hiroshi Uchida. Structural and dielectric properties of BaTiO3–Bi(Mg1/2Ti1/2)O3 thin films fabricated by chemical solution deposition, Jpn. J. Appl. Phys., Vol. 53, pp. 09PA11-1-5, 2014.
• Yohta Kondoh, Shota Ogawa, Junichi Kimura, Takanori Kiguchi, Toyohiko J. Konno, Hiroshi Funakubo, Hiroshi Uchida. Dielectric property of (001) one-axis oriented CaBi4Ti4O15-based thin films and their temperature dependence, J. Ceram. Soc. Jpn., Vol. 122, No. 6, pp. 477-482, 2014.
• Shota Ogawa, Atsuo Katagiri, Takao Shimizu, Masaaki Matsushima, Kensuke Akiyama, Yoshisato Kimura, Hiroshi Uchida, Hiroshi Funakubo. Electrical Properties of (110)-Oriented Nondoped Mg2Si Films with p-Type Conduction Prepared by RF Magnetron Sputtering Method, J. Electronic Mater., Vol. 43, No. 6, pp. 2269-2273, 2014.
• Takahisa Shiraishi, Noriyuki Kaneko, Minoru Kurosawa, Hiroshi Uchida, Taisei Hirayama, Hiroshi Funakubo. Effects of heat treatment on electrical and electromechanical properties of hydrothermally synthesized epitaxial (K0.51Na0.49)NbO3 films, Jpn. J. Appl. Phys., Vol. 53, pp. 05FE02-1-6, 2014.
• Y. Minemura, Y.Kondoh, H.Funakubo, H.Uchida. One-axis-oriented crystal growth of lead zirconate thin films on metal substrates using perovskite-type oxide nanosheet layer, Key Eng. Mater., Vol. 582, pp. 15-18, 2014.
• Takahisa Shiraishi, Noriyuki Kaneko, Hiro Einishi, Takao Shimizu, Minoru Kurosawa, Hiroshi Uchida, Takeshi Kobayashi, Takanori Kiguchi, Toyohiko J. Konno, Hiroshi Funakubo. Crystal Structure Analysis of Hydrothermally-synthesized Epitaxial (KxNa1-x)NbO3 Film, Jpn. J. Appl. Phys., Vol. 52, pp. 09KA11-1-5, 2013.
• Takahisa Shiraishi, Hiro Einishi, Shintaro Yasui, Hiroshi Funakubo, Tomohito Hasegawa, Minoru Kurosawa, Mutsuo Ishikawa, Hiroshi Uchida. Ferroelectric and Piezoelectric Properties of (K, Na)NbO3 Thick Films Prepared on Metal Substrates by Hydrothermal Method, J. Korean Phys. Soc., Vol. 62, No. 7, pp. 1055-1059, 2013.
• Mari Hayashi, Shintaro Yasui, Hiroshi Funakubo, Hiroshi Uchida. Fabrication of BiFeO3-Bi(Zn1/2Ti1/2)O3 Solid Solution Thin Films Using Perovskite-Type Oxide Interface Layer, Key. Eng. Mater.; Electroceramics in Japan XV, Vol. 566, pp. 163-166, 2013.
• Yoshiki Minemura, Kohei Nagasaka, Takanori Kiguchi, Toyohiko J. Konno, Hiroshi Funakubo, Hiroshi Uchida. Fabrication and Evaluation of One-Axis Oriented Lead Zirconate Titanate Films Using Metal–Oxide Nanosheet Interface Layer, Jpn. J. Appl. Phys., Vol. 52, pp. 09KA04-1-7, 2013.
• Shota Ogawa, Yohta Kondoh, Junichi Kimura, Hiroshi Funakubo, Hiroshi Uchida. Dielectric Property of Silicate-Doped CaBi4Ti4O15 Thin Films, Jpn. J. App. Phys., Vol. 51, pp. 09LA16-1-5, 2012.
• Minoru Noda, Shuhei Nomura, Hiroshi Uchida, Kaoru Yamashita, Hiroshi Funakubo. A New SrBi4Ti4O15/CaBi4Ti4O15 Thin Film Capacitor for Excellent Electric, Transactions on Ultrasonics, Ferroelectrics, and Frequency Control, Vol. 59, No. 9, pp. 1888, 2012.
• Hiroshi Uchida, Keiko Sakurai, Isao Okada, Hirofuni Matsuda, Takashi Iijima, Takashi Kojima, Takayuki Watanabe, Hiroshi Funakubo. Electrical Properties of (Ca, Sr)Bi4Ti4O15 Thin Films Fabricated Using a Chemical Solution Deposition Method, Jpn. J. Appl. Phys., Vol. 42, Part 1, No. 9B, pp. 5990-5993, 2003.

International Conference (Reviewed)

• Mao Kurokawa, Mutsuo Uehara, Daichi Ichinose, Takao Shimizu, Kensuke Akiyama, Masaaki Matsushima, Hiroshi Uchida, Yoshisato Kimura, Atsuo Katagiri, Hiroshi Funakubo. Control of P-Type and N-Type Conduction in Thermoelectric Mg2Si Thin Films Prepared by Sputtering Method, 2017 MRS Fall Meeting, Nov. 2017.
• Hiroshi Uchida, Daichi Ichinose, Hiromi Shima, Takahisa Shiraishi, Takanori Kiguchi, Akihiro Akama, Ken Nishida, Toyohiko J. Konno, Hiroshi Funakubo. Ferroelectric property of one-axis-oriented lead zirconate titanate films under different in-plane stress conditions, ICE2017(8th International Conference on Electroceramics), May 2017.
• Hiroshi Funakubo, Takahisa Shiraishi, Tatsuhiko Yokouchi, Takahiro Oikawa, Hiroshi Uchida. Effect of Stress on Ferroelectricity of (Hf0.5Zr0.5)O2 Thin Films, 2015 MRS Fall Meeting & Exhbit, Nov. 2015.
• H.Funakubo, T.Shiraishi, T.Shimizu, T.Yokouchi, T.Oikawa, H.Uchida. Effect of Stress on Ferroelectricity of (Hf0.5Zr0.5)O2 Thin Films, SSDM 2015, Sept. 2015.
• S. Yasui, J. Nagata, H. Morioka, H. Uchida, M. K. Kurosawa, H. Funakubo. Design of large piezoelectricity in novel piezoelectric thin films using high-pressure synthesis phase materials, Material Research Society 2011 fall meeting, MRS 2011, Proc. Material Research Society 2011 fall meeting, MRS 2011, Nov. 2011.

International Conference (Not reviewed / Unknown)

• Hiroshi Uchida, Masaki Okura, Yoshiharu Ito, Takahisa Shiraishi, Takanori Kiguchi, Toyohiko J. Konno, Hiroshi Funakubo. Rapid and Low-Temperature Processing for Deposition of (K,Na)NbO3 Thick Films Using Microwave-Assisted Hydrothermal Reaction, MRM 2021 (Materials Research Meeting 2021),, Dec. 2021.
• Ryohei Okamoto, Hiroshi Funakubo, Hiroshi Uchida. Phase Transition Behavior and Ferroelectric Property of Chemical Solution Deposition-Derived HfO2-ZrO2 Thin Films, MRM 2021 (Materials Research Meeting 2021), Dec. 2021.
• Masaki Okura, Takahisa Shiraishi, Yoshiharu Ito, Takanori Kiguchi, Minoru Kurosawa, Toyohiko J. Konno, Hiroshi Funakubo, Hiroshi Uchida. Low-temperature deposition of potassium niobate films by microwave-assisted hydrothermal process, PACRIM13 (The 13th Pacific Rim Conference of Ceramic Societies), Oct. 2019.
• Takahisa Shiraishi, Yoshiharu Ito, Akinori Tateyama, Takanori Kiguchi, Hiroshi Uchida, Hiroshi Funakubo, Toyohiko. J. Konno. Hydrothermal deposition of epitaxial (K,Na,Li)(Nb,Ta)O3 films, PACRIM13 (The 13th Pacific Rim Conference of Ceramic Societies), Oct. 2019.
• A. Katagiri, M. Uehara, T. Shimizu, M. Matsushima, K. Akiyama, H. Uchida, Y. Kimura, H. Funakubo. Preparation of Mg2Si-based thin films and these properties, APAC-SILICIDE 2019 (The Fifth Asia-Pacific Conference on Semiconducting Silicides and Related Materials), July 2019.
• Akinori Tateyama, Yoshiharu Ito, Yoshiko Nakamura, Takao Shimizu, Yuichiro Orino, Minoru Kurosawa, Hiroshi Uchida, Takahisa Shiraishi, Takanori Kiguchi, Toyohiko Konno, Nobuhiro Kumada, Takeshi Yoshimura, Hiroshi Funakubo. Characterization of Piezoelectric Coefficient E31, F for {100}-Oriented (K, Na)NbO3 Films Prepared by Hydrothermal Method, F2cπ2 2019 (Joint ISAF-ICE-EMF-IWPM-PFM meeting 2019), July 2019.
• Hiroshi Funakubo, Naoya Oshima, Hidehisa Inoue, Yoshitaka Ehara, Takao Shimizu, Hiroshi Uchida. Enhancement of piezoelectric response in {100}-oriented films using extrinsic contribution, GFMAT-2/Bio-4 (2nd Global Forum on Advanced Materials and Technologies for Sustainable Development / 4th International Conference on Innovations in Biomaterials, Biomanufacturing, and Biotechnologies), July 2019.
• Hiroshi Funakubo, Naoya Ohshima, Hidehisa Inoue, Yoshitaka Ehara, Takao Shimizu, Hiroshi Uchida. Crystal Structure Change with Applying an Electric Filed in Pb(Zr, Ti)O3 Films for MEMS Applications, F2cπ2 2019 (Joint ISAF-ICE-EMF-IWPM-PFM meeting 2019), July 2019.
• H. Funakubo, N. Oshima, H. Inoue, Y. Ehara, T. Shimizu, H. Uchida. Enhancement of Piezoelectric Response in (100) -oriented Films using Extrinsic Contribution, 2019 IWATMD (2019 International Workshop on Acoustic Transduction Materials and Devices), May 2019.
• S. Nakayama, H. Funakubo, H. Uchida. Ferroelectric HfO2 thin films with abundant dopants, EMA 2019 (Electronic Materials and Applications 2019), Jan. 2019.
• K. Murase, T. Shiraishi, T. Kiguchi, T. J. Konno, H. Funakubo, H. Uchida. Preferential crystal growth of BaTiO3 thick film using nanosheet templates interface layer, EMA 2019 (Electronic Materials and Applications 2019), Jan. 2019.
• Hiroshi Funakubo, Mutsuo Uehara, Mao Kurokawa, Atsuo Katagiri, Kensuke Akiyama, Takao Shimizu, Masaaki Matsusima, Hiroshi Uchida, Yoshisato Kimura. Composition Dependency of Thermoelectric Properties in Ca-Mg-Si System Using Thin Films Prepared by RF Magnetron Sputtering Method, 2018 MRS Fall Meeting, Nov. 2018.
• Hiroshi Funakubo, Akinori Tateyama, Yoshiharu Ito, Yoshiko Nakamura, Takao Shimizu, Yuichiro Orino, Minoru Kurosawa, Hiroshi Uchida, Takahisa Shiraishi, Takanori Kiguchi, Toyohiko Konno, Nobuhiro Kumada. Growth of Orientation-Controlled (K,Na)NbO3 Thick Films at 240oC by Hydrothermal Method and Their Piezoelectric Applications, 2018 MRS Fall Meeting, Nov. 2018.
• Hiroshi Funakubo, Akinori Tateyama, Yoshiharu Ito, Takao Shimizu, Yoshiko Nakamura, Minoru Kurosawa, Hiroshi Uchida, Takanori Kiguchi, Takahisa Shiraishi, Toyohiko J. Konno, Mutsuo Ishikawa. Preparation of Orientation-controlled (K, Na)NbO3 Thick Films by Hydrothermal Method and Their Properties, The 10th China-Japan Symposium on Ferroelectric Materials and Their Applications, Sept. 2018.
• Yoshiharu Ito, Akinori Tateyama, Yoshiko Nakamura, Takao Shimizu, Minoru Kurosawa, Hiroshi Funakubo, Hiroshi Uchida, Takahisa Shiraishi, Takanori Kiguchi, Toyohiko J Konno, Nobuhiro Kumada, Mutsuo Ishikawa. Growth of orientation-controlled epitaxial (K, Na)NbO3 films and their ferroelectric and piezoelectric properties, IWPMA2018 (International Workshop on Piezoelectric Materials and Applications in Actuators), Sept. 2018.
• Taisei Suzkuki, Takanori Mimura, Takao Shimizu, Hiroshi Uchida, Hiroshi Funakubo. Growth of epitaxial Y2O3-doped ferroelectric HfO2 films by sputtering method and their characterization, SSDM 2018 (2018 International Conference on Solid State Devices and Materials), Sept. 2018.
• S. Nakayama, H. Funakubo, H. Uchida. Phase transition and ferroelectric property of Ca doped HfO2 thin films, 12th Japan-Korea Conference on Ferroelectrics, Aug. 2018.
• Miyu Hasegawa, Takao Shimizu, Yusuke Sato, Wakiko Yamaoka, Mirai Ishida, Hiroshi Uchida, Hiroshi Funakubo. Fabrication and evaluation of (Bi, Na)TiO3-BaTiO3 based thin film by using PLD method, 12th Japan-Korea Conference on Ferroelectrics, Aug. 2018.
• Hiroshi Funakubo, Mutsuo Uehara, Mao Kurokawa, Atsuo Katagiri, Kensuke Akiyama, Takao Shimizu, Masaaki Matsusima, Hiroshi Uchida, Yoshisato Kimura. Growth of Mg-Ca-Si thick flms by RF sputtering method and their thermoelectric property, ICT 2018 (2018 International and European Conference on Thermoelectrics), July 2018.
• K. Murase, T. Shiraishi, T. Kiguchi, A. Akama, T. J. Konno, H. Funakubo, H. Uchida. Fabrication of Orientation-Controlled BaTiO3 Thick Films by Chemical Solution Deposition Using Nanosheet Interface Layer, IFAAP 2018 (2018 ISAF-FMA-AMF-AMEC-PFM Joint Conference), May 2018.
• A. Tateyama, Y. Ito, Y. Nakamura, T. Shimizu, Y. Orino, M. Kurosawa, H. Uchida, T. Shiraishi, T. Kiguchi, T.J. Konno, N. Kumada, H. Funakubo. Effect of Starting Material on the Deposition Behavior and Their Film Properties in Orientation-Controlled (K,Na)NbO3 Thick Films Prepared by Hydrothermal Method, IFAAP 2018 (2018 ISAF-FMA-AMF-AMEC-PFM Joint Conference), May 2018.
• S. Nakayama, H. Funakubo, H. Uchida. Crystallization Behavior and Ferroelectric Property of HfO2-ZrO2 Films Fabricated by Chemical Solution Deposition, IFAAP 2018 (2018 ISAF-FMA-AMF-AMEC-PFM Joint Conference), May 2018.
• Shintaro Yasui, Hiroshi Uchida, Hiroshi Funakubo. Novel Bi-based perovskite piezoelectric materials as an alternative to PZT, 2018 PiezoMEMS Workshop, Jan. 2018.
• Y. Ito, A. Tateyama, Y. Nakamura, T. Shimizu, M. Kurosawa, H. Funakubo, H. Uchida, T. Shiraishi, T. Kiguchi, T. J. Konno, M. Ishikawa. Growth of orientation-controlled epitaxial (K, Na)NbO3 thick films and their ferroelectric and piezoelectric properties, 2018 PiezoMEMS Workshop, Jan. 2018.
• Hiroshi Funakubo, Yoshiharu Ito, Takao Shimizu, Yoshiko Nakamura, Minoru Kurosawa, Hiroshi Uchida, Takanori Kiguchi, Takahisa Shiraishi, Toyohiko J. Konno, Mutsuo Ishikawa. Preparation of Orientation-controlled (K, Na)NbO3 Thick Films by Hydrothermal Method and Their Properties, 18th US-Japan Seminar on Dielectric and Piezoelectric Materials, Nov. 2017.
• Tomoya Sato, Daichi Ichinose, Naoya Oshima, Takanori Mimura, Yuichi Nemoto, Takao Shimizu, Yasuhiko Imai, Hiroshi Uchida, Osami Sakata, Hiroshi Funakubo. Time Response of Crystal Structure in Tetragonal Pb(Zr,Ti)O3 Films Under an Applied Electric Field, STAC-10 (The Tenth International Conference on the Science and Technology for Advanced Ceramics), Aug. 2017.
• Hiroshi Uchida, Syuhei Nakayama, Hiroaki Kawashima, Takahisa Shiraishi, Takao Shimizu, Hiroshi Funakubo. Chemical Solution Deposition of Hafnia-Zirconia Ultrathin Films for Ferroelectric Capacitor, AMEC 2016 (The 10th Asian Meeting on Electroceramics), Dec. 2016.
• Hiroshi Funakubo, Takanori Mimura, Takao Shimizu, Kiliha Katayama, Hiroshi Uchida, Takanori Kiguchi, Akihiro Akama, Toyohiko Konno, Osami Sakata. Orientation Controlled HfO2-Based Ferroelectric Films Prepared by Solid Phase Local Epitaxial Technique for High Density Memory Applications, 2016 MRS Fall Meeting & Exhibit, Nov. 2016.
• H. Funakubo, J. Kimura, I. Takuwa, M. Matsushima, T. Shimizu, H. Uchida. High temperature dielectric properties of orientation controlled bismuth layer-structured dielectric films, JCFMA8, Sept. 2016.
• H. Uchida, S. Moki, K. Murase, J. Kimura, H. Funakubo. Solid solution films in BaTiO3-Bi(Mg1/2Ti1/2)O3 system with stable temperature coefficient of capacitance, JCFMA8 (The 8th Japan-China Symposium on Ferroelectric Materials and Their Applications), Sept. 2016.
• Mao Kurokawa, Mutsuo Uehara, Daichi Ichinose, Takao Shimizu, Kensuke Akiyama, Masaaki Matsushima, Hiroshi Uchida, Yoshisato Kimura, Hiroshi Funakubo. Preparation of Mg2Si Thin Films on Various Kinds of Substrates and their Thermoelectric Properties, APAC-SILICIDE 2016 (Asia-Pacific Conference on Semiconducting Silicides and Related Materials), July 2016.
• Hiroshi Funakubo, Takanori Mimura, Kiriha Katayama, Takao Shimizu, Hiroshi Uchida, Takanori Kiguchi, Akihiro Akama, Toyohiko Konno, Osami Sakata. Growth of Orientation-Controlled Ferroelectric HfO2 Thin Films for Next Generation Ferroelectric Devices, ISCSI-Ⅶ/ISTDM 2016, June 2016.
• H. Fukushima, H. Oka, H. Funakubo, H. Uchida, H. Moriwake, H. Shima, K. Nishida. Probing of Oxygen Vacancies in BaTiO3 Powder and Single Crystal by Micro-Raman Scattering, MDA 2016 (1st International Conference on Materials Design and Applisations), June 2016.
• Takanori Mimura, Kiriha Katayama, Takao Shimizu, Hiroshi Uchida, Takanori Kiguchi, Akihiro Akama, Toyohiko J. Konno, Osami Sakata, Hiroshi Funakubo. Growth of orientation-controlled ferroelectric HfO2 thin films by solid phase crystallization and their characterization, 2016 Joint RCBJSF-IWRF Conference, June 2016.
• T. Shiraishi, M. Kurosawa, H. Uchida, Y. Suzuki, T. Kobayashi, H. Funakubo, T. J. Konno. Fabrication of Flexible Piezoelectric Devices using Hydrothermal Method, SMS 2016 (Summit of Materials Science, 100th Anniversary of Institute for Materials Research), May 2016.
• H. Funakubo, J. Kimura, I. Takuwa, M. Matsushima, T. Shimizu, H. Uchida, T. Shibata, M. Osada, T. Sasaki. High temperature dielectric properties of c-axis oriented bismuth layer-structured dielectric films prepared on Si and Glass substrates using nanosheets buffer layer, EMA 2016, Jan. 2016.
• M. Uehara, M. Kurokawa, K. Akiyama, T. Shimizu, M. Matsushima, H. Uchida, Y. Kimura, H. Funakubo. Thermoelectric characterization of sputtered Ca-Mg-Si films, EMA 2016, Jan. 2016.
• Takahisa Shiraishi, Hiro Einishi, Minoru Kurosawa, Hiroshi Uchida, Nobuhiro Kumada, Takanori Kiguchi, Hiroshi Funakubo. Low Temperature Deposition of Epitaxial (K,Na)NbO3 Films using Hydrothermal Method, EMN 3CG 2015, Dec. 2015.
• Kiliha Katayama, Takao Shimizu, Osami Sakata, Takanori Kiguchi, Akihiro Akama, Toyohiko J. Konno, Syogo Nakamura, Hiroshi Uchida, Hiroshi Funakubo. Growth and Structural Analysis of Epitaxial Orthorhombic YO1.5-HfO2 Thin Films, 17th US-Japan Seminar on Dielectric and Piezoelectric Ceramics, Nov. 2015.
• Hiroshi Uchida, Kohei Nagasaka, Jin Woong Kim, Hiromi Shima, Akihiro Akama, Takanori Kiguchi, Ken Nishida, Toyohiko J. Konno, Hiroshi Funakubo. Preferential Crystal Growth of BiFeO3-Based Thin Films Using Metal-Oxide Nanosheet Templates, 17th US-Japan Seminar on Dielectric and Piezoelectric Ceramics, Nov. 2015.
• Takao Shimizu, Kiriha Katayama, Tatsuhiko Yokouchi, Takahiro Oikawa, Takahisa Shiraishi, Takanori Kiguchi, Toyohiko Konno, Hiroshi Uchida, Hiroshi Funakubo. Preparation of Fluorite-Structured Ferroelectric Thin Films and Their Characterization, 015 International Workshop on Dielectric Thin Films for future electron devices-science and technology, Nov. 2015.
• K. Uchiyama, N. Oshima, Y. Ehara, T. Oikawa, H. Tanaka, T. Sato, H. Uchida, T. Yamada, H. Funakubo. Electric Property of {110}-one-axis oriented (Ba0.5Sr0.5)TiO3 (BST) Thin Films Fabricated by RF-magnetron Sputtering Method, IUMRS-ICAM 2015, Oct. 2015.
• K. Katayama, T. Shimizu, O. Sakata, T. Kiguchi, A. Akama, T. J. Konno, S. Nakamura, H. Uchida, H. Funakubo. Growth and structural analysis of epitaxial orthorhombic YO1.5-HfO2 thin films, NIMS Conference 2015, July 2015.
• M. Uehara, K. Akiyama, M. Matsushima, T. Shimizu, H. Uchida, Y. Kimura, H. Funakubo. Phase Identification of Ca-Si Films prepared on (001) Al2O3 Substrates Using X-ray Diffraction Wide Area Reciprocal Space Mapping Method, July 2015.
• Hiroaki FUKUSHIMA, Tomomi KOZU, Hiromi SHIMA, Hiroshi FUNAKUBO, Hiroshi UCHIDA, Takashi KATODA, Ken NISHIDA. Evaluation of Oxygen Vacancy in ZnO Using Raman Spectroscopy, ISAF-ISIF-PFM 2015, May 2015.

Domestic Conference (Not reviewed / Unknown)

• Hiroshi Uchida, 山崎佑介, 横田幸惠, 島宏美, HIROSHI FUNAKUBO. PZT 薄膜の化学溶液堆積における選択的結晶成長と低温結晶化, 第42回電子材料研究討論会, Nov. 2023.
• Hiroshi Uchida, 山崎佑介, 横田幸惠, 島宏美, Takahisa Shiraishi, Takanori Kiguchi, HIROSHI FUNAKUBO. 金属酸化物テンプレート上における化学溶液堆積法由来PZT薄膜の結晶成長機構の解明, 第43回電子材料研究討論会, Nov. 2023.
• 山崎佑介, 横田幸恵, 島宏美, 中村美子, HIROSHI FUNAKUBO, Hiroshi Uchida. ガラス基板上におけるPZT 膜の選択配向成⻑と低温結晶化, 第40回強誘電体会議（FMA40）, May 2023.
• 山崎佑介, 横田幸恵, 島宏美, 中村美子, HIROSHI FUNAKUBO, Hiroshi Uchida. ガラス基板上に作製された一軸配向性PZT薄膜の分極および圧電特性の改善, 第70回応用物理学会春季学術講演会, Mar. 2023.
• 山崎佑介, 横田幸恵, 島宏美, HIROSHI FUNAKUBO, Hiroshi Uchida. ガラス基板上における一軸配向PZT薄膜の組成制御による分極特性の改善, 第83回応用物理学会秋季学術講演会, Sept. 2022.
• 大倉雅貴, Yoshiharu Ito, Takahisa Shiraishi, Takanori Kiguchi, Toyohiko Konno, HIROSHI FUNAKUBO, Hiroshi Uchida. マイクロ波加熱式水熱プロセスにおける(KxNa1-x)NbO3膜および粉体の析出挙動の解析, 第41回電子材料研究討論会, Nov. 2021.
• 大倉雅貴, Yoshiharu Ito, Takahisa Shiraishi, Takanori Kiguchi, Toyohiko Konno, HIROSHI FUNAKUBO, Hiroshi Uchida. マイクロ波加熱式水熱堆積プロセスによるペロブスカイト型ニオブ酸塩配向体の高速成長, 日本セラミックス協会第34回秋季シンポジウム, Sept. 2021.
• Yoshiharu Ito, Akinori Tateyama, Minoru Kuribayashi Kurosawa, Hiroshi Uchida, Takahisa Shiraishi, HIROSHI FUNAKUBO. 水熱合成法 (K, Na)NbO3膜の最適作製条件, 第38回強誘電体会議（FMA 38）, June 2021.
• 大倉雅貴, Yoshiharu Ito, Takahisa Shiraishi, Takanori Kiguchi, Toyohiko Konno, HIROSHI FUNAKUBO, Hiroshi Uchida. マイクロ波加熱式水熱プロセスにおけるニオブ酸カリウム基膜の堆積挙動の解析, 第40回電子材料研究討論会, Nov. 2020.
• 大倉雅貴, Yoshiharu Ito, Takahisa Shiraishi, Takanori Kiguchi, Toyohiko Konno, HIROSHI FUNAKUBO, Hiroshi Uchida. マイクロ波加熱式水熱合成によるニオブ酸カリウム膜堆積のプロセス低温化, 第40回電子材料研究討論会, Nov. 2020.
• Takahisa Shiraishi, 佐野真太郎, Yoshiharu Ito, Akinori Tateyama, Hiroshi Uchida, Takanori Kiguchi, HIROSHI FUNAKUBO, Toyohiko Konno. 水熱法により作製した(K,Na)NbO3基膜の結晶構造および電気特性の評価, 第40回電子材料研究討論会, Nov. 2020.
• Atsuo Katagiri, Mutsuo Uehara, Mao Kurokawa, Kensuke Akiyama, masaaki matsushima, Hiroshi Uchida, YOSHISATO KIMURA, HIROSHI FUNAKUBO. Ca- Mg-Si三元系熱電材料におけるSi含有量変化に伴う導電型の制御, 第81回応用物理学会秋季学術講演会, Sept. 2020.
• 大倉雅貴, Yoshiharu Ito, Takahisa Shiraishi, Takanori Kiguchi, Toyohiko Konno, HIROSHI FUNAKUBO, Hiroshi Uchida. マイクロ波加熱式水熱合成プロセスによるニオブ酸カリウム基厚膜の高速堆積, 第37回強誘電体会議（FMA 37）, May 2020.
• 大倉雅貴, Hiroshi Uchida, Takahisa Shiraishi, Takanori Kiguchi, Toyohiko Konno, Yoshiharu Ito, HIROSHI FUNAKUBO. マイクロ波加熱式水熱合成によるニオブ酸カリウム配向体の堆積, 日本セラミックス協会2020年年会, Mar. 2020.
• Hiroshi Uchida, 大久保定晃, Takahisa Shiraishi, Takanori Kiguchi, Toyohiko Konno, Yoshiharu Ito, HIROSHI FUNAKUBO. 水熱合成由来ニオブ酸カリウム－ナトリウム材料における不純物の分析, 日本セラミックス協会2020年年会, Mar. 2020.
• 大倉雅貴, Yoshiharu Ito, Takahisa Shiraishi, Takanori Kiguchi, Toyohiko Konno, HIROSHI FUNAKUBO, Hiroshi Uchida. マイクロ波加熱式水熱合成プロセスによる(K,Na)NbO3厚膜の堆積, 第67回応用物理学会春季学術講演会, Mar. 2020.
• 大倉雅貴, Hiroshi Uchida, Takahisa Shiraishi, Takanori Kiguchi, Toyohiko Konno, Yoshiharu Ito, HIROSHI FUNAKUBO. マイクロ波加熱式水熱合成によるニオブ酸カリウム膜の高速エピタキシャル成長, 東北大学金属材料研究所 共同利用・共同研究ワークショップ 強誘電体関連物質の機能発現に関する構造科学の新展開, Dec. 2019.
• Takahisa Shiraishi, Akinori Tateyama, Yoshiharu Ito, Takanori Kiguchi, Hiroshi Uchida, HIROSHI FUNAKUBO, Toyohiko Konno. (K,Na)(Nb,Ta)O3厚膜の結晶構造および電気特性の調査, 第80回応用物理学会秋季学術講演会, Sept. 2019.
• 舟窪浩, 伊東良晴, 舘山明紀, 清水荘雄, 黒澤実, 内田寛, 白石貴久. 水熱合成法で作製した自己配向性(K,Na)NbO3厚膜の作製と評価, 日本ゾル-ゲル学会 第17回討論会, Aug. 2019.
• 内山潔, Naoya Oshima, yoshitaka Ehara, 及川貴弘, hiroki tanaka, Hiroshi Uchida, HIROSHI FUNAKUBO. 一軸配向(BaSr)TiO3薄膜を用いた電気特性の結晶方位依存性評価, 第36回強誘電体応用会議, May 2019.
• Yoshiharu Ito, Akinori Tateyama, 中村美子, Takao Shimizu, Minoru Kuribayashi Kurosawa, HIROSHI FUNAKUBO, Hiroshi Uchida, Takahisa Shiraishi, Takanori Kiguchi, Toyohiko Konno, Nobuhiro Kumada. 水熱合成法を用いた(K,Na)NbO3膜の原料の高効率化, 第36回強誘電体応用会議, May 2019.
• Takahisa Shiraishi, Akinori Tateyama, Yoshiharu Ito, Takanori Kiguchi, Hiroshi Uchida, Minoru Kuribayashi Kurosawa, HIROSHI FUNAKUBO, Toyohiko Konno. 水熱合成法による(K,Na,Li)(Nb,Ta)O3膜の作製とその結晶構造および電気特性の評価, 第36回強誘電体応用会議, May 2019.
• Akinori Tateyama, Yoshiharu Ito, 中村美子, Takao Shimizu, yuichiro orino, Minoru Kuribayashi Kurosawa, Hiroshi Uchida, Takahisa Shiraishi, Takanori Kiguchi, Toyohiko Konno, Nobuhiro Kumada, Takeshi Yoshimura, HIROSHI FUNAKUBO. 水熱合成法で作製した(K,Na)NbO３配向膜の圧電定数,e31,f, の評価, 第66回応用物理学会春季学術講演会, Mar. 2019.
• Takahisa Shiraishi, 武藤優太, Takanori Kiguchi, Toyohiko Konno, Akinori Tateyama, Yoshiharu Ito, HIROSHI FUNAKUBO, Hiroshi Uchida. 水熱合成(K,Na)(Nb,Ta)O3 の製膜機構の調査, 日本セラミックス協会2019年年会, Mar. 2019.
• HIROSHI FUNAKUBO, Akinori Tateyama, Yoshiharu Ito, 中村美子, yuichiro orino, Minoru Kuribayashi Kurosawa, Takao Shimizu, Hiroshi Uchida, Takahisa Shiraishi, Takanori Kiguchi, Toyohiko Konno, Mutsuo Ishikawa, Nobuhiro Kumada. 水熱法で作製する非鉛圧電体圧膜, 第21回日本セラミックス協会北陸支部秋季研究発表会, Nov. 2018.
• Yoshiharu Ito, Akinori Tateyama, 中村美子, Takao Shimizu, Minoru Kuribayashi Kurosawa, HIROSHI FUNAKUBO, Hiroshi Uchida, Takahisa Shiraishi, Takanori Kiguchi, Toyohiko Konno, Nobuhiro Kumada, Mutsuo Ishikawa. 水熱合成法による (KxNa1-x)NbO3厚膜のフレキシブル基材への製膜, 第38回エレクトロセラミックス研究討論会, Nov. 2018.
• 武藤優太, Takahisa Shiraishi, Akinori Tateyama, Yoshiharu Ito, Takanori Kiguchi, Hiroshi Uchida, HIROSHI FUNAKUBO, Toyohiko Konno. 水熱法による(K,Na)(Nb,Ta)O3合成メカニズムの調査, 第17回日本金属学会東北支部研究発表大会, Nov. 2018.
• Yoshiharu Ito, Akinori Tateyama, 中村美子, Takao Shimizu, Minoru Kuribayashi Kurosawa, HIROSHI FUNAKUBO, Hiroshi Uchida, Takahisa Shiraishi, Takanori Kiguchi, Toyohiko Konno, Nobuhiro Kumada, Mutsuo Ishikawa. 水熱合成法を用いたKNN膜の合成と物性, 第54回熱測定討論会, Oct. 2018.
• 沼野覇豪, 西出正道, 牧野碧, ken nishida, Hiroshi Uchida, HIROSHI FUNAKUBO. ゾルゲル法で作成したLa doped PbTiO3薄膜の結晶化時間に対する結晶構造及び電気特性の相関, 第34回日本セラミックス協会関東支部 研究発表会, Sept. 2018.
• Akinori Tateyama, Yoshiharu Ito, 中村美子, Takao Shimizu, yuichiro orino, Minoru Kuribayashi Kurosawa, Hiroshi Uchida, Takahisa Shiraishi, Takanori Kiguchi, Toyohiko Konno, Mutsuo Ishikawa, Nobuhiro Kumada, HIROSHI FUNAKUBO. 水熱合成法で作製した(K,Na)NbO3配向膜の圧電特性評価, 第79回応用物理学会秋季学術講演会, Sept. 2018.
• Takahisa Shiraishi, 武藤優太, Akinori Tateyama, Yoshiharu Ito, Takanori Kiguchi, Hiroshi Uchida, HIROSHI FUNAKUBO, Toyohiko Konno. 水熱合成(K,Na,Li)NbO3膜の結晶構造と電気特性調査, 第79回応用物理学会秋季学術講演会, Sept. 2018.
• 武藤優太, Takahisa Shiraishi, Takanori Kiguchi, Toyohiko Konno, Akinori Tateyama, Yoshiharu Ito, Minoru Kuribayashi Kurosawa, HIROSHI FUNAKUBO, Hiroshi Uchida, Mutsuo Ishikawa. 水熱合成法によるTa置換(K,Na)NbO3膜の低温合成, 第79回応用物理学会秋季学術講演会, Sept. 2018.
• Hiroshi Uchida, Takahisa Shiraishi, Takanori Kiguchi, 赤間章裕, Toyohiko Konno, Mutsuo Ishikawa, Yoshiharu Ito, Minoru Kuribayashi Kurosawa, HIROSHI FUNAKUBO. マイクロ波加熱式水熱合成プロセスによるニオブ酸カリウム－ナトリウム膜の堆積と組成制御, 日本セラミックス協会 第31回秋季シンポジウム, Sept. 2018.
• Takahisa Shiraishi, 武藤優太, Takanori Kiguchi, Toyohiko Konno, Akinori Tateyama, Yoshiharu Ito, Minoru Kuribayashi Kurosawa, HIROSHI FUNAKUBO, Hiroshi Uchida, Mutsuo Ishikawa. 水熱合成法による(K,Na,Li)NbO3膜の低温作製, 日本セラミックス協会 第31回秋季シンポジウム, Sept. 2018.
• HIROSHI FUNAKUBO, Akinori Tateyama, Yoshiharu Ito, 中村美子, yuichiro orino, Minoru Kuribayashi Kurosawa, Takao Shimizu, Hiroshi Uchida, Takahisa Shiraishi, Takanori Kiguchi, Toyohiko Konno, Mutsuo Ishikawa, Nobuhiro Kumada. 水熱合成(K,Na)NbO3 膜の厚膜化の検討, 日本セラミックス協会 第31回秋季シンポジウム, Sept. 2018.
• HIROSHI FUNAKUBO, Yoshiharu Ito, Akinori Tateyama, 中村美子, Takao Shimizu, Minoru Kuribayashi Kurosawa, Hiroshi Uchida, Takahisa Shiraishi, Takanori Kiguchi, Toyohiko Konno, Mutsuo Ishikawa. 水熱法を用いた(K,Na)NbO3配向体の低温作製とその特性評価, 第78回応用物理学会秋季学術講演会, Sept. 2018.
• Miyu Hasegawa, Takao Shimizu, 佐藤祐介, 山岡和希子, 石田未来, Hiroshi Uchida, HIROSHI FUNAKUBO. PLD法を用いた(Bi,Na)TiO3-BaTiO3系薄膜の作製と評価, 第65回応用物理学会春季学術講演会, Mar. 2018.
• 中山周平, HIROSHI FUNAKUBO, Hiroshi Uchida. 化学溶液堆積法によるCa2+添加HfO2強誘電体薄膜の作製, 第65回応用物理学会春季学術講演会, Mar. 2018.
• Akinori Tateyama, Yoshiharu Ito, 中村美子, Takao Shimizu, yuichiro orino, Minoru Kuribayashi Kurosawa, Hiroshi Uchida, Takahisa Shiraishi, Takanori Kiguchi, Toyohiko Konno, Mutsuo Ishikawa, Nobuhiro Kumada, HIROSHI FUNAKUBO. 種々のNb原料から水熱合成法で作製した(K,Na)NbO３配向膜の合成と特性評価, 第65回応用物理学会春季学術講演会, Mar. 2018.
• Hiroshi Uchida, Takahisa Shiraishi, Takanori Kiguchi, 赤間章裕, Toyohiko Konno, Mutsuo Ishikawa, Yoshiharu Ito, Minoru Kuribayashi Kurosawa, HIROSHI FUNAKUBO. マイクロ波加熱を導入した水熱合成プロセスによるニオブ酸カリウム-ナトリウム膜の高速堆積, 日本セラミックス協会 2018年年会, Mar. 2018.
• Yoshiharu Ito, Akinori Tateyama, 中村美子, Takao Shimizu, Minoru Kuribayashi Kurosawa, HIROSHI FUNAKUBO, Hiroshi Uchida, Takahisa Shiraishi, Takanori Kiguchi, Toyohiko Konno, Mutsuo Ishikawa. 水熱合成法を用いた金属板上への(K,Na)NbO3 厚膜の合成, 日本セラミックス協会 2018年年会, Mar. 2018.
• 武藤優太, Takahisa Shiraishi, Takanori Kiguchi, Toyohiko Konno, Yoshiharu Ito, Minoru Kuribayashi Kurosawa, HIROSHI FUNAKUBO, Hiroshi Uchida, Mutsuo Ishikawa. 水熱合成(K,Na)(Nb,Ta)O3 膜の作製と結晶構造評価, 日本セラミックス協会 2018年年会, Mar. 2018.
• Takahisa Shiraishi, 武藤優太, Takanori Kiguchi, Toyohiko Konno, Yoshiharu Ito, Minoru Kuribayashi Kurosawa, HIROSHI FUNAKUBO, Hiroshi Uchida, Mutsuo Ishikawa. 水熱合成法によるLi 置換(K,Na)NbO3 膜の作製, 日本セラミックス協会 2018年年会, Mar. 2018.
• HIROSHI FUNAKUBO, Yoshiharu Ito, Akinori Tateyama, 中村美子, Takao Shimizu, Minoru Kuribayashi Kurosawa, Hiroshi Uchida, Takahisa Shiraishi, Takanori Kiguchi, Toyohiko Konno, Mutsuo Ishikawa. 水熱合成によるフレキシブル基板への圧電体成膜, 第65回応用物理学会春季学術講演会, Mar. 2018.
• Akinori Tateyama, Yoshiharu Ito, 中村美子, Takao Shimizu, yuichiro orino, Minoru Kuribayashi Kurosawa, Hiroshi Uchida, Takahisa Shiraishi, Takanori Kiguchi, Toyohiko Konno, Nobuhiro Kumada, HIROSHI FUNAKUBO. 水熱合成法で作製した配向制御された(K, Na)NbO3膜の析出挙動に及ぼす出発原料の影響と得られた膜の特性評価, 第56回セラミックス基礎科学討論会, Jan. 2018.
• Miyu Hasegawa, Takao Shimizu, 佐藤祐介, 山岡和希子, Hiroshi Uchida, HIROSHI FUNAKUBO. PLD法を用いた(Bi, Na)TiO3-BaTiO3系薄膜の作製と評価, 第56回セラミックス基礎科学討論会, Jan. 2018.
• HIROSHI FUNAKUBO, Yoshiharu Ito, Akinori Tateyama, 中村美子, Takao Shimizu, Minoru Kuribayashi Kurosawa, Hiroshi Uchida, Takahisa Shiraishi, Takanori Kiguchi, Toyohiko Konno, Mutsuo Ishikawa. 水熱法による酸化物厚膜の成長, 第37回エレクトロセラミックス研究討論会, Oct. 2017.
• Hiroshi Uchida, 中山周平, HIROSHI FUNAKUBO. 溶液法由来HfO2-ZrO2極薄膜の結晶化挙動および特性に関する研究, 2017年強的秩序とその操作に関する第5回研究会, Sept. 2017.
• Yoshiharu Ito, 中村美子, Takao Shimizu, Minoru Kuribayashi Kurosawa, HIROSHI FUNAKUBO, Hiroshi Uchida, Takanori Kiguchi, Takahisa Shiraishi, Toyohiko Konno, Mutsuo Ishikawa. KNN配向膜の高速成膜法の検討, 日本セラミックス協会第30回秋季シンポジウム, Sept. 2017.
• Taisei Suzuki, Takanori Mimura, Takao Shimizu, Hiroshi Uchida, HIROSHI FUNAKUBO. スパッタリング法による{100}配向Y2O3-HfO2強誘電体エピタキシャル薄膜の作製とその評価, 第78回応用物理学会秋季学術講演会, Sept. 2017.
• Takahisa Shiraishi, Yoshiharu Ito, Mutsuo Ishikawa, Hiroshi Uchida, Takanori Kiguchi, Minoru Kuribayashi Kurosawa, HIROSHI FUNAKUBO, Toyohiko Konno. 水熱合成(K,Na)NbO3膜の電気特性および圧電特性の向上, 日本セラミックス協会第30回秋季シンポジウム, Sept. 2017.
• Hiroshi Uchida, 戸次雄一, 中村美子, HIROSHI FUNAKUBO. 水熱合成法による配向性チタン酸ジルコン酸鉛膜の作製, 日本セラミックス協会第30回秋季シンポジウム, Sept. 2017.
• 村瀬勝裕, HIROSHI FUNAKUBO, Hiroshi Uchida. “化学溶液堆積法によるチタン酸バリウム厚膜の作製とナノシートテンプレートを用いた結晶配向性制御, 第78回応用物理学会秋季学術講演会, Sept. 2017.
• 中山周平, HIROSHI FUNAKUBO, Hiroshi Uchida. HfO2-ZrO2薄膜の結晶化挙動に及ぼす熱処理条件の影響, 第78回応用物理学会秋季学術講演会, Sept. 2017.
• Takahisa Shiraishi, Mutsuo Ishikawa, Hiroshi Uchida, Takanori Kiguchi, Minoru Kuribayashi Kurosawa, HIROSHI FUNAKUBO, Toyohiko Konno. 水熱合成法による方位制御さ れたエピタキシャル(K0.5Na0.5)NbO3厚膜の作製と特性評価, 第34回強誘電体応用会議（FMA34）, May 2017.
• 内山潔, Naoya Oshima, yoshitaka Ehara, 及川貴弘, Daichi Ichinose, hiroki tanaka, Tomoya Sato, Hiroshi Uchida, HIROSHI FUNAKUBO. PdO//Pdバッファ層を用いた｛110｝配向Pb(Zr,Ti)O3薄膜の作製とその物性評価, 第34回強誘電体応用会議（FMA34）, May 2017.
• Hiroshi Uchida, Daichi Ichinose, 島宏美, Takahisa Shiraishi, Takanori Kiguchi, 赤間章裕, ken nishida, Toyohiko Konno, HIROSHI FUNAKUBO. ナノシート界面層上に作製された一軸配向性チタン酸ジルコン酸膜の特性評価, 第34回強誘電体応用会議（FMA34）, May 2017.
• Taisei Suzuki, Takanori Mimura, Takao Shimizu, Hiroshi Uchida, HIROSHI FUNAKUBO. スパッタリング法によるY2O3-HfO2強誘電体エピタキシャル薄膜作製とその評価, 第64回応用物理学会春季学術講演会, Mar. 2017.
• HIROSHI FUNAKUBO, Takao Shimizu, Minoru Kuribayashi Kurosawa, Hiroshi Uchida, 白石貴久, Takanori Kiguchi, Toyohiko Konno, 石河睦生. 水熱法を用いた(K,Na)NbO3配向体の作製とその特性評価, 日本セラミックス協会2017年年会, Mar. 2017.
• Tomoya Sato, Daichi Ichinose, Takanori Mimura, 根本祐一, Takao Shimizu, 今井康彦, Hiroshi Uchida, Osami Sakata, HIROSHI FUNAKUBO. 電界印加下における正方晶Pb(Zr,Ti)O3膜の結晶構造の時間応答, 第64回応用物理学会春季学術講演会, Mar. 2017.
• Tomoya Sato, Daichi Ichinose, 根本祐一, Takao Shimizu, Hiroshi Uchida, HIROSHI FUNAKUBO. 結晶構造の異なるPb(Zr, Ti)O3膜のドメイン構造に及ぼす電界印加の影響, 第55回セラミックス協会基礎科学討論会, Jan. 2017.
• 根本祐一, Tomoya Sato, Daichi Ichinose, Takao Shimizu, Hiroshi Uchida, Takanori Kiguchi, 佐藤祐介, 山岡和希子, HIROSHI FUNAKUBO. PLD法による正方晶(Bi, K)TiO3エピタキシャル膜の作製とポストアニールが強誘電性に与える影響, 第55回セラミックス協会基礎科学討論会, Jan. 2017.
• Taisei Suzuki, Takanori Mimura, Takao Shimizu, Hiroshi Uchida, HIROSHI FUNAKUBO. Y2O3-HfO2エピタキシャル薄膜の構成相の決定因子, 第55回セラミックス協会基礎科学討論会, Jan. 2017.
• 福島浩晃, Hiroshi Uchida, HIROSHI FUNAKUBO, 河東田隆, ken nishida. マイクロラマン分光法を用いたZnO単結晶及び粉末の酸素欠陥評価, 第36回エレクトロセラミックス研究討論会, Oct. 2016.
• 宮崎竜斗, Daichi Ichinose, 金鎭雄, 島 宏美, Takanori Kiguchi, 赤間章裕, ken nishida, Toyohiko Konno, HIROSHI FUNAKUBO, Hiroshi Uchida. ナノシート界面層上におけるPZT膜の一軸配向成長, 第36回エレクトロセラミックス研究討論会, Oct. 2016.
• 黒川満央, 上原睦雄, Takao Shimizu, Kensuke Akiyama, 松島正明, Hiroshi Uchida, YOSHISATO KIMURA, HIROSHI FUNAKUBO. 熱処理がMg2Si薄膜の伝導型に与える影響, 第77回応用物理学会秋季学術講演会, Sept. 2016.
• 根本祐一, Daichi Ichinose, Takao Shimizu, Hiroshi Uchida, 佐藤祐介, 山岡和希子, HIROSHI FUNAKUBO. PLD法による配向制御したエピタキシャル(Bi,K)TiO3膜の作製, 第77回応用物理学会秋季学術講演会, Sept. 2016.
• Takanori Mimura, Takao Shimizu, Hiroshi Uchida, Takanori Kiguchi, 赤間章裕, Toyohiko Konno, Osami Sakata, HIROSHI FUNAKUBO. HfO2基強誘電体の結晶構造と特性の熱処理温度依存性, 第77回応用物理学会秋季学術講演会, Sept. 2016.
• 福島浩晃, HIROSHI FUNAKUBO, Hiroshi Uchida, 島 宏美, 西田 謙. Pb(Zr,Ti)O3エピタキシャル膜におけるラマンスペクトルの角度依存性, 第33回強誘電体応用会議（FMA 33）, May 2016.
• 大井智雄, 野口慶人, 茂木翔太, 金 鎭雄, 島 宏美, 西田 謙, TAKANORI KIGUCHI, 赤間章裕, Toyohiko Konno, HIROSHI FUNAKUBO, Hiroshi Uchida. 金属酸化物ナノシート界面層を利用したチタン酸バリウム薄膜の結晶配向性制御, 第33回強誘電体応用会議（FMA 33）, May 2016.
• 根本 祐一, Daichi Ichinose, Takao Shimizu, Hiroshi Uchida, HIROSHI FUNAKUBO. PLD法による正方晶(Bi,K)TiO3エピタキシャル膜作製と圧電特性評価, 第33回強誘電体応用会議（FMA 33）, May 2016.
• HIROSHI FUNAKUBO, Takao Shimizu, Kiriha Katayama, Takanori Mimura, Takanori Kiguchi, 赤間章裕, Toyohiko Konno, Hiroshi Uchida. 配向制御したHfO2基強誘電体の作製とその強誘電特性評価, 日本セラミックス協会 2016年年会, Mar. 2016.
• 福島浩晃, 岡 廣隆, 神津知己, HIROSHI FUNAKUBO, Hiroshi Uchida, 森分博紀, 島 宏美, ken nishida. ラマン分光法を用いたBaTiO3の酸素欠陥の評価, 第63回応用物理学会春季学術講演会, Mar. 2016.
• 宮崎竜斗, Daichi Ichinose, 金 鎭雄, 島 宏美, 赤間章裕, Takanori Kiguchi, ken nishida, Toyohiko Konno, HIROSHI FUNAKUBO, Hiroshi Uchida. ナノシート界面層を利用した配向性PZT厚膜の作製, 第63回応用物理学会春季学術講演会, Mar. 2016.
• Takanori Mimura, Kiriha Katayama, Takao Shimizu, Hiroshi Uchida, Takanori Kiguchi, 赤間章裕, Toyohiko Konno, Osami Sakata, HIROSHI FUNAKUBO. 固相成長による配向制御したHfO2基強誘電体薄膜の作製と特性評価, 第63回応用物理学会春季学術講演会, Mar. 2016.
• Mao Kurokawa, Mutsuo Uehara, Daichi Ichinose, Takao Shimizu, Kensuke Akiyama, masaaki matsushima, Hiroshi Uchida, HIROSHI FUNAKUBO. Mg2Si薄膜の熱電特性に及ぼす歪みの影響, 第63回応用物理学会春季学術講演会, Mar. 2016.
• Yuichi Nemoto, Daichi Ichinose, Takao Shimizu, Hiroshi Uchida, HIROSHI FUNAKUBO. PLD法による正方晶(Bi,K)TiO3エピタキシャル膜作製と圧電特性評価, 第63回応用物理学会春季学術講演会, Mar. 2016.
• 大井智雄, 野口慶人, 茂木翔太, Hiroshi Uchida, 金鎭雄, 島宏美, ken nishida, Takanori Kiguchi, 赤間章裕, Toyohiko Konno, HIROSHI FUNAKUBO. 化学溶液堆積法で作製された配向性チタン酸バリウム薄膜の結晶化挙動に及ぼす熱処理プロセスの影響, 日本セラミックス協会 2016年年会, Mar. 2016.
• Takanori Mimura, Kiriha Katayama, Takao Shimizu, HIROSHI FUNAKUBO, Hiroshi Uchida, Takanori Kiguchi, 赤間章裕, Toyohiko Konno. 固相成長法を用いた強誘電体HfO2 基薄膜のエピタキシャル成長と特性評価, 第54回セラミックス基礎科学討論会, Jan. 2016.
• Yuichi Nemoto, Daichi Ichinose, Takao Shimizu, Hiroshi Uchida, HIROSHI FUNAKUBO. PLD 法による正方晶(Bi,,K)TiO3 エピタキシャル膜作製と圧電特性評価, 第54回セラミックス基礎科学討論会, Jan. 2016.
• Mao Kurokawa, Mutsuo Uehara, Kensuke Akiyama, masaaki matsushima, Hiroshi Uchida, YOSHISATO KIMURA, HIROSHI FUNAKUBO. Mg2Si 薄膜の熱電特性に及ぼす種々の因子の影響, 第54回セラミックス基礎科学討論会, Jan. 2016.
• Mutsuo Uehara, Mao Kurokawa, Kensuke Akiyama, Takao Shimizu, masaaki matsushima, Hiroshi Uchida, YOSHISATO KIMURA, HIROSHI FUNAKUBO. スパッタリング法によるCa-Mg-Si 基膜熱電材料の特性評価, 第54回セラミックス基礎科学討論会, Jan. 2016.
• Kiriha Katayama, Takao Shimizu, Takanori Kiguchi, 赤間章裕, Toyohiko Konno, Hiroshi Uchida, HIROSHI FUNAKUBO. HfO2 基エピタキシャル薄膜における強誘電相の安定化, 第54回セラミックス基礎科学討論会, Jan. 2016.
• Takahisa Shiraishi, Kiriha Katayama, Tatsuhiko Yokouchi, Takao Shimizu, 及川貴弘, Hiroshi Uchida, HIROSHI FUNAKUBO, Takanori Kiguchi, Toyohiko Konno. 種々の基板上に作製した (Hf0.5Zr 0.5)O2薄膜の特性, 第35回エレクトロセラミックス研究討論会, Oct. 2015.
• 茂木翔太, Junichi Kimura, HIROSHI FUNAKUBO, Hiroshi Uchida. 化学溶液堆積法により作製したエピタキシャルBaTiO3-Bi(Mg1/2Ti 1/2)O3薄膜の誘電特性, 第35回エレクトロセラミックス研究討論会, Oct. 2015.
• Kiriha Katayama, Takao Shimizu, Takanori Kiguchi, 赤間 章裕, Toyohiko Konno, Hiroshi Uchida, Osami Sakata, HIROSHI FUNAKUBO. Si基板上への斜方晶エピタキシャルHfO2基薄膜の作製, 第76回応用物理学会秋季学術講演会, Sept. 2015.
• Takao Shimizu, Kiriha Katayama, Takanori Kiguchi, 赤間 章裕, Toyohiko Konno, Hiroshi Uchida, Osami Sakata, HIROSHI FUNAKUBO. 斜方晶エピタキシャルHfO2基薄膜のドメイン構造, 第76回応用物理学会秋季学術講演会, Sept. 2015.
• 野口 慶人, 茂木 翔太, HIROSHI FUNAKUBO, Hiroshi Uchida. ナノシート界面層を利用したBaTiO3薄膜の選択配向成長, 第76回応用物理学会秋季学術講演会, Sept. 2015.
• 茂木翔太, Hiroshi Uchida, Junichi Kimura, HIROSHI FUNAKUBO. BaTiO3-Bi(Mg1/2Ti1/2)O3エピタキシャル薄膜の作製とその特性評価, 日本セラミックス協会第28回秋季シンポジウム, Sept. 2015.
• 内山潔, Naoya Oshima, hiroki tanaka, yoshitaka Ehara, 及川貴弘, Tomoya Sato, Hiroshi Uchida, HIROSHI FUNAKUBO. PdO//Pd バッファ層を用いた{110} 配向Pb(Zr,Ti)O3(PZT)薄膜の作製と評価, 日本セラミックス協会第28回秋季シンポジウム, Sept. 2015.
• Mutsuo Uehara, Mao Kurokawa, Kensuke Akiyama, masaaki matsushima, Hiroshi Uchida, YOSHISATO KIMURA, HIROSHI FUNAKUBO. スパッタリング法によるCa-Mg-Si基膜の作製と特性評価, 第76回応用物理学会秋季学術講演会, Sept. 2015.
• HIROSHI FUNAKUBO, Takahisa Shiraishi, Kiriha Katayama, Tatsuhiko Yokouchi, Takao Shimizu, 及川 貴弘, Hiroshi Uchida. (Hf0.5Zr0.5)O2 薄膜の強誘電性に及ぼす歪の効果, 日本金属学会２０１５年秋期講演大会, Sept. 2015.
• HIROSHI FUNAKUBO, Naoya Oshima, Takao Shimizu, Mitsumasa Nakajima, yoshitaka Ehara, 及川 貴弘, Hiroshi Uchida. XRD測定による (100)/(001)配向正方晶Pb(Zr,Ti)O3膜の電界印加下の結晶構造変化の定量分析, 第76回応用物理学会秋季学術講演会, Sept. 2015.
• Kiriha Katayama, Takao Shimizu, Takahisa Shiraishi, 及川貴弘, Takanori Kiguchi, 赤間章裕, Toyohiko Konno, 中村奨梧, Hiroshi Uchida, HIROSHI FUNAKUBO. 斜方晶相を含むエピタキシャルHfO2 基薄膜の作製と評価, 第32回強誘電体応用会議（FMA 32）, May 2015.
• Takahisa Shiraishi, Minoru Kuribayashi Kurosawa, HIROSHI FUNAKUBO, Hiroshi Uchida, Takanori Kiguchi, Toyohiko Konno. 水熱合成(K0.5Na0.5)NbO3 膜の結晶構造と製膜メカニズムの調査, 第32回強誘電体応用会議（FMA 32）, May 2015.
• 内山 潔, Naoya Oshima, yoshitaka Ehara, 及川貴弘, hiroki tanaka, Tomoya Sato, Hiroshi Uchida, HIROSHI FUNAKUBO. PdO/Pd バッファ層を用いた｛110｝配向ペロブスカイト薄膜の作製とその物性評価, 第32回強誘電体応用会議（FMA 32）, May 2015.
• 阿部千穂子, 塩川真里奈, Kiriha Katayama, Takahisa Shiraishi, Takao Shimizu, HIROSHI FUNAKUBO, Hiroshi Uchida. CSD 由来HfO2-ZrO2 固溶体薄膜の結晶構造と誘電特性, 第32回強誘電体応用会議（FMA 32）, May 2015.
• Takahisa Shiraishi, Hiro Einishi, Mutsuo Ishikawa, Tomohito Hasegawa, Minoru Kuribayashi Kurosawa, Hiroshi Uchida, Yukio Sakashita, HIROSHI FUNAKUBO. 水熱合成法による(N, Na)NbO3厚膜の金属板上での配向制御とその特性評価, 第58回応用物理学関係連合講演会, 第58回応用物理学関係連合講演会講演予稿集, pp. 06-038, Mar. 2011.
• Hiro Einishi, Takahisa Shiraishi, Shintaro Yasui, Mutsuo Ishikawa, Minoru Kuribayashi Kurosawa, Hiroshi Uchida, Yukio Sakashita, HIROSHI FUNAKUBO. 水熱合成法を用いたエピタキシャル(K,Na)NbO3厚膜の合成, 第58回応用物理学関係連合講演会, 第58回応用物理学関係連合講演会講演予稿集, p. 06-039, Mar. 2011.

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